Article: Scaling of three-dimensional InN islands grown on GaN(0001) by molecular-beam epitaxy
| Title | Scaling of three-dimensional InN islands grown on GaN(0001) by molecular-beam epitaxy |
|---|---|
| Authors | Cao, YG1 2 Xie, MH2 Liu, Y2 Xu, SH2 Ng, YF2 Wu, HS2 Tong, SY3 |
| Keywords | Physics |
| Issue Date | 2003 |
| Publisher | American Physical Society. The Journal's web site is located at http://prb.aps.org/ |
| Citation | Physical Review B - Condensed Matter And Materials Physics, 2003, v. 68 n. 16, p. 1613041-1613044 [How to Cite?] DOI: http://dx.doi.org/10.1103/PhysRevB.68.161304 |
| Abstract | The scaling property of three-dimensional InN islands nucleated on GaN(0001) surface during molecular-beam epitaxy (MBE) is investigated. Due to the large lattice mismatch between InN and GaN (∼10%), the islands formed from the Stranski-Krastanow growth mode are dislocated. Despite the variations in (residual) strain and the shape, both the island size and pair separation distributions show the scaling behavior. Further, the size distribution resembles that for submonolayer homoepitaxy with the critical island size i = 1, suggesting that detachment of atoms is not significant. The above results also indicate strain is insignificant in determining the nucleation and growth of dislocated islands during heteroepitaxy by MBE. |
| ISSN | 0163-1829 |
| DOI | http://dx.doi.org/10.1103/PhysRevB.68.161304 |
| ISI Accession Number ID | WOS:000186571800007 |
| References | References in Scopus |
| dc.contributor.author | Cao, YG |
|---|---|
| dc.contributor.author | Xie, MH |
| dc.contributor.author | Liu, Y |
| dc.contributor.author | Xu, SH |
| dc.contributor.author | Ng, YF |
| dc.contributor.author | Wu, HS |
| dc.contributor.author | Tong, SY |
| dc.date.accessioned | 2007-03-23T04:45:04Z |
| dc.date.available | 2007-03-23T04:45:04Z |
| dc.date.issued | 2003 |
| dc.description.abstract | The scaling property of three-dimensional InN islands nucleated on GaN(0001) surface during molecular-beam epitaxy (MBE) is investigated. Due to the large lattice mismatch between InN and GaN (∼10%), the islands formed from the Stranski-Krastanow growth mode are dislocated. Despite the variations in (residual) strain and the shape, both the island size and pair separation distributions show the scaling behavior. Further, the size distribution resembles that for submonolayer homoepitaxy with the critical island size i = 1, suggesting that detachment of atoms is not significant. The above results also indicate strain is insignificant in determining the nucleation and growth of dislocated islands during heteroepitaxy by MBE. |
| dc.description.nature | published_or_final_version |
| dc.format.extent | 388752 bytes |
| dc.format.extent | 26624 bytes |
| dc.format.mimetype | application/pdf |
| dc.format.mimetype | application/msword |
| dc.identifier.citation | Physical Review B - Condensed Matter And Materials Physics, 2003, v. 68 n. 16, p. 1613041-1613044 [How to Cite?] DOI: http://dx.doi.org/10.1103/PhysRevB.68.161304 |
| dc.identifier.doi | http://dx.doi.org/10.1103/PhysRevB.68.161304 |
| dc.identifier.epage | 1613044 |
| dc.identifier.hkuros | 85046 |
| dc.identifier.isi | WOS:000186571800007 |
| dc.identifier.issn | 0163-1829 |
| dc.identifier.issue | 16 |
| dc.identifier.openurl | ![]() |
| dc.identifier.scopus | eid_2-s2.0-10644253563 |
| dc.identifier.spage | 1613041 |
| dc.identifier.uri | http://hdl.handle.net/10722/43404 |
| dc.identifier.volume | 68 |
| dc.language | eng |
| dc.publisher | American Physical Society. The Journal's web site is located at http://prb.aps.org/ |
| dc.publisher.place | United States |
| dc.relation.ispartof | Physical Review B - Condensed Matter and Materials Physics |
| dc.relation.references | References in Scopus |
| dc.rights | Physical Review B (Condensed Matter and Materials Physics). Copyright © American Physical Society. |
| dc.rights | Creative Commons: Attribution 3.0 Hong Kong License |
| dc.subject | Physics |
| dc.title | Scaling of three-dimensional InN islands grown on GaN(0001) by molecular-beam epitaxy |
| dc.type | Article |
Author Affiliations
- Institute of Physics Chinese Academy of Sciences
- The University of Hong Kong
- City University of Hong Kong


