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Article: Microwave plasma treatment of polymer surface for irreversible sealing of microfluidic devices

TitleMicrowave plasma treatment of polymer surface for irreversible sealing of microfluidic devices
Authors
Issue Date2005
PublisherRoyal Society of Chemistry. The Journal's web site is located at http://www.rsc.org/loc
Citation
Lab On A Chip - Miniaturisation For Chemistry And Biology, 2005, v. 5 n. 10, p. 1173-1177 How to Cite?
AbstractMicrowave plasma was generated in a glass bottle containing 2-3 Torr of oxygen for plasma treatment of a polymer surface. A "kitchen microwave oven" and a dedicated microwave digestion oven were used as the power source. Poly(dimethylsiloxane) (PDMS) slabs treated by a 30 W plasma for 30-60 s sealed irreversibly to form microfluidic devices that can sustain solution flow of an applied pressure of 42 psi without leaking. Experimental set up and conditions for the production of a homogeneous plasma to activate the PDMS surface for irreversible sealing are described in detail. The surface of a microwave plasma-treated PDMS slab was characterized using atomic force microscopy (AFM) and attenuated total reflection-Fourier Transform infrared spectroscopy (ATR-FTIR). The plasma-treated surface bears silica characteristics. © The Royal Society of Chemistry 2005.
Persistent Identifierhttp://hdl.handle.net/10722/70266
ISSN
2015 Impact Factor: 5.586
2015 SCImago Journal Rankings: 2.373
ISI Accession Number ID
References

 

DC FieldValueLanguage
dc.contributor.authorHui, AYNen_HK
dc.contributor.authorWang, Gen_HK
dc.contributor.authorLin, Ben_HK
dc.contributor.authorChan, WTen_HK
dc.date.accessioned2010-09-06T06:21:16Z-
dc.date.available2010-09-06T06:21:16Z-
dc.date.issued2005en_HK
dc.identifier.citationLab On A Chip - Miniaturisation For Chemistry And Biology, 2005, v. 5 n. 10, p. 1173-1177en_HK
dc.identifier.issn1473-0197en_HK
dc.identifier.urihttp://hdl.handle.net/10722/70266-
dc.description.abstractMicrowave plasma was generated in a glass bottle containing 2-3 Torr of oxygen for plasma treatment of a polymer surface. A "kitchen microwave oven" and a dedicated microwave digestion oven were used as the power source. Poly(dimethylsiloxane) (PDMS) slabs treated by a 30 W plasma for 30-60 s sealed irreversibly to form microfluidic devices that can sustain solution flow of an applied pressure of 42 psi without leaking. Experimental set up and conditions for the production of a homogeneous plasma to activate the PDMS surface for irreversible sealing are described in detail. The surface of a microwave plasma-treated PDMS slab was characterized using atomic force microscopy (AFM) and attenuated total reflection-Fourier Transform infrared spectroscopy (ATR-FTIR). The plasma-treated surface bears silica characteristics. © The Royal Society of Chemistry 2005.en_HK
dc.languageengen_HK
dc.publisherRoyal Society of Chemistry. The Journal's web site is located at http://www.rsc.org/locen_HK
dc.relation.ispartofLab on a Chip - Miniaturisation for Chemistry and Biologyen_HK
dc.titleMicrowave plasma treatment of polymer surface for irreversible sealing of microfluidic devicesen_HK
dc.typeArticleen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=1473-0197&volume=5&spage=1173&epage=1177&date=2005&atitle=Microwave+Plasma+Treatment+of+Polymer+Surface+for+Irreversible+Sealing+of+Microfluidic+Devicesen_HK
dc.identifier.emailChan, WT:wtchan@hku.hken_HK
dc.identifier.authorityChan, WT=rp00668en_HK
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1039/b504271ben_HK
dc.identifier.pmid16175276-
dc.identifier.scopuseid_2-s2.0-26844452970en_HK
dc.identifier.hkuros114087en_HK
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-26844452970&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume5en_HK
dc.identifier.issue10en_HK
dc.identifier.spage1173en_HK
dc.identifier.epage1177en_HK
dc.identifier.isiWOS:000232003200024-
dc.publisher.placeUnited Kingdomen_HK
dc.identifier.scopusauthoridHui, AYN=36110977400en_HK
dc.identifier.scopusauthoridWang, G=35202228100en_HK
dc.identifier.scopusauthoridLin, B=7403508047en_HK
dc.identifier.scopusauthoridChan, WT=7403918827en_HK

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