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Article: 染料敏化分解水制氢技术进展
Title | 染料敏化分解水制氢技术进展 Progress of dye-sensitized water-splitting for hydrogen production |
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Authors | |
Keywords | 染料敏化 (Dye-sensitization) 制氢 (Hydrogen production) 光催化 (Photocatalysis) 可再生能源 (Renewable energy) |
Issue Date | 2006 |
Publisher | Ministry of Information Industry. The Journal's web site is located at http://www.cjpstj.com/ |
Citation | 电源技术, 2006, v. 30 n. 10, p. 856-859 How to Cite? |
Abstract | 介绍了染料敏化分解水制氢的基本原理。综述了染料分子的选取,使用氧化还原调节剂的机理和研究进展。指出
染料分子对光谱的吸收特性,激发态染料分子能级与半导体导带的相对位置,染料分子与半导体的吸附情况,表面键
合强度直接影响对光子的吸收,电子的注入,从而影响产氢量。此外,I
-/I3
-作为氧化还原调节剂可有效还原染料分子,
实现持续产氢。最后提出了染料敏化分解水制氢的间歇式反应器结构,以及通过选择用于敏化的半导体来提高产氢率
的思路。 The mechanism of dye-sensitized water-splitting for hydrogen production is introduced. Research works on the use of different dye molecules and redox mediators are review ed. It is found that the light absorption characteristics of dye molecules, excited dye potential level, the relative position of semiconductor conduction band, the adsorption of dye molecules on the surface of semiconductor, as well as the bonding between dye molecules and semiconductor, determine the photon absorption and electron injection, thus affect the hydrogen production. Besides, the use of I-/I3- can effectively regenerate oxidized dye molecules, realizing sustained hydrogen production.In the end,an intermittent photoreactor is proposed,and the direction of selecting semiconductor materials is discussed |
Persistent Identifier | http://hdl.handle.net/10722/76145 |
ISSN |
DC Field | Value | Language |
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dc.contributor.author | Ni, M | - |
dc.contributor.author | Leung, MKH | - |
dc.contributor.author | Leung, YC | - |
dc.date.accessioned | 2010-09-06T07:18:04Z | - |
dc.date.available | 2010-09-06T07:18:04Z | - |
dc.date.issued | 2006 | - |
dc.identifier.citation | 电源技术, 2006, v. 30 n. 10, p. 856-859 | - |
dc.identifier.issn | 1002-087X | - |
dc.identifier.uri | http://hdl.handle.net/10722/76145 | - |
dc.description.abstract | 介绍了染料敏化分解水制氢的基本原理。综述了染料分子的选取,使用氧化还原调节剂的机理和研究进展。指出 染料分子对光谱的吸收特性,激发态染料分子能级与半导体导带的相对位置,染料分子与半导体的吸附情况,表面键 合强度直接影响对光子的吸收,电子的注入,从而影响产氢量。此外,I -/I3 -作为氧化还原调节剂可有效还原染料分子, 实现持续产氢。最后提出了染料敏化分解水制氢的间歇式反应器结构,以及通过选择用于敏化的半导体来提高产氢率 的思路。 | - |
dc.description.abstract | The mechanism of dye-sensitized water-splitting for hydrogen production is introduced. Research works on the use of different dye molecules and redox mediators are review ed. It is found that the light absorption characteristics of dye molecules, excited dye potential level, the relative position of semiconductor conduction band, the adsorption of dye molecules on the surface of semiconductor, as well as the bonding between dye molecules and semiconductor, determine the photon absorption and electron injection, thus affect the hydrogen production. Besides, the use of I-/I3- can effectively regenerate oxidized dye molecules, realizing sustained hydrogen production.In the end,an intermittent photoreactor is proposed,and the direction of selecting semiconductor materials is discussed | - |
dc.language | chi | - |
dc.publisher | Ministry of Information Industry. The Journal's web site is located at http://www.cjpstj.com/ | - |
dc.relation.ispartof | 电源技术 = Chinese Journal of Power Sources | - |
dc.subject | 染料敏化 (Dye-sensitization) | - |
dc.subject | 制氢 (Hydrogen production) | - |
dc.subject | 光催化 (Photocatalysis) | - |
dc.subject | 可再生能源 (Renewable energy) | - |
dc.title | 染料敏化分解水制氢技术进展 | - |
dc.title | Progress of dye-sensitized water-splitting for hydrogen production | - |
dc.type | Article | - |
dc.identifier.email | Leung, MKH: mkhleung@HKUCC.hku.hk | - |
dc.identifier.email | Leung, YC: ycleung@hku.hk | - |
dc.identifier.authority | Leung, MKH=rp00148 | - |
dc.description.nature | published_or_final_version | - |
dc.identifier.hkuros | 129404 | - |
dc.identifier.volume | 30 | - |
dc.identifier.issue | 10 | - |
dc.identifier.spage | 856 | - |
dc.identifier.epage | 859 | - |
dc.publisher.place | Tianjin, China | - |
dc.identifier.issnl | 1002-087X | - |