File Download

There are no files associated with this item.

  Links for fulltext
     (May Require Subscription)
Supplementary

Article: Solvent dependence of the evolution of the surface morphology of thin asymmetric diblock copolymer films

TitleSolvent dependence of the evolution of the surface morphology of thin asymmetric diblock copolymer films
Authors
KeywordsAtomic force microscopy (AFM)
Polymers
Issue Date2004
PublisherElsevier S.A.. The Journal's web site is located at http://www.elsevier.com/locate/tsf
Citation
Thin Solid Films, 2004, v. 467 n. 1-2, p. 59-65 How to Cite?
AbstractThe evolution of surface morphology of thin films of asymmetric diblock copolymers with spherical microdomains was studied using atomic force microscopy (AFM). The investigated polymer was poly(styrene-block-2-ferrocenylethyl methacrylate) (PS-b-FEMA), and the molecular weight ratio of PS and FEMA blocks was 7:1. Different solvents were used for film preparation to investigate the solvent influence to surface topography and evolution of the islands. It was found that the effects of solvent used persist after annealing and that the films prepared from different solvents show markedly different surface topographies. Furthermore, the solvent used influences the mechanical adhesion of the film to the substrate, and thusly affects the annealing temperature, which would cause delamination of the film from the substrate. Finally, some recommendations are given on solvent choice and film preparation in order to improve surface quality of the films, which is necessary for successful pattern transfer over a large area. © 2004 Elsevier B.V. All rights reserved.
Persistent Identifierhttp://hdl.handle.net/10722/70012
ISSN
2015 Impact Factor: 1.761
2015 SCImago Journal Rankings: 0.726
ISI Accession Number ID
References

 

DC FieldValueLanguage
dc.contributor.authorTo, Ten_HK
dc.contributor.authorWang, Hen_HK
dc.contributor.authorDjurišić, ABen_HK
dc.contributor.authorXie, MHen_HK
dc.contributor.authorChan, WKen_HK
dc.contributor.authorXie, Zen_HK
dc.contributor.authorWu, Cen_HK
dc.contributor.authorTong, SYen_HK
dc.date.accessioned2010-09-06T06:18:53Z-
dc.date.available2010-09-06T06:18:53Z-
dc.date.issued2004en_HK
dc.identifier.citationThin Solid Films, 2004, v. 467 n. 1-2, p. 59-65en_HK
dc.identifier.issn0040-6090en_HK
dc.identifier.urihttp://hdl.handle.net/10722/70012-
dc.description.abstractThe evolution of surface morphology of thin films of asymmetric diblock copolymers with spherical microdomains was studied using atomic force microscopy (AFM). The investigated polymer was poly(styrene-block-2-ferrocenylethyl methacrylate) (PS-b-FEMA), and the molecular weight ratio of PS and FEMA blocks was 7:1. Different solvents were used for film preparation to investigate the solvent influence to surface topography and evolution of the islands. It was found that the effects of solvent used persist after annealing and that the films prepared from different solvents show markedly different surface topographies. Furthermore, the solvent used influences the mechanical adhesion of the film to the substrate, and thusly affects the annealing temperature, which would cause delamination of the film from the substrate. Finally, some recommendations are given on solvent choice and film preparation in order to improve surface quality of the films, which is necessary for successful pattern transfer over a large area. © 2004 Elsevier B.V. All rights reserved.en_HK
dc.languageengen_HK
dc.publisherElsevier S.A.. The Journal's web site is located at http://www.elsevier.com/locate/tsfen_HK
dc.relation.ispartofThin Solid Filmsen_HK
dc.subjectAtomic force microscopy (AFM)en_HK
dc.subjectPolymersen_HK
dc.titleSolvent dependence of the evolution of the surface morphology of thin asymmetric diblock copolymer filmsen_HK
dc.typeArticleen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0040-6090&volume=467&spage=59&epage=65&date=2004&atitle=Solvent+dependence+of+the+evolution+of+the+surface+morphology+of+thin+asymmetric+diblock+copolymer+filmsen_HK
dc.identifier.emailDjurišić, AB: dalek@hku.hken_HK
dc.identifier.emailXie, MH: mhxie@hku.hken_HK
dc.identifier.emailChan, WK: waichan@hku.hken_HK
dc.identifier.authorityDjurišić, AB=rp00690en_HK
dc.identifier.authorityXie, MH=rp00818en_HK
dc.identifier.authorityChan, WK=rp00667en_HK
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1016/j.tsf.2004.03.004en_HK
dc.identifier.scopuseid_2-s2.0-4444320095en_HK
dc.identifier.hkuros92012en_HK
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-4444320095&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume467en_HK
dc.identifier.issue1-2en_HK
dc.identifier.spage59en_HK
dc.identifier.epage65en_HK
dc.identifier.isiWOS:000224185100010-
dc.publisher.placeSwitzerlanden_HK
dc.identifier.scopusauthoridTo, T=7005851923en_HK
dc.identifier.scopusauthoridWang, H=8694347500en_HK
dc.identifier.scopusauthoridDjurišić, AB=7004904830en_HK
dc.identifier.scopusauthoridXie, MH=7202255416en_HK
dc.identifier.scopusauthoridChan, WK=13310083000en_HK
dc.identifier.scopusauthoridXie, Z=7402266904en_HK
dc.identifier.scopusauthoridWu, C=7501667902en_HK
dc.identifier.scopusauthoridTong, SY=24512624800en_HK

Export via OAI-PMH Interface in XML Formats


OR


Export to Other Non-XML Formats