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Article: A novel distributed system for plasma immersion ion implanter control and automation

TitleA novel distributed system for plasma immersion ion implanter control and automation
Authors
KeywordsInstruments
Issue Date1998
PublisherAmerican Institute of Physics. The Journal's web site is located at http://ojps.aip.org/rsio/
Citation
Review of Scientific Instruments, 1998, v. 69 n. 3, p. 1495-1498 How to Cite?
AbstractThe high voltage and electromagnetic field environment poses a big challenge to a control system for plasma immersion ion implantation (PIII). The automation process must be immune to electric field interference produced by the high voltage power supply, modulator, radio-frequency or microwave plasma generator, MEVVA plasma sources, and so on. We have recently designed and installed a distributed control system, PIIIDCS, to automate the operation of our PIII facility. Programmable logic controllers are used as the field control stations because of their good anti-interference ability and good real time response. A DH-485 network is used as the communication link between the field controllers and the management station in order to improve the robustness and reliability of the system. The newly developed interface is designed to work in a graphic mode in Microsoft Windows 95. Test runs have shown that the system is reliable, flexible, and easy to operate. The development of this novel control system will expedite the development of commercial PIII instrumentation. ©1998 American Institute of Physics.
Persistent Identifierhttp://hdl.handle.net/10722/42763
ISSN
2014 Impact Factor: 1.614
2013 SCImago Journal Rankings: 0.710
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorLiu, AGen_HK
dc.contributor.authorWang, XFen_HK
dc.contributor.authorTang, BYen_HK
dc.contributor.authorChu, PKen_HK
dc.contributor.authorKo, PKen_HK
dc.contributor.authorCheng, YCen_HK
dc.date.accessioned2007-03-23T04:31:42Z-
dc.date.available2007-03-23T04:31:42Z-
dc.date.issued1998en_HK
dc.identifier.citationReview of Scientific Instruments, 1998, v. 69 n. 3, p. 1495-1498en_HK
dc.identifier.issn0034-6748en_HK
dc.identifier.urihttp://hdl.handle.net/10722/42763-
dc.description.abstractThe high voltage and electromagnetic field environment poses a big challenge to a control system for plasma immersion ion implantation (PIII). The automation process must be immune to electric field interference produced by the high voltage power supply, modulator, radio-frequency or microwave plasma generator, MEVVA plasma sources, and so on. We have recently designed and installed a distributed control system, PIIIDCS, to automate the operation of our PIII facility. Programmable logic controllers are used as the field control stations because of their good anti-interference ability and good real time response. A DH-485 network is used as the communication link between the field controllers and the management station in order to improve the robustness and reliability of the system. The newly developed interface is designed to work in a graphic mode in Microsoft Windows 95. Test runs have shown that the system is reliable, flexible, and easy to operate. The development of this novel control system will expedite the development of commercial PIII instrumentation. ©1998 American Institute of Physics.en_HK
dc.format.extent72902 bytes-
dc.format.extent27136 bytes-
dc.format.mimetypeapplication/pdf-
dc.format.mimetypeapplication/msword-
dc.languageengen_HK
dc.publisherAmerican Institute of Physics. The Journal's web site is located at http://ojps.aip.org/rsio/en_HK
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License-
dc.subjectInstrumentsen_HK
dc.titleA novel distributed system for plasma immersion ion implanter control and automationen_HK
dc.typeArticleen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0034-6748&volume=69&issue=3&spage=1495&epage=1498&date=1998&atitle=A+novel+distributed+system+for+plasma+immersion+ion+implanter+control+and+automationen_HK
dc.description.naturepublished_or_final_versionen_HK
dc.identifier.doi10.1063/1.1148785en_HK
dc.identifier.hkuros31333-
dc.identifier.isiWOS:000072574500051-

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