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Article: Morphology evolution of an asymmetric diblock copolymer P(S-b-MMA) as a function of film thickness and annealing time

TitleMorphology evolution of an asymmetric diblock copolymer P(S-b-MMA) as a function of film thickness and annealing time
Authors
Wang, HDjurišić, ABXie, MHChan, WKKutsay, O
KeywordsFilm thickness
Morphology evolution
P(S-b-MMA)
Issue Date2005
PublisherWorld Scientific Publishing Co Pte Ltd. The Journal's web site is located at http://www.worldscinet.com/journals/ijn/ijn.shtml
Citation
International Journal Of Nanoscience, 2005, v. 4 n. 4, p. 737-743 How to Cite?
DOI: http://dx.doi.org/10.1142/S0219581X05003450
AbstractWe studied the morphology evolution of asymmetric diblock copolymer poly (styrene-b-methyl methacrylate) P(S-b-MMA) films as a function of film thickness and annealing time on Si/native oxide substrate. We also investigated other factors affecting the morphology in addition to film thickness and annealing time, such as substrate cleaning procedures. Ion etching was employed to probe the structure inside the films. The obtained results confirm that there is a range of thicknesses where perpendicular cylinder orientation is obtained on a preferential surface, in agreement with theoretical predictions. © World Scientific Publishing Company.
Persistent Identifierhttp://hdl.handle.net/10722/70299
ISSN
0219-581X
2023 Impact Factor: 0.9
2023 SCImago Journal Rankings: 0.188
References
References in Scopus

 

DC FieldValueLanguage
dc.contributor.authorWang, Hen_HK
dc.contributor.authorDjurišić, ABen_HK
dc.contributor.authorXie, MHen_HK
dc.contributor.authorChan, WKen_HK
dc.contributor.authorKutsay, Oen_HK
dc.date.accessioned2010-09-06T06:21:34Z-
dc.date.available2010-09-06T06:21:34Z-
dc.date.issued2005en_HK
dc.identifier.citationInternational Journal Of Nanoscience, 2005, v. 4 n. 4, p. 737-743en_HK
dc.identifier.issn0219-581Xen_HK
dc.identifier.urihttp://hdl.handle.net/10722/70299-
dc.description.abstractWe studied the morphology evolution of asymmetric diblock copolymer poly (styrene-b-methyl methacrylate) P(S-b-MMA) films as a function of film thickness and annealing time on Si/native oxide substrate. We also investigated other factors affecting the morphology in addition to film thickness and annealing time, such as substrate cleaning procedures. Ion etching was employed to probe the structure inside the films. The obtained results confirm that there is a range of thicknesses where perpendicular cylinder orientation is obtained on a preferential surface, in agreement with theoretical predictions. © World Scientific Publishing Company.en_HK
dc.languageengen_HK
dc.publisherWorld Scientific Publishing Co Pte Ltd. The Journal's web site is located at http://www.worldscinet.com/journals/ijn/ijn.shtmlen_HK
dc.relation.ispartofInternational Journal of Nanoscienceen_HK
dc.subjectFilm thicknessen_HK
dc.subjectMorphology evolutionen_HK
dc.subjectP(S-b-MMA)en_HK
dc.titleMorphology evolution of an asymmetric diblock copolymer P(S-b-MMA) as a function of film thickness and annealing timeen_HK
dc.typeArticleen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0219-581X&volume=4&spage=737&epage=743&date=2005&atitle=Morphology+evolution+of+an+asymmetric+diblock+copolymer+P(S-b-MMA)+as+a+function+of+film+thickness+and+annealing+timeen_HK
dc.identifier.emailDjurišić, AB: dalek@hku.hken_HK
dc.identifier.emailXie, MH: mhxie@hku.hken_HK
dc.identifier.emailChan, WK: waichan@hku.hken_HK
dc.identifier.authorityDjurišić, AB=rp00690en_HK
dc.identifier.authorityXie, MH=rp00818en_HK
dc.identifier.authorityChan, WK=rp00667en_HK
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1142/S0219581X05003450en_HK
dc.identifier.scopuseid_2-s2.0-28844493215en_HK
dc.identifier.hkuros112335en_HK
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-28844493215&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume4en_HK
dc.identifier.issue4en_HK
dc.identifier.spage737en_HK
dc.identifier.epage743en_HK
dc.publisher.placeSingaporeen_HK
dc.identifier.scopusauthoridWang, H=8694347500en_HK
dc.identifier.scopusauthoridDjurišić, AB=7004904830en_HK
dc.identifier.scopusauthoridXie, MH=7202255416en_HK
dc.identifier.scopusauthoridChan, WK=13310083000en_HK
dc.identifier.scopusauthoridKutsay, O=6506469949en_HK
dc.identifier.issnl1793-5350-

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