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Article: Current-induced migration of surface adatoms during GaN growth by molecular beam epitaxy
Title | Current-induced migration of surface adatoms during GaN growth by molecular beam epitaxy |
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Authors | |
Keywords | A1. Surface processes A3. Molecular beam epitaxy B1. Nitrides B2. Semiconducting gallium compounds |
Issue Date | 2001 |
Publisher | Elsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/jcrysgro |
Citation | Journal Of Crystal Growth, 2001, v. 227-228, p. 376-380 How to Cite? |
Abstract | The influence of electric fields on surface migration of Gallium (Ga) and Nitrogen (N) adatoms is studied during GaN growth by molecular beam epitaxy (MBE). When a direct current (DC) is used to heat the sample, long distance migration of Ga adatoms and diffusion asymmetry of N adatoms at steps are observed. On the other hand, if an alternating current (AC) is used, no such preferential adatom migration is found. This effect is attributed to the effective positive charges of surface adatoms, representing an effect of electro-migration. The implications of such current-induced surface migration to GaN epitaxy are subsequently investigated. It is seen to firstly change the distribution of Ga adatoms on a growing surface, and thus make the growth to be Ga-limited at one side of the sample but N-limited at the other side. This leads to different optical qualities of the film and different morphologies of the surface. © 2001 Elsevier Science B.V. |
Persistent Identifier | http://hdl.handle.net/10722/80710 |
ISSN | 2023 Impact Factor: 1.7 2023 SCImago Journal Rankings: 0.379 |
ISI Accession Number ID | |
References |
DC Field | Value | Language |
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dc.contributor.author | Zheng, LX | en_HK |
dc.contributor.author | Xie, MH | en_HK |
dc.contributor.author | Xu, SJ | en_HK |
dc.contributor.author | Cheung, SH | en_HK |
dc.contributor.author | Tong, SY | en_HK |
dc.date.accessioned | 2010-09-06T08:09:26Z | - |
dc.date.available | 2010-09-06T08:09:26Z | - |
dc.date.issued | 2001 | en_HK |
dc.identifier.citation | Journal Of Crystal Growth, 2001, v. 227-228, p. 376-380 | en_HK |
dc.identifier.issn | 0022-0248 | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/80710 | - |
dc.description.abstract | The influence of electric fields on surface migration of Gallium (Ga) and Nitrogen (N) adatoms is studied during GaN growth by molecular beam epitaxy (MBE). When a direct current (DC) is used to heat the sample, long distance migration of Ga adatoms and diffusion asymmetry of N adatoms at steps are observed. On the other hand, if an alternating current (AC) is used, no such preferential adatom migration is found. This effect is attributed to the effective positive charges of surface adatoms, representing an effect of electro-migration. The implications of such current-induced surface migration to GaN epitaxy are subsequently investigated. It is seen to firstly change the distribution of Ga adatoms on a growing surface, and thus make the growth to be Ga-limited at one side of the sample but N-limited at the other side. This leads to different optical qualities of the film and different morphologies of the surface. © 2001 Elsevier Science B.V. | en_HK |
dc.language | eng | en_HK |
dc.publisher | Elsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/jcrysgro | en_HK |
dc.relation.ispartof | Journal of Crystal Growth | en_HK |
dc.rights | Journal of Crystal Growth. Copyright © Elsevier BV. | en_HK |
dc.subject | A1. Surface processes | en_HK |
dc.subject | A3. Molecular beam epitaxy | en_HK |
dc.subject | B1. Nitrides | en_HK |
dc.subject | B2. Semiconducting gallium compounds | en_HK |
dc.title | Current-induced migration of surface adatoms during GaN growth by molecular beam epitaxy | en_HK |
dc.type | Article | en_HK |
dc.identifier.openurl | http://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0022-0248&volume=227-228&spage=376&epage=380&date=2001&atitle=Current-Induced+Migration+of+Surface+Adatoms+During+GaN+Growth+by++Molecular+Beam+Epitaxy | en_HK |
dc.identifier.email | Xie, MH: mhxie@hku.hk | en_HK |
dc.identifier.email | Xu, SJ: sjxu@hku.hk | en_HK |
dc.identifier.authority | Xie, MH=rp00818 | en_HK |
dc.identifier.authority | Xu, SJ=rp00821 | en_HK |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1016/S0022-0248(01)00727-8 | en_HK |
dc.identifier.scopus | eid_2-s2.0-0035398060 | en_HK |
dc.identifier.hkuros | 62288 | en_HK |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-0035398060&selection=ref&src=s&origin=recordpage | en_HK |
dc.identifier.volume | 227-228 | en_HK |
dc.identifier.spage | 376 | en_HK |
dc.identifier.epage | 380 | en_HK |
dc.identifier.isi | WOS:000169557600074 | - |
dc.publisher.place | Netherlands | en_HK |
dc.identifier.scopusauthorid | Zheng, LX=7403405881 | en_HK |
dc.identifier.scopusauthorid | Xie, MH=7202255416 | en_HK |
dc.identifier.scopusauthorid | Xu, SJ=7404439005 | en_HK |
dc.identifier.scopusauthorid | Cheung, SH=13310365400 | en_HK |
dc.identifier.scopusauthorid | Tong, SY=24512624800 | en_HK |
dc.identifier.issnl | 0022-0248 | - |