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Article: Improved Initial Epitaxial Growth of Superconducting YBa2Cu3O7 Thin Films on Y-ZrO2 Substrates with a La1.85Sr0.15CuO4 Buffer Layer

TitleImproved Initial Epitaxial Growth of Superconducting YBa2Cu3O7 Thin Films on Y-ZrO2 Substrates with a La1.85Sr0.15CuO4 Buffer Layer
Authors
Issue Date2000
PublisherElsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/physc
Citation
Physica C: Superconductivity and its Applications, 2000, v. 330, p. 160-164 How to Cite?
Persistent Identifierhttp://hdl.handle.net/10722/80549
ISSN
2023 Impact Factor: 1.3
2023 SCImago Journal Rankings: 0.339
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorGao, Jen_HK
dc.contributor.authorLian, GJen_HK
dc.contributor.authorXiong, GCen_HK
dc.date.accessioned2010-09-06T08:07:40Z-
dc.date.available2010-09-06T08:07:40Z-
dc.date.issued2000en_HK
dc.identifier.citationPhysica C: Superconductivity and its Applications, 2000, v. 330, p. 160-164en_HK
dc.identifier.issn0921-4534en_HK
dc.identifier.urihttp://hdl.handle.net/10722/80549-
dc.languageengen_HK
dc.publisherElsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/physcen_HK
dc.relation.ispartofPhysica C: Superconductivity and its Applicationsen_HK
dc.rightsPhysica C: Superconductivity and its Applications. Copyright © Elsevier BV.en_HK
dc.titleImproved Initial Epitaxial Growth of Superconducting YBa2Cu3O7 Thin Films on Y-ZrO2 Substrates with a La1.85Sr0.15CuO4 Buffer Layeren_HK
dc.typeArticleen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0921-4534&volume=330&spage=160&epage=164&date=2000&atitle=Improved+Initial+Epitaxial+Growth+of+Superconducting+YBa2Cu3O7+Thin+Films+on+Y-ZrO2+Substrates+with+a+La1.85Sr0.15CuO4+Buffer+Layeren_HK
dc.identifier.emailGao, J: jugao@hku.hken_HK
dc.identifier.authorityGao, J=rp00699en_HK
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1016/S0921-4534(99)00605-X-
dc.identifier.scopuseid_2-s2.0-0033896120-
dc.identifier.hkuros48243en_HK
dc.identifier.isiWOS:000085505200006-
dc.identifier.issnl0921-4534-

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