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Conference Paper: Fabric defect detection by Fourier analysis

TitleFabric defect detection by Fourier analysis
Authors
KeywordsEngineering
Electrical engineering
Issue Date1999
PublisherIEEE.
Citation
The 34th IEEE - IAS Annual Meeting Conference, Phoenix, AZ., 3-7 October 1999. In Industry Applications Society. IEEE - IAS Annual Meeting Conference Record, 1999, v. 3, p. 1743-1750 How to Cite?
AbstractMany fabric defects are very small and undistinguishable, which are very difficult to detect by only monitoring the intensity change. Faultless fabric is a repetitive and regular global texture and Fourier transform can be applied to monitor the spatial frequency spectrum of a fabric. When a defect occurs in fabric, its regular structure is changed so that the corresponding intensity at some specific positions of the frequency spectrum would change. However, the three-dimensional frequency spectrum is very difficult to analyze. In this paper, a simulated fabric model is used to understand the relationship between the fabric structure in the image space and in the frequency space. Based on the three-dimensional frequency spectrum, two significant spectrum diagrams are defined and used for analyzing the fabric defect. These two diagrams are called the central spatial frequency spectrums. The defects are broadly classified into four classes: (1) double yarn; (2) missing yarn; (3) webs or broken fabric; and (4) yarn densities variation. After evaluating these four classes of defects using some simulated models and real samples, seven characteristic parameters for central spatial frequency spectrum are extracted for defect classification.
Persistent Identifierhttp://hdl.handle.net/10722/46161
ISSN
References

 

DC FieldValueLanguage
dc.contributor.authorChan, CHen_HK
dc.contributor.authorPang, GKHen_HK
dc.date.accessioned2007-10-30T06:43:49Z-
dc.date.available2007-10-30T06:43:49Z-
dc.date.issued1999en_HK
dc.identifier.citationThe 34th IEEE - IAS Annual Meeting Conference, Phoenix, AZ., 3-7 October 1999. In Industry Applications Society. IEEE - IAS Annual Meeting Conference Record, 1999, v. 3, p. 1743-1750en_HK
dc.identifier.issn0197-2618en_HK
dc.identifier.urihttp://hdl.handle.net/10722/46161-
dc.description.abstractMany fabric defects are very small and undistinguishable, which are very difficult to detect by only monitoring the intensity change. Faultless fabric is a repetitive and regular global texture and Fourier transform can be applied to monitor the spatial frequency spectrum of a fabric. When a defect occurs in fabric, its regular structure is changed so that the corresponding intensity at some specific positions of the frequency spectrum would change. However, the three-dimensional frequency spectrum is very difficult to analyze. In this paper, a simulated fabric model is used to understand the relationship between the fabric structure in the image space and in the frequency space. Based on the three-dimensional frequency spectrum, two significant spectrum diagrams are defined and used for analyzing the fabric defect. These two diagrams are called the central spatial frequency spectrums. The defects are broadly classified into four classes: (1) double yarn; (2) missing yarn; (3) webs or broken fabric; and (4) yarn densities variation. After evaluating these four classes of defects using some simulated models and real samples, seven characteristic parameters for central spatial frequency spectrum are extracted for defect classification.en_HK
dc.languageengen_HK
dc.publisherIEEE.en_HK
dc.relation.ispartofIndustry Applications Society. IEEE - IAS Annual Meeting Conference Record-
dc.rights©1999 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.en_HK
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License-
dc.subjectEngineeringen_HK
dc.subjectElectrical engineeringen_HK
dc.titleFabric defect detection by Fourier analysisen_HK
dc.typeConference_Paperen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0197-2618&volume=3&spage=1743&epage=1750&date=1999&atitle=Fabric+defect+detection+by+Fourier+analysisen_HK
dc.identifier.emailPang, Grantham: gpang@eee.hku.hk-
dc.identifier.emailPang, Grantham: gpang@eee.hku.hk-
dc.identifier.authorityPang, Grantham=rp00162-
dc.description.naturepublished_or_final_versionen_HK
dc.identifier.doi10.1109/IAS.1999.805975en_HK
dc.identifier.scopuseid_2-s2.0-0033343403-
dc.identifier.hkuros50482-
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-0033343403&selection=ref&src=s&origin=recordpage-
dc.identifier.volume3-
dc.identifier.spage1743-
dc.identifier.epage1750-
dc.publisher.placeUnited States-
dc.identifier.scopusauthoridChan, Chiho=7404813577-
dc.identifier.scopusauthoridPang, Grantham=7103393283-
dc.customcontrol.immutablesml 160112 - merged-

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