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Article: Adsorption and desorption kinetics of gallium atoms on 6H-SiC(0001) surfaces
Title | Adsorption and desorption kinetics of gallium atoms on 6H-SiC(0001) surfaces |
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Authors | |
Keywords | Physics |
Issue Date | 2000 |
Publisher | American Physical Society. The Journal's web site is located at http://prb.aps.org/ |
Citation | Physical Review B (Condensed Matter), 2000, v. 61 n. 7, p. 4890-4893 How to Cite? |
Abstract | Gallium (Ga) surface adsorption and desorption kinetics on 6H-SiC(0001) are investigated using reflection high-energy electron diffraction. It is found that for Ga adsorption, a wetting layer bonds strongly to the SiC(0001) surface. Additional Ga atoms form droplets on top of the wetting layer. The Ga droplets behave like a metallic liquid. The activation energies for desorption are determined to be 3.5 eV for Ga in the wetting layer and 2.5 eV for Ga in the droplets. It is further found that the desorption of Ga atoms from the wetting layer follows a zero-order kinetics, i.e., the desorption rate is independent of the number of adsorbed atoms. ©2000 The American Physical Society. |
Persistent Identifier | http://hdl.handle.net/10722/43293 |
ISSN | |
ISI Accession Number ID | |
References |
DC Field | Value | Language |
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dc.contributor.author | Zheng, LX | en_HK |
dc.contributor.author | Xie, MH | en_HK |
dc.contributor.author | Tong, SY | en_HK |
dc.date.accessioned | 2007-03-23T04:43:01Z | - |
dc.date.available | 2007-03-23T04:43:01Z | - |
dc.date.issued | 2000 | en_HK |
dc.identifier.citation | Physical Review B (Condensed Matter), 2000, v. 61 n. 7, p. 4890-4893 | - |
dc.identifier.issn | 0163-1829 | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/43293 | - |
dc.description.abstract | Gallium (Ga) surface adsorption and desorption kinetics on 6H-SiC(0001) are investigated using reflection high-energy electron diffraction. It is found that for Ga adsorption, a wetting layer bonds strongly to the SiC(0001) surface. Additional Ga atoms form droplets on top of the wetting layer. The Ga droplets behave like a metallic liquid. The activation energies for desorption are determined to be 3.5 eV for Ga in the wetting layer and 2.5 eV for Ga in the droplets. It is further found that the desorption of Ga atoms from the wetting layer follows a zero-order kinetics, i.e., the desorption rate is independent of the number of adsorbed atoms. ©2000 The American Physical Society. | en_HK |
dc.format.extent | 135295 bytes | - |
dc.format.extent | 26624 bytes | - |
dc.format.mimetype | application/pdf | - |
dc.format.mimetype | application/msword | - |
dc.language | eng | en_HK |
dc.publisher | American Physical Society. The Journal's web site is located at http://prb.aps.org/ | en_HK |
dc.relation.ispartof | Physical Review B (Condensed Matter) | - |
dc.rights | Copyright 2000 by The American Physical Society. This article is available online at https://doi.org/10.1103/PhysRevB.61.4890 | - |
dc.subject | Physics | en_HK |
dc.title | Adsorption and desorption kinetics of gallium atoms on 6H-SiC(0001) surfaces | en_HK |
dc.type | Article | en_HK |
dc.identifier.openurl | http://library.hku.hk:4550/resserv?sid=HKU:IR&issn=1098-0121&volume=61&issue=7&spage=4890&epage=4893&date=2000&atitle=Adsorption+and+desorption+kinetics+of+gallium+atoms+on+6H-SiC(0001)+surfaces | en_HK |
dc.identifier.email | Xie, MH: mhxie@hku.hk | en_HK |
dc.identifier.authority | Xie, MH=rp00818 | en_HK |
dc.description.nature | published_or_final_version | en_HK |
dc.identifier.doi | 10.1103/PhysRevB.61.4890 | en_HK |
dc.identifier.scopus | eid_2-s2.0-0000535530 | en_HK |
dc.identifier.hkuros | 50223 | - |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-0000535530&selection=ref&src=s&origin=recordpage | en_HK |
dc.identifier.volume | 61 | en_HK |
dc.identifier.issue | 7 | en_HK |
dc.identifier.spage | 4890 | en_HK |
dc.identifier.epage | 4893 | en_HK |
dc.identifier.isi | WOS:000085497200095 | - |
dc.publisher.place | United States | en_HK |
dc.identifier.scopusauthorid | Zheng, LX=7403405881 | en_HK |
dc.identifier.scopusauthorid | Xie, MH=7202255416 | en_HK |
dc.identifier.scopusauthorid | Tong, SY=24512624800 | en_HK |
dc.identifier.issnl | 0163-1829 | - |