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Article: Epitaxial YBa/sub 2/Cu/sub 3/O/sub y/ thin films grown on silicon with a double buffer of Eu/sub 2/CuO/sub 4//YSZ
Title | Epitaxial YBa/sub 2/Cu/sub 3/O/sub y/ thin films grown on silicon with a double buffer of Eu/sub 2/CuO/sub 4//YSZ |
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Authors | |
Keywords | High temperature superconductors Materials processing Sputtering Superconducting films |
Issue Date | 2003 |
Publisher | IEEE. |
Citation | IEEE Transactions on Applied Superconductivity, 2003, v. 13 n. 2 pt 3, p. 2729-2732 How to Cite? |
Abstract | We report a double buffer of Eu/sub 2/CuO/sub 4/ (ECO)/YSZ to improve the growth of YBa/sub 2/Cu/sub 3/O/sub y/(YBCO) on Si wafer. The ECO buffer material possesses a very stable 214-T' structure. It has excellent structural and chemical compatibilities with YBCO and YSZ. Our study showed that the epitaxy and crystallinity of YBCO deposited on Si could be considerably enhanced by using such a double buffer of ECO/YSZ. The grown films were characterized by grazing incidence X-ray reflection, rocking curve, SEM, TEM, and surface profiler. It was also found that such a double buffer could lead to a very smooth surface in the YBCO layer. |
Persistent Identifier | http://hdl.handle.net/10722/43392 |
ISSN | 2023 Impact Factor: 1.7 2023 SCImago Journal Rankings: 0.500 |
ISI Accession Number ID |
DC Field | Value | Language |
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dc.contributor.author | Gao, J | en_HK |
dc.contributor.author | Kang, L | en_HK |
dc.contributor.author | Li, TK | en_HK |
dc.contributor.author | Cheung, YL | en_HK |
dc.contributor.author | Yang, J | en_HK |
dc.date.accessioned | 2007-03-23T04:44:50Z | - |
dc.date.available | 2007-03-23T04:44:50Z | - |
dc.date.issued | 2003 | en_HK |
dc.identifier.citation | IEEE Transactions on Applied Superconductivity, 2003, v. 13 n. 2 pt 3, p. 2729-2732 | en_HK |
dc.identifier.issn | 1051-8223 | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/43392 | - |
dc.description.abstract | We report a double buffer of Eu/sub 2/CuO/sub 4/ (ECO)/YSZ to improve the growth of YBa/sub 2/Cu/sub 3/O/sub y/(YBCO) on Si wafer. The ECO buffer material possesses a very stable 214-T' structure. It has excellent structural and chemical compatibilities with YBCO and YSZ. Our study showed that the epitaxy and crystallinity of YBCO deposited on Si could be considerably enhanced by using such a double buffer of ECO/YSZ. The grown films were characterized by grazing incidence X-ray reflection, rocking curve, SEM, TEM, and surface profiler. It was also found that such a double buffer could lead to a very smooth surface in the YBCO layer. | en_HK |
dc.format.extent | 1242838 bytes | - |
dc.format.extent | 30720 bytes | - |
dc.format.mimetype | application/pdf | - |
dc.format.mimetype | application/msword | - |
dc.language | eng | en_HK |
dc.publisher | IEEE. | en_HK |
dc.relation.ispartof | IEEE Transactions on Applied Superconductivity | - |
dc.rights | ©2003 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE. | - |
dc.subject | High temperature superconductors | - |
dc.subject | Materials processing | - |
dc.subject | Sputtering | - |
dc.subject | Superconducting films | - |
dc.title | Epitaxial YBa/sub 2/Cu/sub 3/O/sub y/ thin films grown on silicon with a double buffer of Eu/sub 2/CuO/sub 4//YSZ | en_HK |
dc.type | Article | en_HK |
dc.identifier.openurl | http://library.hku.hk:4550/resserv?sid=HKU:IR&issn=1051-8223&volume=13&issue=2 pt 3&spage=2729&epage=2732&date=2003&atitle=Epitaxial+YBa/sub+2/Cu/sub+3/O/sub+y/+thin+films+grown+on+silicon+with+a+double+buffer+of+Eu/sub+2/CuO/sub+4//YSZ | en_HK |
dc.description.nature | published_or_final_version | en_HK |
dc.identifier.doi | 10.1109/TASC.2003.811969 | en_HK |
dc.identifier.scopus | eid_2-s2.0-0041474608 | - |
dc.identifier.hkuros | 80023 | - |
dc.identifier.isi | WOS:000184242400074 | - |
dc.identifier.issnl | 1051-8223 | - |