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Article: Deposition of High Quality CMR Thin Films by rf Magnetron Sputtering under Pure Argon Gas

TitleDeposition of High Quality CMR Thin Films by rf Magnetron Sputtering under Pure Argon Gas
Authors
Issue Date2001
PublisherPergamon. The Journal's web site is located at http://www.elsevier.com/locate/matresbu
Citation
Materials Research Bulletin, 2001, v. 36, p. 1463-1469 How to Cite?
Persistent Identifierhttp://hdl.handle.net/10722/80524
ISSN
2015 Impact Factor: 2.435
2015 SCImago Journal Rankings: 0.753
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorTang, Wen_HK
dc.contributor.authorKam, TTLen_HK
dc.contributor.authorGao, Jen_HK
dc.date.accessioned2010-09-06T08:07:24Z-
dc.date.available2010-09-06T08:07:24Z-
dc.date.issued2001en_HK
dc.identifier.citationMaterials Research Bulletin, 2001, v. 36, p. 1463-1469en_HK
dc.identifier.issn0025-5408en_HK
dc.identifier.urihttp://hdl.handle.net/10722/80524-
dc.languageengen_HK
dc.publisherPergamon. The Journal's web site is located at http://www.elsevier.com/locate/matresbuen_HK
dc.relation.ispartofMaterials Research Bulletinen_HK
dc.titleDeposition of High Quality CMR Thin Films by rf Magnetron Sputtering under Pure Argon Gasen_HK
dc.typeArticleen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0025-5408&volume=36&spage=1463&epage=1469&date=2001&atitle=Deposition+of+High+Quality+CMR+Thin+Films+by+rf+Magnetron+Sputtering+under+Pure+Argon+Gasen_HK
dc.identifier.emailTang, W: whtang@aphy.iphy.ac.cnen_HK
dc.identifier.emailGao, J: jugao@hku.hken_HK
dc.identifier.authorityGao, J=rp00699en_HK
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1016/S0025-5408(01)00623-7-
dc.identifier.scopuseid_2-s2.0-0035815783-
dc.identifier.hkuros61276en_HK
dc.identifier.isiWOS:000169004300033-

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