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Article: Spectroscopic ellipsometry characterization of polymer-fullerene blend films

TitleSpectroscopic ellipsometry characterization of polymer-fullerene blend films
Authors
Ng, AMCCheung, KYFung, MKDjurišić, ABChan, WK
KeywordsPolymers
Spectroscopic ellipsometry
Issue Date2008
PublisherElsevier S.A.. The Journal's web site is located at http://www.elsevier.com/locate/tsf
Citation
Thin Solid Films, 2008, v. 517 n. 3, p. 1047-1052 How to Cite?
DOI: http://dx.doi.org/10.1016/j.tsf.2008.05.038
AbstractIn this work, we have used spectroscopic ellipsometry (SE) and atomic force microscopy (AFM) to characterize the properties of blend films commonly used in organic solar cells, namely poly[3-hexylthiophene-2,5-diyl] (P3HT): [6,6]-phenyl C61 butyric acid methyl ester (PCBM) blends. The blend films were prepared using different solvents, and for different ratios of P3HT:PCBM in order to change the surface roughness and phase separation in the blends. The obtained SE results were analyzed with and without the surface roughness correction to examine how the morphology affects the optical properties. © 2008 Elsevier B.V. All rights reserved.
Persistent Identifierhttp://hdl.handle.net/10722/58316
ISSN
0040-6090
2023 Impact Factor: 2.0
2023 SCImago Journal Rankings: 0.400
ISI Accession Number ID
WOS:000262053800009
Funding AgencyGrant Number
Strategic Research Theme
University Development Fund
Seed Funding Grant
Outstanding Young Researcher Award
Funding Information:

This work is partly supported by the Strategic Research Theme, University Development Fund, Seed Funding Grant and-Outstanding Young Researcher Award (administrated by The University of Hong Kong). The authors would like to thank Dr. A. H. W Ngan and T. K. Liu for AFM measurements.

References
References in Scopus

 

DC FieldValueLanguage
dc.contributor.authorNg, AMCen_HK
dc.contributor.authorCheung, KYen_HK
dc.contributor.authorFung, MKen_HK
dc.contributor.authorDjurišić, ABen_HK
dc.contributor.authorChan, WKen_HK
dc.date.accessioned2010-05-31T03:28:10Z-
dc.date.available2010-05-31T03:28:10Z-
dc.date.issued2008en_HK
dc.identifier.citationThin Solid Films, 2008, v. 517 n. 3, p. 1047-1052en_HK
dc.identifier.issn0040-6090en_HK
dc.identifier.urihttp://hdl.handle.net/10722/58316-
dc.description.abstractIn this work, we have used spectroscopic ellipsometry (SE) and atomic force microscopy (AFM) to characterize the properties of blend films commonly used in organic solar cells, namely poly[3-hexylthiophene-2,5-diyl] (P3HT): [6,6]-phenyl C61 butyric acid methyl ester (PCBM) blends. The blend films were prepared using different solvents, and for different ratios of P3HT:PCBM in order to change the surface roughness and phase separation in the blends. The obtained SE results were analyzed with and without the surface roughness correction to examine how the morphology affects the optical properties. © 2008 Elsevier B.V. All rights reserved.en_HK
dc.languageengen_HK
dc.publisherElsevier S.A.. The Journal's web site is located at http://www.elsevier.com/locate/tsfen_HK
dc.relation.ispartofThin Solid Filmsen_HK
dc.subjectPolymersen_HK
dc.subjectSpectroscopic ellipsometryen_HK
dc.titleSpectroscopic ellipsometry characterization of polymer-fullerene blend filmsen_HK
dc.typeArticleen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0040-6090&volume=517&spage=1047&epage=1052&date=2008&atitle=Spectroscopic+ellipsometry+characterization+of+polymer-fullerene+blend+filmsen_HK
dc.identifier.emailDjurišić, AB: dalek@hku.hken_HK
dc.identifier.emailChan, WK: waichan@hku.hken_HK
dc.identifier.authorityDjurišić, AB=rp00690en_HK
dc.identifier.authorityChan, WK=rp00667en_HK
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1016/j.tsf.2008.05.038en_HK
dc.identifier.scopuseid_2-s2.0-56649112941en_HK
dc.identifier.hkuros153924en_HK
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-56649112941&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume517en_HK
dc.identifier.issue3en_HK
dc.identifier.spage1047en_HK
dc.identifier.epage1052en_HK
dc.identifier.isiWOS:000262053800009-
dc.publisher.placeSwitzerlanden_HK
dc.identifier.scopusauthoridNg, AMC=12140078600en_HK
dc.identifier.scopusauthoridCheung, KY=25229974800en_HK
dc.identifier.scopusauthoridFung, MK=35191896100en_HK
dc.identifier.scopusauthoridDjurišić, AB=7004904830en_HK
dc.identifier.scopusauthoridChan, WK=13310083000en_HK
dc.identifier.citeulike8787670-
dc.identifier.issnl0040-6090-

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