Conference Paper: Defects in zinc-implanted ZnO thin films
| Title | Defects in zinc-implanted ZnO thin films |
|---|---|
| Authors | Schmidt, M3 Ellguth, M3 Czekalla, C3 V Wenckstern, H3 Pickenhain, R3 Grundmann, M3 Brauer, G4 Skorupa, W4 Helm, M4 Gu, Q1 2 Ling, CC2 |
| Issue Date | 2009 |
| Publisher | American Vacuum Society. The Journal's web site is located at http://www.avs.org/literature.jvst.b.aspx |
| Citation | Journal Of Vacuum Science And Technology B: Microelectronics And Nanometer Structures, 2009, v. 27 n. 3, p. 1597-1600 [How to Cite?] DOI: http://dx.doi.org/10.1116/1.3086659 |
| Abstract | Defects in zinc-implanted and thermally annealed ZnO thin films were investigated by means of capacitance-voltage spectroscopy (C -V), thermal admittance spectroscopy (TAS), deep level transient spectroscopy (DLTS), and photoluminescence (PL) spectroscopy. The authors report on the formation of two donor states approximately 35 and 190 meV below the conduction band edge, observed by TAS and DLTS, respectively. In the PL spectra of a reference sample a peak at 3.366 eV was present, which diminished after the implantation, while a new peak at 3.364 eV was observed only in the spectrum of the implanted sample. Since only intrinsic ions were implanted, the authors consider the defects formed by the zinc implantation and annealing to be intrinsic. © 2009 American Vacuum Society. |
| ISSN | 1071-1023 2011 Impact Factor: 1.341 2011 SCImago Journal Rankings: 0.174 |
| DOI | http://dx.doi.org/10.1116/1.3086659 |
| ISI Accession Number ID | WOS:000266500300116 |
| References | References in Scopus |
| dc.contributor.author | Schmidt, M |
|---|---|
| dc.contributor.author | Ellguth, M |
| dc.contributor.author | Czekalla, C |
| dc.contributor.author | V Wenckstern, H |
| dc.contributor.author | Pickenhain, R |
| dc.contributor.author | Grundmann, M |
| dc.contributor.author | Brauer, G |
| dc.contributor.author | Skorupa, W |
| dc.contributor.author | Helm, M |
| dc.contributor.author | Gu, Q |
| dc.contributor.author | Ling, CC |
| dc.date.accessioned | 2010-05-31T03:54:32Z |
| dc.date.available | 2010-05-31T03:54:32Z |
| dc.date.issued | 2009 |
| dc.description.abstract | Defects in zinc-implanted and thermally annealed ZnO thin films were investigated by means of capacitance-voltage spectroscopy (C -V), thermal admittance spectroscopy (TAS), deep level transient spectroscopy (DLTS), and photoluminescence (PL) spectroscopy. The authors report on the formation of two donor states approximately 35 and 190 meV below the conduction band edge, observed by TAS and DLTS, respectively. In the PL spectra of a reference sample a peak at 3.366 eV was present, which diminished after the implantation, while a new peak at 3.364 eV was observed only in the spectrum of the implanted sample. Since only intrinsic ions were implanted, the authors consider the defects formed by the zinc implantation and annealing to be intrinsic. © 2009 American Vacuum Society. |
| dc.description.nature | Link_to_subscribed_fulltext |
| dc.identifier.citation | Journal Of Vacuum Science And Technology B: Microelectronics And Nanometer Structures, 2009, v. 27 n. 3, p. 1597-1600 [How to Cite?] DOI: http://dx.doi.org/10.1116/1.3086659 |
| dc.identifier.doi | http://dx.doi.org/10.1116/1.3086659 |
| dc.identifier.epage | 1600 |
| dc.identifier.hkuros | 156096 |
| dc.identifier.isi | WOS:000266500300116 |
| dc.identifier.issn | 1071-1023 2011 Impact Factor: 1.341 2011 SCImago Journal Rankings: 0.174 |
| dc.identifier.issue | 3 |
| dc.identifier.scopus | eid_2-s2.0-77955231558 |
| dc.identifier.spage | 1597 |
| dc.identifier.uri | http://hdl.handle.net/10722/59652 |
| dc.identifier.volume | 27 |
| dc.language | eng |
| dc.publisher | American Vacuum Society. The Journal's web site is located at http://www.avs.org/literature.jvst.b.aspx |
| dc.publisher.place | United States |
| dc.relation.ispartof | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
| dc.relation.references | References in Scopus |
| dc.title | Defects in zinc-implanted ZnO thin films |
| dc.type | Conference_Paper |
Author Affiliations
- Ohio State University
- The University of Hong Kong
- Universität Leipzig
- Forschungszentrum Dresden Rossendorf

