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Article: Hydrothermal synthesis vs electrodeposition for high specific capacitance nanostructured NiO films
Title | Hydrothermal synthesis vs electrodeposition for high specific capacitance nanostructured NiO films |
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Authors | |
Issue Date | 2008 |
Publisher | Electrochemical Society, Inc. The Journal's web site is located at http://scitation.aip.org/ESL/ |
Citation | Electrochemical And Solid-State Letters, 2008, v. 11 n. 6, p. D56-D59 How to Cite? |
Abstract | NiO nanostructured films were synthesized by hydrothermal and electrodeposition methods at different deposition temperatures. Films fabricated by different methods had similar crystalline structures, but different morphologies. The electrochemical properties of the NiO films were studied by cyclic voltammetry (CV) and electrochemical impedance spectroscopy. For both fabrication methods, annealing was necessary to convert the films to NiO. After annealing at 300°C, all films behaved as pseudocapacitors. The electrodeposited film fabricated at a deposition temperature of 70°C on Ti foil exhibited a high value of pseudocapacitance (148 F/g at 100 mV/s CV scan rate), which suggests that electrodeposited films are promising for supercapacitor applications. © 2008 The Electrochemical Society. |
Persistent Identifier | http://hdl.handle.net/10722/69339 |
ISSN | 2014 Impact Factor: 2.321 |
ISI Accession Number ID | |
References |
DC Field | Value | Language |
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dc.contributor.author | Xi, YY | en_HK |
dc.contributor.author | Li, D | en_HK |
dc.contributor.author | Djurišić, AB | en_HK |
dc.contributor.author | Xie, MH | en_HK |
dc.contributor.author | Man, KYK | en_HK |
dc.contributor.author | Chan, WK | en_HK |
dc.date.accessioned | 2010-09-06T06:12:45Z | - |
dc.date.available | 2010-09-06T06:12:45Z | - |
dc.date.issued | 2008 | en_HK |
dc.identifier.citation | Electrochemical And Solid-State Letters, 2008, v. 11 n. 6, p. D56-D59 | en_HK |
dc.identifier.issn | 1099-0062 | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/69339 | - |
dc.description.abstract | NiO nanostructured films were synthesized by hydrothermal and electrodeposition methods at different deposition temperatures. Films fabricated by different methods had similar crystalline structures, but different morphologies. The electrochemical properties of the NiO films were studied by cyclic voltammetry (CV) and electrochemical impedance spectroscopy. For both fabrication methods, annealing was necessary to convert the films to NiO. After annealing at 300°C, all films behaved as pseudocapacitors. The electrodeposited film fabricated at a deposition temperature of 70°C on Ti foil exhibited a high value of pseudocapacitance (148 F/g at 100 mV/s CV scan rate), which suggests that electrodeposited films are promising for supercapacitor applications. © 2008 The Electrochemical Society. | en_HK |
dc.language | eng | en_HK |
dc.publisher | Electrochemical Society, Inc. The Journal's web site is located at http://scitation.aip.org/ESL/ | en_HK |
dc.relation.ispartof | Electrochemical and Solid-State Letters | en_HK |
dc.rights | Electrochemical and Solid-State Letters. Copyright © Electrochemical Society, Inc. | en_HK |
dc.title | Hydrothermal synthesis vs electrodeposition for high specific capacitance nanostructured NiO films | en_HK |
dc.type | Article | en_HK |
dc.identifier.openurl | http://library.hku.hk:4550/resserv?sid=HKU:IR&issn=1099-0062&volume=11&spage=D56&epage=D59&date=2008&atitle=Hydrothermal+synthesis+vs+electrodeposition+for+high+specific+capacitance+nanostructured+NiO+films | en_HK |
dc.identifier.email | Djurišić, AB: dalek@hku.hk | en_HK |
dc.identifier.email | Xie, MH: mhxie@hku.hk | en_HK |
dc.identifier.email | Chan, WK: waichan@hku.hk | en_HK |
dc.identifier.authority | Djurišić, AB=rp00690 | en_HK |
dc.identifier.authority | Xie, MH=rp00818 | en_HK |
dc.identifier.authority | Chan, WK=rp00667 | en_HK |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1149/1.2903345 | en_HK |
dc.identifier.scopus | eid_2-s2.0-42349115662 | en_HK |
dc.identifier.hkuros | 142412 | en_HK |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-42349115662&selection=ref&src=s&origin=recordpage | en_HK |
dc.identifier.volume | 11 | en_HK |
dc.identifier.issue | 6 | en_HK |
dc.identifier.spage | D56 | en_HK |
dc.identifier.epage | D59 | en_HK |
dc.identifier.isi | WOS:000255117500015 | - |
dc.publisher.place | United States | en_HK |
dc.identifier.scopusauthorid | Xi, YY=23053521800 | en_HK |
dc.identifier.scopusauthorid | Li, D=36062291500 | en_HK |
dc.identifier.scopusauthorid | Djurišić, AB=7004904830 | en_HK |
dc.identifier.scopusauthorid | Xie, MH=7202255416 | en_HK |
dc.identifier.scopusauthorid | Man, KYK=8051698900 | en_HK |
dc.identifier.scopusauthorid | Chan, WK=13310083000 | en_HK |
dc.identifier.issnl | 1099-0062 | - |