Dislocation network at InN/GaN interface revealed by scanning tunneling microscopy

Abstract

For heteroepitaxy of InN on GaN(0001) by molecular-beam epitaxy, the lattice misfit strain is relieved by misfit dislocations (MDs) formed at the interface between InN and GaN. Imaging by scanning tunneling microscopy (STM) of the surfaces of thin InN epifilms reveals line feature parallel to 〈112 0〉. Their contrast becomes less apparent for thicker epifilms. From the interline spacing as well as a comparison with transmission electron microscopy studies, it is suggested that they correspond to the MDs beneath the surface. The STM contrast originates from both the surface distortion caused by the local strain at MDs and the electronic states of the defects. © 2008 American Institute of Physics.