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Conference Paper: Laser molecular beam epitaxy growth and properties of SrTiO3 thin films for microelectronic applications

TitleLaser molecular beam epitaxy growth and properties of SrTiO3 thin films for microelectronic applications
Authors
KeywordsHeteroepitaxy
Microelectronics
Silicon
Strontium titanate
Tunability
Issue Date2006
PublisherElsevier S.A. The Journal's web site is located at http://www.elsevier.com/locate/tsf
Citation
The 8th International Conference on Atomically Controlled Surfaces, Interfaces and Nanostructures and the 13th International Congress on Thin Films (ACSIN-8/ICTF-13), Stockholm, Sweden, 20-23 June 2005. In Thin Solid Films, 2006, v. 515 n. 2, p. 559-562 How to Cite?
Persistent Identifierhttp://hdl.handle.net/10722/80727
ISSN
2023 Impact Factor: 2.0
2023 SCImago Journal Rankings: 0.400
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorHao, JHen_HK
dc.contributor.authorGao, Jen_HK
dc.contributor.authorWong, HKen_HK
dc.date.accessioned2010-09-06T08:09:37Z-
dc.date.available2010-09-06T08:09:37Z-
dc.date.issued2006en_HK
dc.identifier.citationThe 8th International Conference on Atomically Controlled Surfaces, Interfaces and Nanostructures and the 13th International Congress on Thin Films (ACSIN-8/ICTF-13), Stockholm, Sweden, 20-23 June 2005. In Thin Solid Films, 2006, v. 515 n. 2, p. 559-562en_HK
dc.identifier.issn0040-6090en_HK
dc.identifier.urihttp://hdl.handle.net/10722/80727-
dc.languageengen_HK
dc.publisherElsevier S.A. The Journal's web site is located at http://www.elsevier.com/locate/tsfen_HK
dc.relation.ispartofThin Solid Filmsen_HK
dc.subjectHeteroepitaxy-
dc.subjectMicroelectronics-
dc.subjectSilicon-
dc.subjectStrontium titanate-
dc.subjectTunability-
dc.titleLaser molecular beam epitaxy growth and properties of SrTiO3 thin films for microelectronic applicationsen_HK
dc.typeConference_Paperen_HK
dc.identifier.emailHao, JH: jhhao@hku.hken_HK
dc.identifier.emailGao, J: jugao@hku.hken_HK
dc.identifier.authorityGao, J=rp00699en_HK
dc.identifier.doi10.1016/j.tsf.2005.12.297-
dc.identifier.scopuseid_2-s2.0-33748749073-
dc.identifier.hkuros112176en_HK
dc.identifier.hkuros130954-
dc.identifier.volume515-
dc.identifier.issue2-
dc.identifier.spage559-
dc.identifier.epage562-
dc.identifier.isiWOS:000241220600042-
dc.publisher.placeSwitzerland-
dc.identifier.issnl0040-6090-

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