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- Publisher Website: 10.1016/S0025-5408(01)00623-7
- Scopus: eid_2-s2.0-0035815783
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Article: Deposition of High Quality CMR Thin Films by rf Magnetron Sputtering under Pure Argon Gas
| Title | Deposition of High Quality CMR Thin Films by rf Magnetron Sputtering under Pure Argon Gas |
|---|---|
| Authors | |
| Keywords | Electrical properties Epitaxial growth Oxides Sputtering Thin films |
| Issue Date | 2001 |
| Publisher | Pergamon. The Journal's web site is located at http://www.elsevier.com/locate/matresbu |
| Citation | Materials Research Bulletin, 2001, v. 36, p. 1463-1469 How to Cite? |
| Persistent Identifier | http://hdl.handle.net/10722/80524 |
| ISSN | 2023 Impact Factor: 5.3 2023 SCImago Journal Rankings: 0.918 |
| ISI Accession Number ID |
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Tang, W | en_HK |
| dc.contributor.author | Kam, TTL | en_HK |
| dc.contributor.author | Gao, J | en_HK |
| dc.date.accessioned | 2010-09-06T08:07:24Z | - |
| dc.date.available | 2010-09-06T08:07:24Z | - |
| dc.date.issued | 2001 | en_HK |
| dc.identifier.citation | Materials Research Bulletin, 2001, v. 36, p. 1463-1469 | en_HK |
| dc.identifier.issn | 0025-5408 | en_HK |
| dc.identifier.uri | http://hdl.handle.net/10722/80524 | - |
| dc.language | eng | en_HK |
| dc.publisher | Pergamon. The Journal's web site is located at http://www.elsevier.com/locate/matresbu | en_HK |
| dc.relation.ispartof | Materials Research Bulletin | en_HK |
| dc.subject | Electrical properties | - |
| dc.subject | Epitaxial growth | - |
| dc.subject | Oxides | - |
| dc.subject | Sputtering | - |
| dc.subject | Thin films | - |
| dc.title | Deposition of High Quality CMR Thin Films by rf Magnetron Sputtering under Pure Argon Gas | en_HK |
| dc.type | Article | en_HK |
| dc.identifier.openurl | http://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0025-5408&volume=36&spage=1463&epage=1469&date=2001&atitle=Deposition+of+High+Quality+CMR+Thin+Films+by+rf+Magnetron+Sputtering+under+Pure+Argon+Gas | en_HK |
| dc.identifier.email | Tang, W: whtang@aphy.iphy.ac.cn | en_HK |
| dc.identifier.email | Gao, J: jugao@hku.hk | en_HK |
| dc.identifier.authority | Gao, J=rp00699 | en_HK |
| dc.description.nature | link_to_subscribed_fulltext | - |
| dc.identifier.doi | 10.1016/S0025-5408(01)00623-7 | - |
| dc.identifier.scopus | eid_2-s2.0-0035815783 | - |
| dc.identifier.hkuros | 61276 | en_HK |
| dc.identifier.isi | WOS:000169004300033 | - |
| dc.identifier.issnl | 0025-5408 | - |