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Article: Ferroelectric BaTi O3 thin films on Ni metal tapes using NiO as buffer layer
Title | Ferroelectric BaTi O3 thin films on Ni metal tapes using NiO as buffer layer |
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Authors | |
Keywords | Barium Titanate Dielectric Losses Interdiffusion (Solids) Nickel Permittivity Pulsed Laser Deposition Transmission Electron Microscopy X Ray Diffraction Analysis |
Issue Date | 2007 |
Publisher | American Institute of Physics. The Journal's web site is located at http://apl.aip.org/ |
Citation | Applied Physics Letters, 2007, v. 90 n. 20, article no. 202901 How to Cite? |
Abstract | Ferroelectric BaTi O3 (BTO) thin films were deposited on NiO buffered polycrystalline Ni tapes by pulsed laser deposition. Microstructural studies by x-ray diffractometer and transmission electron microscopy reveal that the as-grown BTO films have the nanopillar structures with an average size of approximately 80 nm in diameter and the good interface structures with no interdiffusion or reaction. The dielectric and ferroelectric property measurements exhibit that the BTO films have a relatively large dielectric constant, a small dielectric loss, and an extremely large piezoelectric response with a symmetric hysteresis loop. These excellent properties indicate that the as-fabricated BTO films are promising for the development of the structural health monitoring systems. © 2007 American Institute of Physics. |
Persistent Identifier | http://hdl.handle.net/10722/91075 |
ISSN | 2023 Impact Factor: 3.5 2023 SCImago Journal Rankings: 0.976 |
ISI Accession Number ID | |
References |
DC Field | Value | Language |
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dc.contributor.author | Yuan, Z | en_HK |
dc.contributor.author | Liu, J | en_HK |
dc.contributor.author | Weaver, J | en_HK |
dc.contributor.author | Chen, CL | en_HK |
dc.contributor.author | Jiang, JC | en_HK |
dc.contributor.author | Lin, B | en_HK |
dc.contributor.author | Giurgiutiu, V | en_HK |
dc.contributor.author | Bhalla, A | en_HK |
dc.contributor.author | Guo, RY | en_HK |
dc.date.accessioned | 2010-09-17T10:12:39Z | - |
dc.date.available | 2010-09-17T10:12:39Z | - |
dc.date.issued | 2007 | en_HK |
dc.identifier.citation | Applied Physics Letters, 2007, v. 90 n. 20, article no. 202901 | - |
dc.identifier.issn | 0003-6951 | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/91075 | - |
dc.description.abstract | Ferroelectric BaTi O3 (BTO) thin films were deposited on NiO buffered polycrystalline Ni tapes by pulsed laser deposition. Microstructural studies by x-ray diffractometer and transmission electron microscopy reveal that the as-grown BTO films have the nanopillar structures with an average size of approximately 80 nm in diameter and the good interface structures with no interdiffusion or reaction. The dielectric and ferroelectric property measurements exhibit that the BTO films have a relatively large dielectric constant, a small dielectric loss, and an extremely large piezoelectric response with a symmetric hysteresis loop. These excellent properties indicate that the as-fabricated BTO films are promising for the development of the structural health monitoring systems. © 2007 American Institute of Physics. | en_HK |
dc.language | eng | en_HK |
dc.publisher | American Institute of Physics. The Journal's web site is located at http://apl.aip.org/ | en_HK |
dc.relation.ispartof | Applied Physics Letters | en_HK |
dc.subject | Barium Titanate | en_HK |
dc.subject | Dielectric Losses | en_HK |
dc.subject | Interdiffusion (Solids) | en_HK |
dc.subject | Nickel | en_HK |
dc.subject | Permittivity | en_HK |
dc.subject | Pulsed Laser Deposition | en_HK |
dc.subject | Transmission Electron Microscopy | en_HK |
dc.subject | X Ray Diffraction Analysis | en_HK |
dc.title | Ferroelectric BaTi O3 thin films on Ni metal tapes using NiO as buffer layer | en_HK |
dc.type | Article | en_HK |
dc.identifier.email | Lin, B:blin@hku.hk | en_HK |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1063/1.2739082 | en_HK |
dc.identifier.scopus | eid_2-s2.0-34249095529 | en_HK |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-34249095529&selection=ref&src=s&origin=recordpage | en_HK |
dc.identifier.volume | 90 | en_HK |
dc.identifier.issue | 20 | en_HK |
dc.identifier.spage | article no. 202901 | - |
dc.identifier.epage | article no. 202901 | - |
dc.identifier.isi | WOS:000246623500058 | - |
dc.identifier.issnl | 0003-6951 | - |