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Article: 16 × 1 Integrated filter array in the MIR region prepared by using a combinatorial etching technique

Title16 × 1 Integrated filter array in the MIR region prepared by using a combinatorial etching technique
Authors
KeywordsEtching
Fabrication
Infrared Radiation
Lasers
Issue Date2006
PublisherSpringer Verlag. The Journal's web site is located at http://link.springer.de/link/service/journals/00340/index.htm
Citation
Applied Physics B: Lasers and Optics, 2006, v. 82 n. 4, p. 637-641 How to Cite?
Abstract
A combinatorial etching technique is introduced to prepare integrated narrow bandpass filters in the mid-infrared (MIR) region. In this region, a 16×1 filter array has been fabricated successfully with two deposition processes combined with the combinatorial etching technique. The pass bands of the 16 filter elements range from 2.534 to 2.859 μm with bandwidth (BW 3 dB) less than 0.013 μm (BW3 dB/λ ≤ 0.48%). The insertion loss of the pass bands is between 1.75 and 3.43 dB. The results show that the technique is effective for the fabrication of filter arrays in the MIR region and can be extended to most of the important optical regions.
Persistent Identifierhttp://hdl.handle.net/10722/91128
ISSN
2013 Impact Factor: 1.634
2013 SCImago Journal Rankings: 1.165
ISI Accession Number ID
References

 

Author Affiliations
  1. Shanghai Institute of Technical Physics Chinese Academy of Sciences
DC FieldValueLanguage
dc.contributor.authorWang, S-Wen_HK
dc.contributor.authorLiu, Den_HK
dc.contributor.authorLin, Ben_HK
dc.contributor.authorChen, Xen_HK
dc.contributor.authorLu, Wen_HK
dc.date.accessioned2010-09-17T10:13:27Z-
dc.date.available2010-09-17T10:13:27Z-
dc.date.issued2006en_HK
dc.identifier.citationApplied Physics B: Lasers and Optics, 2006, v. 82 n. 4, p. 637-641en_HK
dc.identifier.issn0946-2171en_HK
dc.identifier.urihttp://hdl.handle.net/10722/91128-
dc.description.abstractA combinatorial etching technique is introduced to prepare integrated narrow bandpass filters in the mid-infrared (MIR) region. In this region, a 16×1 filter array has been fabricated successfully with two deposition processes combined with the combinatorial etching technique. The pass bands of the 16 filter elements range from 2.534 to 2.859 μm with bandwidth (BW 3 dB) less than 0.013 μm (BW3 dB/λ ≤ 0.48%). The insertion loss of the pass bands is between 1.75 and 3.43 dB. The results show that the technique is effective for the fabrication of filter arrays in the MIR region and can be extended to most of the important optical regions.en_HK
dc.languageengen_HK
dc.publisherSpringer Verlag. The Journal's web site is located at http://link.springer.de/link/service/journals/00340/index.htmen_HK
dc.relation.ispartofApplied Physics B: Lasers and Opticsen_HK
dc.subjectEtchingen_HK
dc.subjectFabricationen_HK
dc.subjectInfrared Radiationen_HK
dc.subjectLasersen_HK
dc.title16 × 1 Integrated filter array in the MIR region prepared by using a combinatorial etching techniqueen_HK
dc.typeArticleen_HK
dc.identifier.emailLin, B:blin@hku.hken_HK
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1007/s00340-005-2102-0en_HK
dc.identifier.scopuseid_2-s2.0-32844454787en_HK
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-32844454787&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume82en_HK
dc.identifier.issue4en_HK
dc.identifier.spage637en_HK
dc.identifier.epage641en_HK
dc.identifier.isiWOS:000235368400023-

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