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Conference Paper: Improvement in the environmental stability of tris(8-hydroxyquinoline) aluminum by substitution of sulphonic acid in 8-hydroxyquinoline ligand

TitleImprovement in the environmental stability of tris(8-hydroxyquinoline) aluminum by substitution of sulphonic acid in 8-hydroxyquinoline ligand
Authors
KeywordsPhysics
Optics
Instruments
Issue Date2004
PublisherS P I E - International Society for Optical Engineering. The Journal's web site is located at http://spie.org/x1848.xml
Citation
Organic light-emitting materials and devices VII, San Diego, California, USA, 4-6 August 2003, v. 5214, p. 283-290 How to Cite?
AbstractTris (8-hydroxyquinoline) aluminum (Alq 3) is a commonly used electron transporting and/or light emitting material in organic light emitting diodes (OLEDs). However, it is well known that Alq 3 is very sensitive to atmosphere exposure and that photoluminescence of Alq 3 films decreases with the time of atmosphere exposure. Degradation is also a serious problem in Alq 3 based OLEDs. Several degradation mechanisms have been identified in these devices, including formation of unstable cationic species due to passage of holes. Therefore, there is lots of interest in improving the stability of Alq 3. We have synthesized Tris (8-hydroxyquinoline-5 sulphonic acid) aluminum (Al(qS) 3) in order to improve the stability. We performed electron spin resonance measurements on Alq 3 and Al(qS) 3 powders. Unlike Alq 3 which exhibited strong ESR signal, Al(qS) 3 produced no detectable ESR signal indicating absence of free radicals in this material. To test the environmental stability of Al(qS) 3 films, we have performed photoluminescence (PL) measurements in humid air at different temperatures and found that Al(qS) 3 exhibits improved stability. After comparing the stability of Alq 3 and Al(qS) 3 thin films, fabrication of the light emitting diodes with Al(qS) 3 emitting layer was attempted in order to compare the performance with Alq 3 based devices.
Persistent Identifierhttp://hdl.handle.net/10722/46450
ISSN
References

 

DC FieldValueLanguage
dc.contributor.authorRoy, VALen_HK
dc.contributor.authorKwong, CYen_HK
dc.contributor.authorDjurišić, ABen_HK
dc.contributor.authorPode, RBen_HK
dc.contributor.authorRao, TKGen_HK
dc.contributor.authorChan, WKen_HK
dc.date.accessioned2007-10-30T06:50:07Z-
dc.date.available2007-10-30T06:50:07Z-
dc.date.issued2004en_HK
dc.identifier.citationOrganic light-emitting materials and devices VII, San Diego, California, USA, 4-6 August 2003, v. 5214, p. 283-290en_HK
dc.identifier.issn0277-786Xen_HK
dc.identifier.urihttp://hdl.handle.net/10722/46450-
dc.description.abstractTris (8-hydroxyquinoline) aluminum (Alq 3) is a commonly used electron transporting and/or light emitting material in organic light emitting diodes (OLEDs). However, it is well known that Alq 3 is very sensitive to atmosphere exposure and that photoluminescence of Alq 3 films decreases with the time of atmosphere exposure. Degradation is also a serious problem in Alq 3 based OLEDs. Several degradation mechanisms have been identified in these devices, including formation of unstable cationic species due to passage of holes. Therefore, there is lots of interest in improving the stability of Alq 3. We have synthesized Tris (8-hydroxyquinoline-5 sulphonic acid) aluminum (Al(qS) 3) in order to improve the stability. We performed electron spin resonance measurements on Alq 3 and Al(qS) 3 powders. Unlike Alq 3 which exhibited strong ESR signal, Al(qS) 3 produced no detectable ESR signal indicating absence of free radicals in this material. To test the environmental stability of Al(qS) 3 films, we have performed photoluminescence (PL) measurements in humid air at different temperatures and found that Al(qS) 3 exhibits improved stability. After comparing the stability of Alq 3 and Al(qS) 3 thin films, fabrication of the light emitting diodes with Al(qS) 3 emitting layer was attempted in order to compare the performance with Alq 3 based devices.en_HK
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dc.languageengen_HK
dc.publisherS P I E - International Society for Optical Engineering. The Journal's web site is located at http://spie.org/x1848.xmlen_HK
dc.relation.ispartofProceedings of SPIE - The International Society for Optical Engineeringen_HK
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License-
dc.rightsS P I E - the International Society for Optical Proceedings. Copyright © S P I E - International Society for Optical Engineering.en_HK
dc.rightsCopyright 2004 Society of Photo-Optical Instrumentation Engineers. This paper was published in Organic light-emitting materials and devices VII, San Diego, California, USA, 4-6 August 2003, v. 5214, p. 283-290 and is made available as an electronic reprint with permission of SPIE. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.en_HK
dc.subjectPhysicsen_HK
dc.subjectOpticsen_HK
dc.subjectInstrumentsen_HK
dc.titleImprovement in the environmental stability of tris(8-hydroxyquinoline) aluminum by substitution of sulphonic acid in 8-hydroxyquinoline liganden_HK
dc.typeConference_Paperen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0277-786X&volume=5214&spage=283&epage=290&date=2004&atitle=Improvement+in+the+environmental+stability+of+tris(8-hydroxyquinoline)+aluminum+by+substitution+of+sulphonic+acid+in+8-hydroxyquinoline+liganden_HK
dc.identifier.emailDjurišić, AB: dalek@hku.hken_HK
dc.identifier.emailChan, WK: waichan@hku.hken_HK
dc.identifier.authorityDjurišić, AB=rp00690en_HK
dc.identifier.authorityChan, WK=rp00667en_HK
dc.description.naturepublished_or_final_versionen_HK
dc.identifier.doi10.1117/12.503009en_HK
dc.identifier.scopuseid_2-s2.0-1942421326en_HK
dc.identifier.hkuros90374-
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-1942421326&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume5214en_HK
dc.identifier.spage283en_HK
dc.identifier.epage290en_HK
dc.publisher.placeUnited Statesen_HK
dc.identifier.scopusauthoridRoy, VAL=7005870324en_HK
dc.identifier.scopusauthoridKwong, CY=35917741900en_HK
dc.identifier.scopusauthoridDjurišić, AB=7004904830en_HK
dc.identifier.scopusauthoridPode, RB=7004113563en_HK
dc.identifier.scopusauthoridRao, TKG=8057786700en_HK
dc.identifier.scopusauthoridChan, WK=13310083000en_HK

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