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Article: Routine Os analysis by isotope dilution-inductively coupled plasma mass spectrometry: OsO4 in water solution gives high sensitivity

TitleRoutine Os analysis by isotope dilution-inductively coupled plasma mass spectrometry: OsO4 in water solution gives high sensitivity
Authors
Issue Date2001
PublisherRoyal Society of Chemistry. The Journal's web site is located at http://www.rsc.org/jaas
Citation
Journal Of Analytical Atomic Spectrometry, 2001, v. 16 n. 4, p. 345-349 How to Cite?
AbstractOs(IV) in 5% HCl+5% ethanol solution and Os(VIII) in water solution are stable and the latter gives 30 times higher sensitivity than the former for ICP-MS analysis. The use of an offline OsO4 generator can effectively convert osmium to Os(VIII) and allows thorough cleaning after each sample preparation. The instrument memory for Os can be effectively cleaned by alternately flushing with 30% H2O2 and 5% HNO3 for 10 min. In order to overcome the analytical difficulties such as possible loss of the volatile OsO4 during sample preparation and long equilibrium time for Os analysis by ICP-MS, an isotope dilution (ID) method was adopted in this study. The ID-ICP-MS technique enables us to measure samples with Os content as low as 0.03 ng g-1, after Os is converted to OsO4 and trapped in water solution. This method has been applied to a series of eight Chinese national standard reference materials, ranging from soil, sediments, peridotite, to sulfide. The results are in good agreement with the certified values. The method precision is better than 6% RSD.
Persistent Identifierhttp://hdl.handle.net/10722/72547
ISSN
2015 Impact Factor: 3.379
2015 SCImago Journal Rankings: 1.022
ISI Accession Number ID
References

 

DC FieldValueLanguage
dc.contributor.authorSun, Yen_HK
dc.contributor.authorZhou, MFen_HK
dc.contributor.authorSun, Men_HK
dc.date.accessioned2010-09-06T06:42:52Z-
dc.date.available2010-09-06T06:42:52Z-
dc.date.issued2001en_HK
dc.identifier.citationJournal Of Analytical Atomic Spectrometry, 2001, v. 16 n. 4, p. 345-349en_HK
dc.identifier.issn0267-9477en_HK
dc.identifier.urihttp://hdl.handle.net/10722/72547-
dc.description.abstractOs(IV) in 5% HCl+5% ethanol solution and Os(VIII) in water solution are stable and the latter gives 30 times higher sensitivity than the former for ICP-MS analysis. The use of an offline OsO4 generator can effectively convert osmium to Os(VIII) and allows thorough cleaning after each sample preparation. The instrument memory for Os can be effectively cleaned by alternately flushing with 30% H2O2 and 5% HNO3 for 10 min. In order to overcome the analytical difficulties such as possible loss of the volatile OsO4 during sample preparation and long equilibrium time for Os analysis by ICP-MS, an isotope dilution (ID) method was adopted in this study. The ID-ICP-MS technique enables us to measure samples with Os content as low as 0.03 ng g-1, after Os is converted to OsO4 and trapped in water solution. This method has been applied to a series of eight Chinese national standard reference materials, ranging from soil, sediments, peridotite, to sulfide. The results are in good agreement with the certified values. The method precision is better than 6% RSD.en_HK
dc.languageengen_HK
dc.publisherRoyal Society of Chemistry. The Journal's web site is located at http://www.rsc.org/jaasen_HK
dc.relation.ispartofJournal of Analytical Atomic Spectrometryen_HK
dc.titleRoutine Os analysis by isotope dilution-inductively coupled plasma mass spectrometry: OsO4 in water solution gives high sensitivityen_HK
dc.typeArticleen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0267-9477&volume=16 &issue=4&spage=345&epage=349&date=2001&atitle=Routine+Os+analysis+by+isotope+dilution-inductively+coupled+plasma+mass+spectrometry:+OsO4+in+water+solution+gives+high+sensitivity.en_HK
dc.identifier.emailZhou, MF:mfzhou@hkucc.hku.hken_HK
dc.identifier.emailSun, M:minsun@hku.hken_HK
dc.identifier.authorityZhou, MF=rp00844en_HK
dc.identifier.authoritySun, M=rp00780en_HK
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1039/b008533men_HK
dc.identifier.scopuseid_2-s2.0-0035311505en_HK
dc.identifier.hkuros57981en_HK
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-0035311505&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume16en_HK
dc.identifier.issue4en_HK
dc.identifier.spage345en_HK
dc.identifier.epage349en_HK
dc.identifier.isiWOS:000167871900008-
dc.publisher.placeUnited Kingdomen_HK
dc.identifier.scopusauthoridSun, Y=7406433515en_HK
dc.identifier.scopusauthoridZhou, MF=7403506005en_HK
dc.identifier.scopusauthoridSun, M=25932315800en_HK

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