Article: Evolution of photoluminescence mechanisms of Si+-implanted SiO2 films with thermal annealing

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TitleEvolution of photoluminescence mechanisms of Si+-implanted SiO2 films with thermal annealing
AuthorsDing, L
Chen, TP
Liu, Y
Ng, CY
Yang, M
Wong, JI
Zhu, FR
Tan, MC
Fung, SHY
Chen, X
Huang, Y
Issue Date2008
PublisherAmerican Scientific Publishers. The Journal's web site is located at http://aspbs.com/jnn/
CitationJournal of Nanoscience and Nanotechnology, 2008, v. 8, p. 3555-3560 [How to Cite?]
ISSN1533-4880
2011 Impact Factor: 1.563
2011 SCImago Journal Rankings: 0.087
DC Field
Value
dc.contributor.authorDing, L
dc.contributor.authorChen, TP
dc.contributor.authorLiu, Y
dc.contributor.authorNg, CY
dc.contributor.authorYang, M
dc.contributor.authorWong, JI
dc.contributor.authorZhu, FR
dc.contributor.authorTan, MC
dc.contributor.authorFung, SHY
dc.contributor.authorChen, X
dc.contributor.authorHuang, Y
dc.date.accessioned2010-09-06T08:10:08Z
dc.date.available2010-09-06T08:10:08Z
dc.date.issued2008
dc.identifier.citationJournal of Nanoscience and Nanotechnology, 2008, v. 8, p. 3555-3560 [How to Cite?]
dc.identifier.hkuros148716
dc.identifier.issn1533-4880
2011 Impact Factor: 1.563
2011 SCImago Journal Rankings: 0.087
dc.identifier.openurl
dc.identifier.urihttp://hdl.handle.net/10722/80775
dc.languageeng
dc.publisherAmerican Scientific Publishers. The Journal's web site is located at http://aspbs.com/jnn/
dc.relation.ispartofJournal of Nanoscience and Nanotechnology
dc.titleEvolution of photoluminescence mechanisms of Si+-implanted SiO2 films with thermal annealing
dc.typeArticle