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Article: 16 × 1 Integrated filter array in the MIR region prepared by using a combinatorial etching technique
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Title16 × 1 Integrated filter array in the MIR region prepared by using a combinatorial etching technique
 
AuthorsWang, S-W1
Liu, D1
Lin, B1
Chen, X1
Lu, W1
 
KeywordsEtching
Fabrication
Infrared Radiation
Lasers
 
Issue Date2006
 
PublisherSpringer Verlag. The Journal's web site is located at http://link.springer.de/link/service/journals/00340/index.htm
 
CitationApplied Physics B: Lasers and Optics, 2006, v. 82 n. 4, p. 637-641 [How to Cite?]
DOI: http://dx.doi.org/10.1007/s00340-005-2102-0
 
AbstractA combinatorial etching technique is introduced to prepare integrated narrow bandpass filters in the mid-infrared (MIR) region. In this region, a 16×1 filter array has been fabricated successfully with two deposition processes combined with the combinatorial etching technique. The pass bands of the 16 filter elements range from 2.534 to 2.859 μm with bandwidth (BW 3 dB) less than 0.013 μm (BW3 dB/λ ≤ 0.48%). The insertion loss of the pass bands is between 1.75 and 3.43 dB. The results show that the technique is effective for the fabrication of filter arrays in the MIR region and can be extended to most of the important optical regions.
 
ISSN0946-2171
2012 Impact Factor: 1.782
2012 SCImago Journal Rankings: 1.072
 
DOIhttp://dx.doi.org/10.1007/s00340-005-2102-0
 
ISI Accession Number IDWOS:000235368400023
 
ReferencesReferences in Scopus
 
DC FieldValue
dc.contributor.authorWang, S-W
 
dc.contributor.authorLiu, D
 
dc.contributor.authorLin, B
 
dc.contributor.authorChen, X
 
dc.contributor.authorLu, W
 
dc.date.accessioned2010-09-17T10:13:27Z
 
dc.date.available2010-09-17T10:13:27Z
 
dc.date.issued2006
 
dc.description.abstractA combinatorial etching technique is introduced to prepare integrated narrow bandpass filters in the mid-infrared (MIR) region. In this region, a 16×1 filter array has been fabricated successfully with two deposition processes combined with the combinatorial etching technique. The pass bands of the 16 filter elements range from 2.534 to 2.859 μm with bandwidth (BW 3 dB) less than 0.013 μm (BW3 dB/λ ≤ 0.48%). The insertion loss of the pass bands is between 1.75 and 3.43 dB. The results show that the technique is effective for the fabrication of filter arrays in the MIR region and can be extended to most of the important optical regions.
 
dc.description.natureLink_to_subscribed_fulltext
 
dc.identifier.citationApplied Physics B: Lasers and Optics, 2006, v. 82 n. 4, p. 637-641 [How to Cite?]
DOI: http://dx.doi.org/10.1007/s00340-005-2102-0
 
dc.identifier.doihttp://dx.doi.org/10.1007/s00340-005-2102-0
 
dc.identifier.epage641
 
dc.identifier.isiWOS:000235368400023
 
dc.identifier.issn0946-2171
2012 Impact Factor: 1.782
2012 SCImago Journal Rankings: 1.072
 
dc.identifier.issue4
 
dc.identifier.scopuseid_2-s2.0-32844454787
 
dc.identifier.spage637
 
dc.identifier.urihttp://hdl.handle.net/10722/91128
 
dc.identifier.volume82
 
dc.languageeng
 
dc.publisherSpringer Verlag. The Journal's web site is located at http://link.springer.de/link/service/journals/00340/index.htm
 
dc.relation.ispartofApplied Physics B: Lasers and Optics
 
dc.relation.referencesReferences in Scopus
 
dc.subjectEtching
 
dc.subjectFabrication
 
dc.subjectInfrared Radiation
 
dc.subjectLasers
 
dc.title16 × 1 Integrated filter array in the MIR region prepared by using a combinatorial etching technique
 
dc.typeArticle
 
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Author Affiliations
  1. Shanghai Institute of Technical Physics Chinese Academy of Sciences