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Conference Paper: Digital photograph stitching with optimized matching of gradient and curvature

TitleDigital photograph stitching with optimized matching of gradient and curvature
Authors
KeywordsCurvature
Gradient
Image stitching
Panoramic mosaicing
Photometric inconsistency
Issue Date2006
PublisherS P I E - International Society for Optical Engineering. The Journal's web site is located at http://spie.org/x1848.xml
Citation
Proceedings Of Spie - The International Society For Optical Engineering, 2006, v. 6069 How to Cite?
AbstractDigital photograph stitching blends multiple images to form a single one with a wide field of view. Sometimes, artifacts may arise, often due to photometric inconsistency and geometric misalignment among the images. Several existing techniques tackle this problem by methods such as pixel selection or pixel blending, which involve the matching of intensity, frequency, and gradient among the input images and adjust them to find the optimal match with the input images. However, our experience indicates that these methods have yet fully incorporated the mathematical properties of the photometric inconsistency. In this paper, we first introduce a general mathematical model describing the properties and effects of the photometric inconsistency. This model supports our claim that matching on the intensity and even the gradient domain is insufficient. Our method thus adds the extra requirement of an optimal matching of curvature. Simulations are carried out using our method, with input images suffering from different kinds of photometric inconsistency under the aligned and misaligned situations. We evaluate the results using both objective and subjective criteria, and we find that our method indeed shows an improvement for certain kinds of photometric inconsistency. © 2006 SPIE-IS&T.
Persistent Identifierhttp://hdl.handle.net/10722/99558
ISSN
References

 

DC FieldValueLanguage
dc.contributor.authorSuen, STYen_HK
dc.contributor.authorLam, EYen_HK
dc.contributor.authorWong, KKYen_HK
dc.date.accessioned2010-09-25T18:35:18Z-
dc.date.available2010-09-25T18:35:18Z-
dc.date.issued2006en_HK
dc.identifier.citationProceedings Of Spie - The International Society For Optical Engineering, 2006, v. 6069en_HK
dc.identifier.issn0277-786Xen_HK
dc.identifier.urihttp://hdl.handle.net/10722/99558-
dc.description.abstractDigital photograph stitching blends multiple images to form a single one with a wide field of view. Sometimes, artifacts may arise, often due to photometric inconsistency and geometric misalignment among the images. Several existing techniques tackle this problem by methods such as pixel selection or pixel blending, which involve the matching of intensity, frequency, and gradient among the input images and adjust them to find the optimal match with the input images. However, our experience indicates that these methods have yet fully incorporated the mathematical properties of the photometric inconsistency. In this paper, we first introduce a general mathematical model describing the properties and effects of the photometric inconsistency. This model supports our claim that matching on the intensity and even the gradient domain is insufficient. Our method thus adds the extra requirement of an optimal matching of curvature. Simulations are carried out using our method, with input images suffering from different kinds of photometric inconsistency under the aligned and misaligned situations. We evaluate the results using both objective and subjective criteria, and we find that our method indeed shows an improvement for certain kinds of photometric inconsistency. © 2006 SPIE-IS&T.en_HK
dc.languageengen_HK
dc.publisherS P I E - International Society for Optical Engineering. The Journal's web site is located at http://spie.org/x1848.xmlen_HK
dc.relation.ispartofProceedings of SPIE - The International Society for Optical Engineeringen_HK
dc.subjectCurvatureen_HK
dc.subjectGradienten_HK
dc.subjectImage stitchingen_HK
dc.subjectPanoramic mosaicingen_HK
dc.subjectPhotometric inconsistencyen_HK
dc.titleDigital photograph stitching with optimized matching of gradient and curvatureen_HK
dc.typeConference_Paperen_HK
dc.identifier.emailLam, EY:elam@eee.hku.hken_HK
dc.identifier.emailWong, KKY:kywong@eee.hku.hken_HK
dc.identifier.authorityLam, EY=rp00131en_HK
dc.identifier.authorityWong, KKY=rp00189en_HK
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1117/12.640261en_HK
dc.identifier.scopuseid_2-s2.0-33645665349en_HK
dc.identifier.hkuros116324en_HK
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-33645665349&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume6069en_HK
dc.identifier.spage139en_HK
dc.identifier.epage154en_HK
dc.publisher.placeUnited Statesen_HK
dc.identifier.scopusauthoridSuen, STY=12804247800en_HK
dc.identifier.scopusauthoridLam, EY=7102890004en_HK
dc.identifier.scopusauthoridWong, KKY=36456599700en_HK

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