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Article: Factors affecting phase and height contrast of diblock copolymer PS-b-PEO thin films in dynamic force mode atomic force microscopy

TitleFactors affecting phase and height contrast of diblock copolymer PS-b-PEO thin films in dynamic force mode atomic force microscopy
Authors
KeywordsAtomic force microscopy
Block copolymers
Phase contrast
Issue Date2005
PublisherElsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/apsusc
Citation
Applied Surface Science, 2005, v. 252 n. 4, p. 1092-1100 How to Cite?
AbstractAsymmetric PS-b-PEO block copolymer exhibits well-ordered cylindrical morphology with nanoscale domain sizes due to microphase separation. Since the PS and PEO blocks have large stiffness difference, this polymer system represents an ideal candidate for studies of the phase contrast behavior in atomic force microscopy (AFM). In this paper, PS-b-PEO films are investigated under different scanning conditions using two different atomic force microscopes. It is found that the phase contrast of the film can be well described in terms of energy dissipation, though the exact phase image may also depend on the scanning parameters (e.g., the repulsive versus attractive regimes) as well as the settings of the microscope. Height variation on sample surface does not have significant effect on phase contrast. However, in order to obtain true topography of the polymer film, care has to be taken to avoid damage to the sample by AFM. Under certain conditions, true topography can be obtained during the first scan in spite of the surface-damaging forces are used. © 2005 Elsevier B.V. All rights reserved.
Persistent Identifierhttp://hdl.handle.net/10722/70434
ISSN
2015 Impact Factor: 3.15
2015 SCImago Journal Rankings: 0.930
ISI Accession Number ID
References

 

DC FieldValueLanguage
dc.contributor.authorWang, Hen_HK
dc.contributor.authorDjurišić, ABen_HK
dc.contributor.authorChan, WKen_HK
dc.contributor.authorXie, MHen_HK
dc.date.accessioned2010-09-06T06:22:51Z-
dc.date.available2010-09-06T06:22:51Z-
dc.date.issued2005en_HK
dc.identifier.citationApplied Surface Science, 2005, v. 252 n. 4, p. 1092-1100en_HK
dc.identifier.issn0169-4332en_HK
dc.identifier.urihttp://hdl.handle.net/10722/70434-
dc.description.abstractAsymmetric PS-b-PEO block copolymer exhibits well-ordered cylindrical morphology with nanoscale domain sizes due to microphase separation. Since the PS and PEO blocks have large stiffness difference, this polymer system represents an ideal candidate for studies of the phase contrast behavior in atomic force microscopy (AFM). In this paper, PS-b-PEO films are investigated under different scanning conditions using two different atomic force microscopes. It is found that the phase contrast of the film can be well described in terms of energy dissipation, though the exact phase image may also depend on the scanning parameters (e.g., the repulsive versus attractive regimes) as well as the settings of the microscope. Height variation on sample surface does not have significant effect on phase contrast. However, in order to obtain true topography of the polymer film, care has to be taken to avoid damage to the sample by AFM. Under certain conditions, true topography can be obtained during the first scan in spite of the surface-damaging forces are used. © 2005 Elsevier B.V. All rights reserved.en_HK
dc.languageengen_HK
dc.publisherElsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/apsuscen_HK
dc.relation.ispartofApplied Surface Scienceen_HK
dc.rightsApplied Surface Science. Copyright © Elsevier BV.en_HK
dc.subjectAtomic force microscopyen_HK
dc.subjectBlock copolymersen_HK
dc.subjectPhase contrasten_HK
dc.titleFactors affecting phase and height contrast of diblock copolymer PS-b-PEO thin films in dynamic force mode atomic force microscopyen_HK
dc.typeArticleen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0169-4332&volume=252&spage=1092&epage=1100&date=2005&atitle=Factors+affecting+phase+and+height+contrast+of+diblock+copolymer+PS-b-PEO+thin+films+in+dynamic+force+mode+atomic+force+microscopyen_HK
dc.identifier.emailDjurišić, AB: dalek@hku.hken_HK
dc.identifier.emailChan, WK: waichan@hku.hken_HK
dc.identifier.emailXie, MH: mhxie@hku.hken_HK
dc.identifier.authorityDjurišić, AB=rp00690en_HK
dc.identifier.authorityChan, WK=rp00667en_HK
dc.identifier.authorityXie, MH=rp00818en_HK
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1016/j.apsusc.2005.02.034en_HK
dc.identifier.scopuseid_2-s2.0-26444472768en_HK
dc.identifier.hkuros109289en_HK
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-26444472768&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume252en_HK
dc.identifier.issue4en_HK
dc.identifier.spage1092en_HK
dc.identifier.epage1100en_HK
dc.identifier.isiWOS:000232970300027-
dc.publisher.placeNetherlandsen_HK
dc.identifier.scopusauthoridWang, H=8694347500en_HK
dc.identifier.scopusauthoridDjurišić, AB=7004904830en_HK
dc.identifier.scopusauthoridChan, WK=13310083000en_HK
dc.identifier.scopusauthoridXie, MH=7202255416en_HK

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