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Article: Electrical control of parametric processes in silicon waveguides

TitleElectrical control of parametric processes in silicon waveguides
Authors
KeywordsChemicals And Cas Registry Numbers
Issue Date2008
PublisherOptical Society of America. The Journal's web site is located at http://www.opticsexpress.org
Citation
Optics Express, 2008, v. 16 n. 13, p. 9838-9843 How to Cite?
AbstractWe demonstrate electrical tuning of phase mismatch in silicon wavelength converters. Active control of birefringence induced by a thin-film piezoelectric transducer integrated on top of the waveguides is used for dispersion engineering. The technology provides a solution for compensating the phase mismatch caused by fabrication errors in integrated waveguides. It also offers a mean to dynamically control the relative dispersion between interacting waves and hence, to introduce electronic control of optical parametric processes. © 2008 Optical Society of America.
Persistent Identifierhttp://hdl.handle.net/10722/91310
ISSN
2015 Impact Factor: 3.148
2015 SCImago Journal Rankings: 2.186
ISI Accession Number ID
References

 

DC FieldValueLanguage
dc.contributor.authorTsia, KKen_HK
dc.contributor.authorFathpour, Sen_HK
dc.contributor.authorJalali, Ben_HK
dc.date.accessioned2010-09-17T10:16:49Z-
dc.date.available2010-09-17T10:16:49Z-
dc.date.issued2008en_HK
dc.identifier.citationOptics Express, 2008, v. 16 n. 13, p. 9838-9843en_HK
dc.identifier.issn1094-4087en_HK
dc.identifier.urihttp://hdl.handle.net/10722/91310-
dc.description.abstractWe demonstrate electrical tuning of phase mismatch in silicon wavelength converters. Active control of birefringence induced by a thin-film piezoelectric transducer integrated on top of the waveguides is used for dispersion engineering. The technology provides a solution for compensating the phase mismatch caused by fabrication errors in integrated waveguides. It also offers a mean to dynamically control the relative dispersion between interacting waves and hence, to introduce electronic control of optical parametric processes. © 2008 Optical Society of America.en_HK
dc.languageengen_HK
dc.publisherOptical Society of America. The Journal's web site is located at http://www.opticsexpress.orgen_HK
dc.relation.ispartofOptics Expressen_HK
dc.subjectChemicals And Cas Registry Numbersen_HK
dc.subject.meshComputer Simulationen_HK
dc.subject.meshElectromagnetic Fieldsen_HK
dc.subject.meshElectronics - instrumentationen_HK
dc.subject.meshEquipment Designen_HK
dc.subject.meshEquipment Failure Analysisen_HK
dc.subject.meshLighten_HK
dc.subject.meshModels, Theoreticalen_HK
dc.subject.meshOptics and Photonics - instrumentationen_HK
dc.subject.meshRefractometry - instrumentationen_HK
dc.subject.meshScattering, Radiationen_HK
dc.subject.meshSilicon - chemistry - radiation effectsen_HK
dc.titleElectrical control of parametric processes in silicon waveguidesen_HK
dc.typeArticleen_HK
dc.identifier.emailTsia, KK:tsia@hku.hken_HK
dc.identifier.authorityTsia, KK=rp01389en_HK
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1364/OE.16.009838en_HK
dc.identifier.pmid18575553-
dc.identifier.scopuseid_2-s2.0-46149100282en_HK
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-46149100282&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume16en_HK
dc.identifier.issue13en_HK
dc.identifier.spage9838en_HK
dc.identifier.epage9843en_HK
dc.identifier.isiWOS:000257563900065-
dc.publisher.placeUnited Statesen_HK
dc.identifier.scopusauthoridTsia, KK=6506659574en_HK
dc.identifier.scopusauthoridFathpour, S=9738012600en_HK
dc.identifier.scopusauthoridJalali, B=7004889917en_HK

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