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Article: Trihalomethane formation potentials of organic pollutants in wastewater discharge

TitleTrihalomethane formation potentials of organic pollutants in wastewater discharge
Authors
Issue Date2002
PublisherI W A Publishing. The Journal's web site is located at http://www.iwapublishing.com/template.cfm?name=iwapwst
Citation
Water Science And Technology, 2002, v. 46 n. 11-12, p. 401-406 How to Cite?
AbstractDrinking water resources contaminated by wastewater discharge could have great risk of trihalomethane (THM) formation upon chlorine disinfection during treatment. In the present study, THM formation potentials (THMFP) of the organic pollutants in the raw sewage and treated secondary effluent collected from full-scale wastewater treatment plants were characterised. The organic matter remaining in the secondary effluent had higher unit carbon THMFP in comparison with that in the raw sewage. However, owing to removal of organic pollutants in the treatment works, the overall THMFP of the wastewater was reduced significantly throughout the biological treatment process. Using XAD-8 resin, organic materials in the wastewater samples were separated into hydrophobic and hydrophilic fractions. Hydrophobic organic, which possesses higher THMFP than hydrophilic organic, was the predominant THM precursor in wastewater discharge. Ozonation could be used to alter the properties of organic matter, particularly the hydrophobic fraction, and reduce its THMFP.
Persistent Identifierhttp://hdl.handle.net/10722/70844
ISSN
2015 Impact Factor: 1.064
2015 SCImago Journal Rankings: 0.469
ISI Accession Number ID
References

 

DC FieldValueLanguage
dc.contributor.authorChu, HPen_HK
dc.contributor.authorWong, JHCen_HK
dc.contributor.authorLi, XYen_HK
dc.date.accessioned2010-09-06T06:26:37Z-
dc.date.available2010-09-06T06:26:37Z-
dc.date.issued2002en_HK
dc.identifier.citationWater Science And Technology, 2002, v. 46 n. 11-12, p. 401-406en_HK
dc.identifier.issn0273-1223en_HK
dc.identifier.urihttp://hdl.handle.net/10722/70844-
dc.description.abstractDrinking water resources contaminated by wastewater discharge could have great risk of trihalomethane (THM) formation upon chlorine disinfection during treatment. In the present study, THM formation potentials (THMFP) of the organic pollutants in the raw sewage and treated secondary effluent collected from full-scale wastewater treatment plants were characterised. The organic matter remaining in the secondary effluent had higher unit carbon THMFP in comparison with that in the raw sewage. However, owing to removal of organic pollutants in the treatment works, the overall THMFP of the wastewater was reduced significantly throughout the biological treatment process. Using XAD-8 resin, organic materials in the wastewater samples were separated into hydrophobic and hydrophilic fractions. Hydrophobic organic, which possesses higher THMFP than hydrophilic organic, was the predominant THM precursor in wastewater discharge. Ozonation could be used to alter the properties of organic matter, particularly the hydrophobic fraction, and reduce its THMFP.en_HK
dc.languageengen_HK
dc.publisherI W A Publishing. The Journal's web site is located at http://www.iwapublishing.com/template.cfm?name=iwapwsten_HK
dc.relation.ispartofWater Science and Technologyen_HK
dc.subject.meshDisinfectantsen_HK
dc.subject.meshOrganic Chemicalsen_HK
dc.subject.meshOxidants, Photochemical - chemistryen_HK
dc.subject.meshOzone - chemistryen_HK
dc.subject.meshRisk Assessmenten_HK
dc.subject.meshTrihalomethanes - analysis - chemistryen_HK
dc.subject.meshWaste Disposal, Fluid - methodsen_HK
dc.subject.meshWater Supplyen_HK
dc.titleTrihalomethane formation potentials of organic pollutants in wastewater dischargeen_HK
dc.typeArticleen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0273-1223&volume=46&spage=401&epage=406&date=2002&atitle=Trihalomethane+formation+potentials+of+organic+pollutants+in+wastewater+dischargeen_HK
dc.identifier.emailLi, XY:xlia@hkucc.hku.hken_HK
dc.identifier.authorityLi, XY=rp00222en_HK
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.pmid12523785-
dc.identifier.scopuseid_2-s2.0-0036946172en_HK
dc.identifier.hkuros75997en_HK
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-0036946172&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume46en_HK
dc.identifier.issue11-12en_HK
dc.identifier.spage401en_HK
dc.identifier.epage406en_HK
dc.identifier.isiWOS:000180041000063-
dc.publisher.placeUnited Kingdomen_HK
dc.identifier.scopusauthoridChu, HP=36870373000en_HK
dc.identifier.scopusauthoridWong, JHC=23967182900en_HK
dc.identifier.scopusauthoridLi, XY=26642887900en_HK

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