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Article: Structure and wear properties of NiTi modified by nitrogen plasma immersion ion implantation

TitleStructure and wear properties of NiTi modified by nitrogen plasma immersion ion implantation
Authors
KeywordsNickel titanium shape memory alloy
Plasma immersion ion implantation
Structure
Wear
Issue Date2007
PublisherElsevier SA. The Journal's web site is located at http://www.elsevier.com/locate/msea
Citation
Materials Science And Engineering A, 2007, v. 444 n. 1-2, p. 192-197 How to Cite?
AbstractNiTi shape memory alloy samples were plasma-implanted with nitrogen at voltages ranging from -10 to -40 kV. X-ray photoelectron spectroscopy results disclose the formation of gradient TiN layers which thicknesses and elemental in-depth distributions depend on the applied voltages. The effects of the implantation voltages on the wear characteristics were investigated by pin-on-disk tests. In the initial period of our friction test, the implanted samples exhibit low friction coefficients compared to the untreated sample. The wear resistance of the plasma-implanted NiTi samples increases with implantation voltages and decreases with the applied loads. Our results reveal that the wear mechanism of the implanted samples is adhesive-dominant under low applied loads but becomes abrasive-dominant at high applied loads. © 2006 Elsevier B.V. All rights reserved.
Persistent Identifierhttp://hdl.handle.net/10722/79604
ISSN
2015 Impact Factor: 2.647
2015 SCImago Journal Rankings: 1.803
ISI Accession Number ID
References

 

DC FieldValueLanguage
dc.contributor.authorLiu, Xen_HK
dc.contributor.authorWu, Sen_HK
dc.contributor.authorChan, YLen_HK
dc.contributor.authorChu, PKen_HK
dc.contributor.authorChung, CYen_HK
dc.contributor.authorChu, CLen_HK
dc.contributor.authorYeung, KWKen_HK
dc.contributor.authorLu, WWen_HK
dc.contributor.authorCheung, KMCen_HK
dc.contributor.authorLuk, KDKen_HK
dc.date.accessioned2010-09-06T07:56:32Z-
dc.date.available2010-09-06T07:56:32Z-
dc.date.issued2007en_HK
dc.identifier.citationMaterials Science And Engineering A, 2007, v. 444 n. 1-2, p. 192-197en_HK
dc.identifier.issn0921-5093en_HK
dc.identifier.urihttp://hdl.handle.net/10722/79604-
dc.description.abstractNiTi shape memory alloy samples were plasma-implanted with nitrogen at voltages ranging from -10 to -40 kV. X-ray photoelectron spectroscopy results disclose the formation of gradient TiN layers which thicknesses and elemental in-depth distributions depend on the applied voltages. The effects of the implantation voltages on the wear characteristics were investigated by pin-on-disk tests. In the initial period of our friction test, the implanted samples exhibit low friction coefficients compared to the untreated sample. The wear resistance of the plasma-implanted NiTi samples increases with implantation voltages and decreases with the applied loads. Our results reveal that the wear mechanism of the implanted samples is adhesive-dominant under low applied loads but becomes abrasive-dominant at high applied loads. © 2006 Elsevier B.V. All rights reserved.en_HK
dc.languageengen_HK
dc.publisherElsevier SA. The Journal's web site is located at http://www.elsevier.com/locate/mseaen_HK
dc.relation.ispartofMaterials Science and Engineering Aen_HK
dc.subjectNickel titanium shape memory alloyen_HK
dc.subjectPlasma immersion ion implantationen_HK
dc.subjectStructureen_HK
dc.subjectWearen_HK
dc.titleStructure and wear properties of NiTi modified by nitrogen plasma immersion ion implantationen_HK
dc.typeArticleen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0921-5093&volume=444&issue=1-2&spage=192&epage=7&date=2007&atitle=Structure+and+wear+properties+of+NiTi+modified+by+nitrogen+plasma+immersion+ion+implantationen_HK
dc.identifier.emailYeung, KWK:wkkyeung@hkucc.hku.hken_HK
dc.identifier.emailLu, WW:wwlu@hku.hken_HK
dc.identifier.emailCheung, KMC:cheungmc@hku.hken_HK
dc.identifier.emailLuk, KDK:hcm21000@hku.hken_HK
dc.identifier.authorityYeung, KWK=rp00309en_HK
dc.identifier.authorityLu, WW=rp00411en_HK
dc.identifier.authorityCheung, KMC=rp00387en_HK
dc.identifier.authorityLuk, KDK=rp00333en_HK
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1016/j.msea.2006.08.071en_HK
dc.identifier.scopuseid_2-s2.0-33845254775en_HK
dc.identifier.hkuros137134en_HK
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-33845254775&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume444en_HK
dc.identifier.issue1-2en_HK
dc.identifier.spage192en_HK
dc.identifier.epage197en_HK
dc.identifier.isiWOS:000243624000025-
dc.publisher.placeSwitzerlanden_HK
dc.identifier.scopusauthoridLiu, X=8408205200en_HK
dc.identifier.scopusauthoridWu, S=15125218800en_HK
dc.identifier.scopusauthoridChan, YL=8250546500en_HK
dc.identifier.scopusauthoridChu, PK=36040705700en_HK
dc.identifier.scopusauthoridChung, CY=8100842800en_HK
dc.identifier.scopusauthoridChu, CL=7404345713en_HK
dc.identifier.scopusauthoridYeung, KWK=13309584700en_HK
dc.identifier.scopusauthoridLu, WW=7404215221en_HK
dc.identifier.scopusauthoridCheung, KMC=7402406754en_HK
dc.identifier.scopusauthoridLuk, KDK=7201921573en_HK

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