File Download
There are no files associated with this item.
Links for fulltext
(May Require Subscription)
- Publisher Website: 10.1063/1.3159898
- Scopus: eid_2-s2.0-67650733255
- WOS: WOS:000268065000041
- Find via
Supplementary
- Citations:
- Appears in Collections:
Article: Impurity scattering induced excitonic polariton damping and its influence on the reflectance spectra of GaN epilayers
Title | Impurity scattering induced excitonic polariton damping and its influence on the reflectance spectra of GaN epilayers |
---|---|
Authors | |
Issue Date | 2009 |
Publisher | American Institute of Physics. The Journal's web site is located at http://jap.aip.org/jap/staff.jsp |
Citation | Journal of Applied Physics, 2009, v. 106 n. 1, article no. 013514 How to Cite? |
Abstract | The low-temperature reflectance spectra of a number of GaN epilayers with various impurity/defect concentrations and Hall mobility are systematically investigated in this paper. The interacting excitonic polariton model, considering both excitons A and B, is employed to reproduce the measured reflectance spectra of the GaN films, leading to the determination of the damping coefficients of the propagating polaritons in the films. It is shown that the impurity scattering plays a dominant role in the damping of the excitonic polaritons in the GaN epilayers with higher impurity concentrations at low temperatures, which is additionally supported by the photoluminescence and Hall measurements. © 2009 American Institute of Physics. |
Persistent Identifier | http://hdl.handle.net/10722/59650 |
ISSN | 2023 Impact Factor: 2.7 2023 SCImago Journal Rankings: 0.649 |
ISI Accession Number ID | |
References |
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Wang, YJ | en_HK |
dc.contributor.author | Wang, RX | en_HK |
dc.contributor.author | Li, GQ | en_HK |
dc.contributor.author | Xu, SJ | en_HK |
dc.date.accessioned | 2010-05-31T03:54:30Z | - |
dc.date.available | 2010-05-31T03:54:30Z | - |
dc.date.issued | 2009 | en_HK |
dc.identifier.citation | Journal of Applied Physics, 2009, v. 106 n. 1, article no. 013514 | - |
dc.identifier.issn | 0021-8979 | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/59650 | - |
dc.description.abstract | The low-temperature reflectance spectra of a number of GaN epilayers with various impurity/defect concentrations and Hall mobility are systematically investigated in this paper. The interacting excitonic polariton model, considering both excitons A and B, is employed to reproduce the measured reflectance spectra of the GaN films, leading to the determination of the damping coefficients of the propagating polaritons in the films. It is shown that the impurity scattering plays a dominant role in the damping of the excitonic polaritons in the GaN epilayers with higher impurity concentrations at low temperatures, which is additionally supported by the photoluminescence and Hall measurements. © 2009 American Institute of Physics. | en_HK |
dc.language | eng | en_HK |
dc.publisher | American Institute of Physics. The Journal's web site is located at http://jap.aip.org/jap/staff.jsp | en_HK |
dc.relation.ispartof | Journal of Applied Physics | en_HK |
dc.title | Impurity scattering induced excitonic polariton damping and its influence on the reflectance spectra of GaN epilayers | en_HK |
dc.type | Article | en_HK |
dc.identifier.openurl | http://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0021-8979&volume=106&spage=013514: 1&epage=5&date=2009&atitle=Impurity+scattering+induced+excitonic+polariton+damping+and+its+influence+on+the+reflectance+spectra+of+GaN+epilayers | en_HK |
dc.identifier.email | Xu, SJ: sjxu@hku.hk | en_HK |
dc.identifier.authority | Xu, SJ=rp00821 | en_HK |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1063/1.3159898 | en_HK |
dc.identifier.scopus | eid_2-s2.0-67650733255 | en_HK |
dc.identifier.hkuros | 159925 | en_HK |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-67650733255&selection=ref&src=s&origin=recordpage | en_HK |
dc.identifier.volume | 106 | en_HK |
dc.identifier.issue | 1 | en_HK |
dc.identifier.spage | article no. 013514 | - |
dc.identifier.epage | article no. 013514 | - |
dc.identifier.isi | WOS:000268065000041 | - |
dc.publisher.place | United States | en_HK |
dc.identifier.scopusauthorid | Wang, YJ=8296286800 | en_HK |
dc.identifier.scopusauthorid | Wang, RX=7405339075 | en_HK |
dc.identifier.scopusauthorid | Li, GQ=35187337800 | en_HK |
dc.identifier.scopusauthorid | Xu, SJ=7404439005 | en_HK |
dc.identifier.issnl | 0021-8979 | - |