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Article: Planar microwave devices fabricated by ion-implantation patterning of high-temperature superconductors

TitlePlanar microwave devices fabricated by ion-implantation patterning of high-temperature superconductors
Authors
KeywordsPhysics engineering
Issue Date1996
PublisherAmerican Institute of Physics. The Journal's web site is located at http://apl.aip.org/
Citation
Applied Physics Letters, 1996, v. 69 n. 14, p. 2119-2121 How to Cite?
AbstractWe have applied ion-implantation inhibit patterning as a new method of fabricating low-loss microwave transmission lines in high-temperature superconductor thin films. To determine the effectiveness of this technique, we fabricated coplanar waveguide transmission lines in YBa2Cu3O7 – thin films that had been deposited on LaAlO3 substrates using pulsed laser deposition. Microwave characterizations of these lines are compared to a reference line fabricated with conventional ion milling. At 76 K and 12 GHz, the attenuation constants of the ion-implanted transmission lines are approximated 0.02 dB/mm, and the overall loss response is indistinguishable from that of the ion-milled device.
Persistent Identifierhttp://hdl.handle.net/10722/53379
ISSN
2015 Impact Factor: 3.142
2015 SCImago Journal Rankings: 1.105
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorDegroot, DGen_HK
dc.contributor.authorRudman, DAen_HK
dc.contributor.authorZhang, Ken_HK
dc.contributor.authorMa, Qen_HK
dc.contributor.authorKato, Hen_HK
dc.contributor.authorJaeger, NAen_HK
dc.date.accessioned2009-04-03T07:18:11Z-
dc.date.available2009-04-03T07:18:11Z-
dc.date.issued1996en_HK
dc.identifier.citationApplied Physics Letters, 1996, v. 69 n. 14, p. 2119-2121en_HK
dc.identifier.issn0003-6951en_HK
dc.identifier.urihttp://hdl.handle.net/10722/53379-
dc.description.abstractWe have applied ion-implantation inhibit patterning as a new method of fabricating low-loss microwave transmission lines in high-temperature superconductor thin films. To determine the effectiveness of this technique, we fabricated coplanar waveguide transmission lines in YBa2Cu3O7 – thin films that had been deposited on LaAlO3 substrates using pulsed laser deposition. Microwave characterizations of these lines are compared to a reference line fabricated with conventional ion milling. At 76 K and 12 GHz, the attenuation constants of the ion-implanted transmission lines are approximated 0.02 dB/mm, and the overall loss response is indistinguishable from that of the ion-milled device.en_HK
dc.languageengen_HK
dc.publisherAmerican Institute of Physics. The Journal's web site is located at http://apl.aip.org/en_HK
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License-
dc.rightsApplied Physics Letters. Copyright © American Institute of Physics.en_HK
dc.subjectPhysics engineeringen_HK
dc.titlePlanar microwave devices fabricated by ion-implantation patterning of high-temperature superconductorsen_HK
dc.typeArticleen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0003-6951&volume=69&issue=14&spage=2119&epage=2121&date=1996&atitle=Planar+microwave+devices+fabricated+by+ion-implantation+patterning+of+high-temperature+superconductors+en_HK
dc.identifier.emailMa, Q: qyma@eee.hku.hken_HK
dc.description.naturepublished_or_final_versionen_HK
dc.identifier.doi10.1063/1.116899en_HK
dc.identifier.hkuros26495-
dc.identifier.isiWOS:A1996VJ78300044-

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