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Conference Paper: Characterization of oxide thin films using optical techniques
Title | Characterization of oxide thin films using optical techniques |
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Authors | |
Keywords | Carrier mobility Hall effect Microstructure Optoelectronic devices Oxides Photoconductivity Tungsten compounds |
Issue Date | 2006 |
Publisher | Elsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/apsusc |
Citation | Symposium P of the Spring Meeting of the European-Materials-Research-Society entitled Curent Trends in Optical and X-ray Meterology of Advanced Materials for Nanoscale Devices, Strasbourg, France, 31 May-03 JUN 2005. In Applied Surface Science, 2006, v. 253, p. 372-375 How to Cite? |
Abstract | Thin films of oxide materials are playing a growing role as critical elements in optoelectronic devices and nanoscale devices. In this work, thin films of some typical oxides such as WO3, Ga2O3 and SrTiO3 were investigated. We present measurements of those films, using various optical techniques like photoconductivity transients over a wide time range and photo-Hall measurements. Analysis of the photo-Hall and photoconductivity data permits the determination of the contribution to the photoconductivity made by the carrier mobility and concentration. A model for dispersive carrier transport was proposed to explain the relaxation of the photoconductivity in oxide thin films. In addition, photoluminescence characterization was used to study microstructures and energy band in oxide thin films. The broad emission from oxide host, consisting of several band peaks, was likely due to a recombination process with several possible paths. The dependence of the luminescent intensity on the annealing atmosphere was associated with the presence of oxygen vacancies. It is suggested that our optical analysis efforts have improved the understanding of oxide thin films, and this should lead to the necessary advancements in a variety of devices. |
Persistent Identifier | http://hdl.handle.net/10722/80369 |
ISSN | 2023 Impact Factor: 6.3 2023 SCImago Journal Rankings: 1.210 |
ISI Accession Number ID |
DC Field | Value | Language |
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dc.contributor.author | Hao, JH | en_HK |
dc.contributor.author | Gao, J | en_HK |
dc.date.accessioned | 2010-09-06T08:05:41Z | - |
dc.date.available | 2010-09-06T08:05:41Z | - |
dc.date.issued | 2006 | en_HK |
dc.identifier.citation | Symposium P of the Spring Meeting of the European-Materials-Research-Society entitled Curent Trends in Optical and X-ray Meterology of Advanced Materials for Nanoscale Devices, Strasbourg, France, 31 May-03 JUN 2005. In Applied Surface Science, 2006, v. 253, p. 372-375 | en_HK |
dc.identifier.issn | 0169-4332 | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/80369 | - |
dc.description.abstract | Thin films of oxide materials are playing a growing role as critical elements in optoelectronic devices and nanoscale devices. In this work, thin films of some typical oxides such as WO3, Ga2O3 and SrTiO3 were investigated. We present measurements of those films, using various optical techniques like photoconductivity transients over a wide time range and photo-Hall measurements. Analysis of the photo-Hall and photoconductivity data permits the determination of the contribution to the photoconductivity made by the carrier mobility and concentration. A model for dispersive carrier transport was proposed to explain the relaxation of the photoconductivity in oxide thin films. In addition, photoluminescence characterization was used to study microstructures and energy band in oxide thin films. The broad emission from oxide host, consisting of several band peaks, was likely due to a recombination process with several possible paths. The dependence of the luminescent intensity on the annealing atmosphere was associated with the presence of oxygen vacancies. It is suggested that our optical analysis efforts have improved the understanding of oxide thin films, and this should lead to the necessary advancements in a variety of devices. | - |
dc.language | eng | en_HK |
dc.publisher | Elsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/apsusc | en_HK |
dc.relation.ispartof | Applied Surface Science | en_HK |
dc.rights | Applied Surface Science. Copyright © Elsevier BV. | en_HK |
dc.subject | Carrier mobility | - |
dc.subject | Hall effect | - |
dc.subject | Microstructure | - |
dc.subject | Optoelectronic devices | - |
dc.subject | Oxides | - |
dc.subject | Photoconductivity | - |
dc.subject | Tungsten compounds | - |
dc.title | Characterization of oxide thin films using optical techniques | en_HK |
dc.type | Conference_Paper | en_HK |
dc.identifier.openurl | http://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0169-4332&volume=253&spage=372&epage=375&date=2006&atitle=Characterization+of+oxide+thin+films+using+optical+techniques | en_HK |
dc.identifier.email | Hao, JH: jhhao@hku.hk | en_HK |
dc.identifier.email | Gao, J: jugao@hku.hk | en_HK |
dc.identifier.authority | Gao, J=rp00699 | en_HK |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1016/j.apsusc.2006.06.016 | - |
dc.identifier.scopus | eid_2-s2.0-33750530836 | - |
dc.identifier.hkuros | 130945 | en_HK |
dc.identifier.isi | WOS:000242317500071 | - |
dc.description.other | Symposium P of the Spring Meeting of the European-Materials-Research-Society entitled Curent Trends in Optical and X-ray Meterology of Advanced Materials for Nanoscale Devices, Strasbourg, France, 31 May-03 JUN 2005. In Applied Surface Science, 2006, v. 253, p. 372-375 | - |
dc.identifier.issnl | 0169-4332 | - |