File Download

There are no files associated with this item.

  Links for fulltext
     (May Require Subscription)
Supplementary

Article: Influence of atmospheric exposure of tris (8-hydroxyquinoline) aluminum (Alq3): A photoluminescence and absorption study

TitleInfluence of atmospheric exposure of tris (8-hydroxyquinoline) aluminum (Alq3): A photoluminescence and absorption study
Authors
Issue Date2004
PublisherSpringer Verlag. The Journal's web site is located at http://link.springer.de/link/service/journals/00339/index.htm
Citation
Applied Physics A: Materials Science And Processing, 2004, v. 78 n. 3, p. 375-380 How to Cite?
AbstractWe have investigated the effects of atmospheric exposure on the properties of tris (8-hydroxyquinoline) aluminum (Alq3) thin films by photoluminescence (PL) and UV-Vis absorption measurements. Alq3 films were evaporated on glass substrates at different temperatures. The influence of annealing on the environmental stability of the films has also been investigated. It has been found that deposition at higher substrate temperature and annealing of the samples deposited at room temperature yield an improvement in the environmental stability of the films, i.e. less decrease in the PL intensity over time with exposure to atmosphere, as well as increased PL intensity. To investigate further the effects of the air exposure, films deposited at room temperature were stored for four days in air, nitrogen, and oxygen. No decrease in PL intensity has been found for storage in nitrogen, while the decrease for the film stored in oxygen was smaller than that for the film stored in air, indicating that both humidity and oxygen play a role in the PL intensity decrease in Alq3 thin films.
Persistent Identifierhttp://hdl.handle.net/10722/69869
ISSN
2015 Impact Factor: 1.444
2015 SCImago Journal Rankings: 0.535
ISI Accession Number ID
References

 

DC FieldValueLanguage
dc.contributor.authorDjurišić, ABen_HK
dc.contributor.authorLau, TWen_HK
dc.contributor.authorLam, LSMen_HK
dc.contributor.authorChan, WKen_HK
dc.date.accessioned2010-09-06T06:17:35Z-
dc.date.available2010-09-06T06:17:35Z-
dc.date.issued2004en_HK
dc.identifier.citationApplied Physics A: Materials Science And Processing, 2004, v. 78 n. 3, p. 375-380en_HK
dc.identifier.issn0947-8396en_HK
dc.identifier.urihttp://hdl.handle.net/10722/69869-
dc.description.abstractWe have investigated the effects of atmospheric exposure on the properties of tris (8-hydroxyquinoline) aluminum (Alq3) thin films by photoluminescence (PL) and UV-Vis absorption measurements. Alq3 films were evaporated on glass substrates at different temperatures. The influence of annealing on the environmental stability of the films has also been investigated. It has been found that deposition at higher substrate temperature and annealing of the samples deposited at room temperature yield an improvement in the environmental stability of the films, i.e. less decrease in the PL intensity over time with exposure to atmosphere, as well as increased PL intensity. To investigate further the effects of the air exposure, films deposited at room temperature were stored for four days in air, nitrogen, and oxygen. No decrease in PL intensity has been found for storage in nitrogen, while the decrease for the film stored in oxygen was smaller than that for the film stored in air, indicating that both humidity and oxygen play a role in the PL intensity decrease in Alq3 thin films.en_HK
dc.languageengen_HK
dc.publisherSpringer Verlag. The Journal's web site is located at http://link.springer.de/link/service/journals/00339/index.htmen_HK
dc.relation.ispartofApplied Physics A: Materials Science and Processingen_HK
dc.titleInfluence of atmospheric exposure of tris (8-hydroxyquinoline) aluminum (Alq3): A photoluminescence and absorption studyen_HK
dc.typeArticleen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0947-8396&volume=78&spage=375&epage=380&date=2004&atitle=Influence+of+atmospheric+exposure+of+tris+(8-hydroxyquinoline)+aluminum+(Alq3):+a+photoluminescence+and+absorption+studyen_HK
dc.identifier.emailDjurišić, AB: dalek@hku.hken_HK
dc.identifier.emailChan, WK: waichan@hku.hken_HK
dc.identifier.authorityDjurišić, AB=rp00690en_HK
dc.identifier.authorityChan, WK=rp00667en_HK
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1007/s00339-002-1915-5en_HK
dc.identifier.scopuseid_2-s2.0-0742268896en_HK
dc.identifier.hkuros85634en_HK
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-0742268896&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume78en_HK
dc.identifier.issue3en_HK
dc.identifier.spage375en_HK
dc.identifier.epage380en_HK
dc.identifier.isiWOS:000187132500023-
dc.publisher.placeGermanyen_HK
dc.identifier.scopusauthoridDjurišić, AB=7004904830en_HK
dc.identifier.scopusauthoridLau, TW=36920289100en_HK
dc.identifier.scopusauthoridLam, LSM=7201984714en_HK
dc.identifier.scopusauthoridChan, WK=13310083000en_HK

Export via OAI-PMH Interface in XML Formats


OR


Export to Other Non-XML Formats