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Article: Pits and fissures: remnant organic debris after acid-etching.

TitlePits and fissures: remnant organic debris after acid-etching.
Authors
KeywordsChemicals And Cas Registry Numbers
Issue Date1990
Citation
Asdc Journal Of Dentistry For Children, 1990, v. 57 n. 5, p. 348-351 How to Cite?
AbstractThe purpose of this study was to compare the ability of liquid and gel etches to remove remaining debris in occlusal pits and fissures in vitro after cleansing using a conventional technique or air-water slurry method. A suitable stain differentiated between etched enamel, unetched enamel, and pellicle or debris. The results statistically indicate that etching does not remove much of the organic debris, and there was no difference between a liquid or gel etchant. Agitation of the etchant did not aid pellicle removal.
Persistent Identifierhttp://hdl.handle.net/10722/90733
ISSN
2001 Impact Factor: 0.198

 

DC FieldValueLanguage
dc.contributor.authorBurrow, MFen_HK
dc.contributor.authorMakinson, OFen_HK
dc.date.accessioned2010-09-17T10:07:29Z-
dc.date.available2010-09-17T10:07:29Z-
dc.date.issued1990en_HK
dc.identifier.citationAsdc Journal Of Dentistry For Children, 1990, v. 57 n. 5, p. 348-351en_HK
dc.identifier.issn0022-0353en_HK
dc.identifier.urihttp://hdl.handle.net/10722/90733-
dc.description.abstractThe purpose of this study was to compare the ability of liquid and gel etches to remove remaining debris in occlusal pits and fissures in vitro after cleansing using a conventional technique or air-water slurry method. A suitable stain differentiated between etched enamel, unetched enamel, and pellicle or debris. The results statistically indicate that etching does not remove much of the organic debris, and there was no difference between a liquid or gel etchant. Agitation of the etchant did not aid pellicle removal.en_HK
dc.languageengen_HK
dc.relation.ispartofASDC journal of dentistry for childrenen_HK
dc.subjectChemicals And Cas Registry Numbersen_HK
dc.subject.meshAcid Etching, Dentalen_HK
dc.subject.meshBicarbonates - administration & dosageen_HK
dc.subject.meshDental Deposits - ultrastructureen_HK
dc.subject.meshDental Enamel - ultrastructureen_HK
dc.subject.meshDental Pellicleen_HK
dc.subject.meshDental Prophylaxisen_HK
dc.subject.meshGelsen_HK
dc.subject.meshHumansen_HK
dc.subject.meshPhosphoric Acids - administration & dosageen_HK
dc.subject.meshSilicatesen_HK
dc.subject.meshSilicic Aciden_HK
dc.subject.meshSodium - administration & dosageen_HK
dc.subject.meshSodium Bicarbonateen_HK
dc.subject.meshSolutionsen_HK
dc.subject.meshWateren_HK
dc.titlePits and fissures: remnant organic debris after acid-etching.en_HK
dc.typeArticleen_HK
dc.identifier.emailBurrow, MF:mfburr58@hku.hken_HK
dc.identifier.authorityBurrow, MF=rp01306en_HK
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.pmid2170482en_HK
dc.identifier.scopuseid_2-s2.0-0025483399en_HK
dc.identifier.volume57en_HK
dc.identifier.issue5en_HK
dc.identifier.spage348en_HK
dc.identifier.epage351en_HK
dc.identifier.scopusauthoridBurrow, MF=7005876730en_HK
dc.identifier.scopusauthoridMakinson, OF=7003977696en_HK

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