Article: A novel distributed system for plasma immersion ion implanter control and automation

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Title	A novel distributed system for plasma immersion ion implanter control and automation
Authors	Liu, AG Wang, XF Tang, BY Chu, PK Ko, PK Cheng, YC
Keywords	Instruments
Issue Date	1998
Publisher	American Institute of Physics. The Journal's web site is located at http://ojps.aip.org/rsio/
Citation	Review of Scientific Instruments, 1998, v. 69 n. 3, p. 1495-1498 [How to Cite?] DOI: http://dx.doi.org/10.1063/1.1148785
Abstract	The high voltage and electromagnetic field environment poses a big challenge to a control system for plasma immersion ion implantation (PIII). The automation process must be immune to electric field interference produced by the high voltage power supply, modulator, radio-frequency or microwave plasma generator, MEVVA plasma sources, and so on. We have recently designed and installed a distributed control system, PIIIDCS, to automate the operation of our PIII facility. Programmable logic controllers are used as the field control stations because of their good anti-interference ability and good real time response. A DH-485 network is used as the communication link between the field controllers and the management station in order to improve the robustness and reliability of the system. The newly developed interface is designed to work in a graphic mode in Microsoft Windows 95. Test runs have shown that the system is reliable, flexible, and easy to operate. The development of this novel control system will expedite the development of commercial PIII instrumentation. ©1998 American Institute of Physics.
ISSN	0034-6748 2011 Impact Factor: 1.367 2011 SCImago Journal Rankings: 0.125
DOI	http://dx.doi.org/10.1063/1.1148785
ISI Accession Number ID	WOS:000072574500051

DC Field	Value
dc.contributor.author	Liu, AG
dc.contributor.author	Wang, XF
dc.contributor.author	Tang, BY
dc.contributor.author	Chu, PK
dc.contributor.author	Ko, PK
dc.contributor.author	Cheng, YC
dc.date.accessioned	2007-03-23T04:31:42Z
dc.date.available	2007-03-23T04:31:42Z
dc.date.issued	1998
dc.description.abstract	The high voltage and electromagnetic field environment poses a big challenge to a control system for plasma immersion ion implantation (PIII). The automation process must be immune to electric field interference produced by the high voltage power supply, modulator, radio-frequency or microwave plasma generator, MEVVA plasma sources, and so on. We have recently designed and installed a distributed control system, PIIIDCS, to automate the operation of our PIII facility. Programmable logic controllers are used as the field control stations because of their good anti-interference ability and good real time response. A DH-485 network is used as the communication link between the field controllers and the management station in order to improve the robustness and reliability of the system. The newly developed interface is designed to work in a graphic mode in Microsoft Windows 95. Test runs have shown that the system is reliable, flexible, and easy to operate. The development of this novel control system will expedite the development of commercial PIII instrumentation. ©1998 American Institute of Physics.
dc.description.nature	published_or_final_version
dc.format.extent	72902 bytes
dc.format.extent	27136 bytes
dc.format.mimetype	application/pdf
dc.format.mimetype	application/msword
dc.identifier.citation	Review of Scientific Instruments, 1998, v. 69 n. 3, p. 1495-1498 [How to Cite?] DOI: http://dx.doi.org/10.1063/1.1148785
dc.identifier.doi	http://dx.doi.org/10.1063/1.1148785
dc.identifier.hkuros	31333
dc.identifier.isi	WOS:000072574500051
dc.identifier.issn	0034-6748 2011 Impact Factor: 1.367 2011 SCImago Journal Rankings: 0.125
dc.identifier.openurl
dc.identifier.uri	http://hdl.handle.net/10722/42763
dc.language	eng
dc.publisher	American Institute of Physics. The Journal's web site is located at http://ojps.aip.org/rsio/
dc.rights	Creative Commons: Attribution 3.0 Hong Kong License
dc.subject	Instruments
dc.title	A novel distributed system for plasma immersion ion implanter control and automation
dc.type	Article

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