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Article: Light-induced instability in current conduction of aluminum nitride thin films embedded with Al nanocrystals
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TitleLight-induced instability in current conduction of aluminum nitride thin films embedded with Al nanocrystals
 
AuthorsLiu, Z2
Chen, TP2
Liu, Y2
Ding, L2
Yang, M2
Wong, JI2
Cen, ZH2
Li, YB2
Zhang, S2
Fung, S1
 
KeywordsAluminum compounds
Charge trapping
Electric conductance
Magnetron sputtering
Nanocrystals
 
Issue Date2008
 
PublisherAmerican Institute of Physics. The Journal's web site is located at http://apl.aip.org/
 
CitationApplied Physics Letters, 2008, v. 92 n. 1 [How to Cite?]
DOI: http://dx.doi.org/10.1063/1.2828691
 
AbstractAl nanocrystals (nc-Al) embedded in AlN thin films have been synthesized by rf magnetron sputtering. The influence of ultraviolet (UV) illumination on electrical characteristics of the nc- AlAlN thin film system has been investigated. It is shown that the UV illumination could lead to a random change in the conductance of the thin film system. The change in the conductance is attributed to the charge trapping and detrapping in the nc-Al due to the UV illumination. © 2008 American Institute of Physics.
 
ISSN0003-6951
2012 Impact Factor: 3.794
2012 SCImago Journal Rankings: 1.938
 
DOIhttp://dx.doi.org/10.1063/1.2828691
 
ISI Accession Number IDWOS:000252284200132
 
ReferencesReferences in Scopus
 
DC FieldValue
dc.contributor.authorLiu, Z
 
dc.contributor.authorChen, TP
 
dc.contributor.authorLiu, Y
 
dc.contributor.authorDing, L
 
dc.contributor.authorYang, M
 
dc.contributor.authorWong, JI
 
dc.contributor.authorCen, ZH
 
dc.contributor.authorLi, YB
 
dc.contributor.authorZhang, S
 
dc.contributor.authorFung, S
 
dc.date.accessioned2010-09-06T08:07:46Z
 
dc.date.available2010-09-06T08:07:46Z
 
dc.date.issued2008
 
dc.description.abstractAl nanocrystals (nc-Al) embedded in AlN thin films have been synthesized by rf magnetron sputtering. The influence of ultraviolet (UV) illumination on electrical characteristics of the nc- AlAlN thin film system has been investigated. It is shown that the UV illumination could lead to a random change in the conductance of the thin film system. The change in the conductance is attributed to the charge trapping and detrapping in the nc-Al due to the UV illumination. © 2008 American Institute of Physics.
 
dc.description.naturepublished_or_final_version
 
dc.identifier.citationApplied Physics Letters, 2008, v. 92 n. 1 [How to Cite?]
DOI: http://dx.doi.org/10.1063/1.2828691
 
dc.identifier.doihttp://dx.doi.org/10.1063/1.2828691
 
dc.identifier.hkuros140636
 
dc.identifier.isiWOS:000252284200132
 
dc.identifier.issn0003-6951
2012 Impact Factor: 3.794
2012 SCImago Journal Rankings: 1.938
 
dc.identifier.issue1
 
dc.identifier.scopuseid_2-s2.0-38049010867
 
dc.identifier.urihttp://hdl.handle.net/10722/80558
 
dc.identifier.volume92
 
dc.languageeng
 
dc.publisherAmerican Institute of Physics. The Journal's web site is located at http://apl.aip.org/
 
dc.publisher.placeUnited States
 
dc.relation.ispartofApplied Physics Letters
 
dc.relation.referencesReferences in Scopus
 
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License
 
dc.rightsCopyright (2008) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in (Applied Physics Letters, 2008, v. 92 n. 1, article no. 013102) and may be found at (http://apl.aip.org/resource/1/applab/v92/i1/p013102_s1).
 
dc.subjectAluminum compounds
 
dc.subjectCharge trapping
 
dc.subjectElectric conductance
 
dc.subjectMagnetron sputtering
 
dc.subjectNanocrystals
 
dc.titleLight-induced instability in current conduction of aluminum nitride thin films embedded with Al nanocrystals
 
dc.typeArticle
 
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<contributor.author>Liu, Y</contributor.author>
<contributor.author>Ding, L</contributor.author>
<contributor.author>Yang, M</contributor.author>
<contributor.author>Wong, JI</contributor.author>
<contributor.author>Cen, ZH</contributor.author>
<contributor.author>Li, YB</contributor.author>
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<contributor.author>Fung, S</contributor.author>
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Author Affiliations
  1. The University of Hong Kong
  2. Nanyang Technological University