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Article: Investigation of nickel suppression and cytocompatibility of surface-treated nickel-titanium shape memory alloys by using plasma immersion ion implantation

TitleInvestigation of nickel suppression and cytocompatibility of surface-treated nickel-titanium shape memory alloys by using plasma immersion ion implantation
Authors
KeywordsBiocompatibility
Nickel-titanium (NiTi) shape memory alloys
Plasma immersion ion implantation
Issue Date2005
PublisherJohn Wiley & Sons, Inc. The Journal's web site is located at http://www.interscience.wiley.com/jpages/0021-9304/
Citation
Journal Of Biomedical Materials Research - Part A, 2005, v. 72 n. 3, p. 238-245 How to Cite?
AbstractNickel-titanium (NiTi) shape memory alloys are increasingly being used in orthopedic applications. However, there is a concern that Ni is harmful to the human body. We have recently investigated the use of nitrogen, or oxygen plasma immersion ion implantation to mitigate this deleterious effect. Our results reveal that the near-surface Ni concentration in all the treated samples is significantly suppressed. In addition, our in vitro tests show that the plasma-treated surfaces are cytologically compatible allowing the attachment and proliferation of osteoblasts. Among the two types of samples, the best biological effects are found on the samples with nitrogen implantation. © 2005 Wiley Periodicals, Inc.
Persistent Identifierhttp://hdl.handle.net/10722/68116
ISSN
2004 Impact Factor: 3.652
2006 SCImago Journal Rankings: 0.474
ISI Accession Number ID
References

 

DC FieldValueLanguage
dc.contributor.authorYeung, KWKen_HK
dc.contributor.authorPoon, RWYen_HK
dc.contributor.authorLiu, XYen_HK
dc.contributor.authorHo, JPYen_HK
dc.contributor.authorChung, CYen_HK
dc.contributor.authorChu, PKen_HK
dc.contributor.authorLu, WWen_HK
dc.contributor.authorChan, Den_HK
dc.contributor.authorCheung, KMCen_HK
dc.date.accessioned2010-09-06T06:01:29Z-
dc.date.available2010-09-06T06:01:29Z-
dc.date.issued2005en_HK
dc.identifier.citationJournal Of Biomedical Materials Research - Part A, 2005, v. 72 n. 3, p. 238-245en_HK
dc.identifier.issn0021-9304en_HK
dc.identifier.urihttp://hdl.handle.net/10722/68116-
dc.description.abstractNickel-titanium (NiTi) shape memory alloys are increasingly being used in orthopedic applications. However, there is a concern that Ni is harmful to the human body. We have recently investigated the use of nitrogen, or oxygen plasma immersion ion implantation to mitigate this deleterious effect. Our results reveal that the near-surface Ni concentration in all the treated samples is significantly suppressed. In addition, our in vitro tests show that the plasma-treated surfaces are cytologically compatible allowing the attachment and proliferation of osteoblasts. Among the two types of samples, the best biological effects are found on the samples with nitrogen implantation. © 2005 Wiley Periodicals, Inc.en_HK
dc.languageengen_HK
dc.publisherJohn Wiley & Sons, Inc. The Journal's web site is located at http://www.interscience.wiley.com/jpages/0021-9304/en_HK
dc.relation.ispartofJournal of Biomedical Materials Research - Part Aen_HK
dc.rightsJournal of Biomedical Materials Research Part A. Copyright © John Wiley & Sons, Inc.en_HK
dc.subjectBiocompatibilityen_HK
dc.subjectNickel-titanium (NiTi) shape memory alloysen_HK
dc.subjectPlasma immersion ion implantationen_HK
dc.subject.meshBiocompatible Materials-
dc.subject.meshCell Proliferation-
dc.subject.meshCell Survival - physiology-
dc.subject.meshNickel-
dc.subject.meshTitanium-
dc.titleInvestigation of nickel suppression and cytocompatibility of surface-treated nickel-titanium shape memory alloys by using plasma immersion ion implantationen_HK
dc.typeArticleen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=1549-3296&volume=72&issue=3&spage=238&epage=245&date=2005&atitle=Investigation+of+nickel+suppression+and+cytocompatibility+of+surface-treated+nickel-titanium+shape+memory+alloys+by+using+plasma+immersion+ion+implantationen_HK
dc.identifier.emailYeung, KWK:wkkyeung@hkucc.hku.hken_HK
dc.identifier.emailLu, WW:wwlu@hku.hken_HK
dc.identifier.emailChan, D:chand@hkucc.hku.hken_HK
dc.identifier.emailCheung, KMC:cheungmc@hku.hken_HK
dc.identifier.authorityYeung, KWK=rp00309en_HK
dc.identifier.authorityLu, WW=rp00411en_HK
dc.identifier.authorityChan, D=rp00540en_HK
dc.identifier.authorityCheung, KMC=rp00387en_HK
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1002/jbm.a.30201en_HK
dc.identifier.pmid15662652-
dc.identifier.scopuseid_2-s2.0-14044257759en_HK
dc.identifier.hkuros104308en_HK
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-14044257759&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume72en_HK
dc.identifier.issue3en_HK
dc.identifier.spage238en_HK
dc.identifier.epage245en_HK
dc.identifier.isiWOS:000227223200001-
dc.identifier.scopusauthoridYeung, KWK=13309584700en_HK
dc.identifier.scopusauthoridPoon, RWY=34572161800en_HK
dc.identifier.scopusauthoridLiu, XY=8603933800en_HK
dc.identifier.scopusauthoridHo, JPY=7402650045en_HK
dc.identifier.scopusauthoridChung, CY=8100842800en_HK
dc.identifier.scopusauthoridChu, PK=36040705700en_HK
dc.identifier.scopusauthoridLu, WW=7404215221en_HK
dc.identifier.scopusauthoridChan, D=7402216545en_HK
dc.identifier.scopusauthoridCheung, KMC=7402406754en_HK

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