Article: The influence of the implantation dose and energy on the electroluminescence of Si+-implanted amorphous SiO2 thin films
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| Title | The influence of the implantation dose and energy on the electroluminescence of Si+-implanted amorphous SiO2 thin films |
|---|---|
| Authors | Ding, L Chen, TP Liu, Y Yang, M Wong, JI Liu, KY Zhu, FR Fung, SHY |
| Issue Date | 2007 |
| Publisher | Institute of Physics Publishing. The Journal's web site is located at http://www.iop.org/journals/nano |
| Citation | Nanotechnology, 2007, v. 18, p. 455306: 1-6 [How to Cite?] |
| ISSN | 0957-4484 2011 Impact Factor: 3.979 2011 SCImago Journal Rankings: 0.266 |
| dc.contributor.author | Ding, L |
|---|---|
| dc.contributor.author | Chen, TP |
| dc.contributor.author | Liu, Y |
| dc.contributor.author | Yang, M |
| dc.contributor.author | Wong, JI |
| dc.contributor.author | Liu, KY |
| dc.contributor.author | Zhu, FR |
| dc.contributor.author | Fung, SHY |
| dc.date.accessioned | 2010-09-06T08:06:00Z |
| dc.date.available | 2010-09-06T08:06:00Z |
| dc.date.issued | 2007 |
| dc.identifier.citation | Nanotechnology, 2007, v. 18, p. 455306: 1-6 [How to Cite?] |
| dc.identifier.hkuros | 139217 |
| dc.identifier.issn | 0957-4484 2011 Impact Factor: 3.979 2011 SCImago Journal Rankings: 0.266 |
| dc.identifier.openurl | |
| dc.identifier.uri | http://hdl.handle.net/10722/80396 |
| dc.language | eng |
| dc.publisher | Institute of Physics Publishing. The Journal's web site is located at http://www.iop.org/journals/nano |
| dc.relation.ispartof | Nanotechnology |
| dc.title | The influence of the implantation dose and energy on the electroluminescence of Si+-implanted amorphous SiO2 thin films |
| dc.type | Article |