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Article: Current-induced electroresistance in tetravalent cation-doped La0.9Hf0.1MnO3 epitaxial thin films
Title | Current-induced electroresistance in tetravalent cation-doped La0.9Hf0.1MnO3 epitaxial thin films |
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Authors | |
Keywords | Electroresistance La0.9Hf0.1MnO3 Thin film |
Issue Date | 2007 |
Publisher | Elsevier SA. The Journal's web site is located at http://www.elsevier.com/locate/mseb |
Citation | Materials Science and Engineering B: Solid-State Materials for Advanced Technology, 2007, v. 144, p. 97-99 How to Cite? |
Persistent Identifier | http://hdl.handle.net/10722/80427 |
ISSN | 2023 Impact Factor: 6.1 2023 SCImago Journal Rankings: 1.660 |
ISI Accession Number ID |
DC Field | Value | Language |
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dc.contributor.author | Gao, J | en_HK |
dc.contributor.author | Wang, L | en_HK |
dc.date.accessioned | 2010-09-06T08:06:20Z | - |
dc.date.available | 2010-09-06T08:06:20Z | - |
dc.date.issued | 2007 | en_HK |
dc.identifier.citation | Materials Science and Engineering B: Solid-State Materials for Advanced Technology, 2007, v. 144, p. 97-99 | en_HK |
dc.identifier.issn | 0921-5093 | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/80427 | - |
dc.language | eng | en_HK |
dc.publisher | Elsevier SA. The Journal's web site is located at http://www.elsevier.com/locate/mseb | en_HK |
dc.relation.ispartof | Materials Science and Engineering B: Solid-State Materials for Advanced Technology | en_HK |
dc.subject | Electroresistance | - |
dc.subject | La0.9Hf0.1MnO3 | - |
dc.subject | Thin film | - |
dc.title | Current-induced electroresistance in tetravalent cation-doped La0.9Hf0.1MnO3 epitaxial thin films | en_HK |
dc.type | Article | en_HK |
dc.identifier.openurl | http://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0921-5093&volume=144&spage=97&epage=99&date=2007&atitle=Current-induced+electroresistance+in+tetravalent+cation-doped+La0.9Hf0.1MnO3+epitaxial+thin+films | en_HK |
dc.identifier.email | Gao, J: jugao@hku.hk | en_HK |
dc.identifier.authority | Gao, J=rp00699 | en_HK |
dc.identifier.scopus | eid_2-s2.0-35748952797 | - |
dc.identifier.hkuros | 138844 | en_HK |
dc.identifier.isi | WOS:000251744600021 | - |
dc.identifier.issnl | 0921-5093 | - |