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Article: Fabrication of Ni-Al thin film by PLD and properties of Ni3Al thin coatings

TitleFabrication of Ni-Al thin film by PLD and properties of Ni3Al thin coatings
Authors
Issue Date2000
PublisherElsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/matlet
Citation
Materials Letters, 2000, v. 44 n. 5, p. 314-318 How to Cite?
AbstractThe as-deposited Ni-Al films, fabricated at 673 K by pulsed laser deposition (PLD), were annealed at 1073 K for 1 h to produce a new type of intermetallic coating with a two-phase Ni3Al + Ni equiaxed grain structure. Due to the similarities between Ni3Al and Ni in lattice parameters and crystallography, the coatings exhibit good adhesion to the substrates, and at the same time, provide the latter with significantly improved surface strength (hardness) and corrosion resistance.
Persistent Identifierhttp://hdl.handle.net/10722/75690
ISSN
2015 Impact Factor: 2.437
2015 SCImago Journal Rankings: 0.807
ISI Accession Number ID
References

 

DC FieldValueLanguage
dc.contributor.authorXu, WHen_HK
dc.contributor.authorMeng, XKen_HK
dc.contributor.authorNgan, AHWen_HK
dc.contributor.authorChen, XYen_HK
dc.contributor.authorLiu, ZGen_HK
dc.date.accessioned2010-09-06T07:13:37Z-
dc.date.available2010-09-06T07:13:37Z-
dc.date.issued2000en_HK
dc.identifier.citationMaterials Letters, 2000, v. 44 n. 5, p. 314-318en_HK
dc.identifier.issn0167-577Xen_HK
dc.identifier.urihttp://hdl.handle.net/10722/75690-
dc.description.abstractThe as-deposited Ni-Al films, fabricated at 673 K by pulsed laser deposition (PLD), were annealed at 1073 K for 1 h to produce a new type of intermetallic coating with a two-phase Ni3Al + Ni equiaxed grain structure. Due to the similarities between Ni3Al and Ni in lattice parameters and crystallography, the coatings exhibit good adhesion to the substrates, and at the same time, provide the latter with significantly improved surface strength (hardness) and corrosion resistance.en_HK
dc.languageengen_HK
dc.publisherElsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/matleten_HK
dc.relation.ispartofMaterials Lettersen_HK
dc.rightsMaterials Letters. Copyright © Elsevier BV.en_HK
dc.titleFabrication of Ni-Al thin film by PLD and properties of Ni3Al thin coatingsen_HK
dc.typeArticleen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0167-577X&volume=44&spage=314&epage=318&date=2000&atitle=Fabrication+of+Ni-Al+thin+film+by+PLD+and+Properties+of+Ni3Al+thin+Coatingsen_HK
dc.identifier.emailNgan, AHW:hwngan@hkucc.hku.hken_HK
dc.identifier.authorityNgan, AHW=rp00225en_HK
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1016/S0167-577X(00)00051-3en_HK
dc.identifier.scopuseid_2-s2.0-0033706045en_HK
dc.identifier.hkuros58758en_HK
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-0033706045&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume44en_HK
dc.identifier.issue5en_HK
dc.identifier.spage314en_HK
dc.identifier.epage318en_HK
dc.identifier.isiWOS:000087820200011-
dc.publisher.placeNetherlandsen_HK
dc.identifier.scopusauthoridXu, WH=36024783500en_HK
dc.identifier.scopusauthoridMeng, XK=7401630110en_HK
dc.identifier.scopusauthoridNgan, AHW=7006827202en_HK
dc.identifier.scopusauthoridChen, XY=36062515400en_HK
dc.identifier.scopusauthoridLiu, ZG=8730149300en_HK

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