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Article: A novel distributed system for plasma immersion ion implanter control and automation
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TitleA novel distributed system for plasma immersion ion implanter control and automation
 
AuthorsLiu, AG
Wang, XF
Tang, BY
Chu, PK
Ko, PK
Cheng, YC
 
KeywordsInstruments
 
Issue Date1998
 
PublisherAmerican Institute of Physics. The Journal's web site is located at http://ojps.aip.org/rsio/
 
CitationReview of Scientific Instruments, 1998, v. 69 n. 3, p. 1495-1498 [How to Cite?]
DOI: http://dx.doi.org/10.1063/1.1148785
 
AbstractThe high voltage and electromagnetic field environment poses a big challenge to a control system for plasma immersion ion implantation (PIII). The automation process must be immune to electric field interference produced by the high voltage power supply, modulator, radio-frequency or microwave plasma generator, MEVVA plasma sources, and so on. We have recently designed and installed a distributed control system, PIIIDCS, to automate the operation of our PIII facility. Programmable logic controllers are used as the field control stations because of their good anti-interference ability and good real time response. A DH-485 network is used as the communication link between the field controllers and the management station in order to improve the robustness and reliability of the system. The newly developed interface is designed to work in a graphic mode in Microsoft Windows 95. Test runs have shown that the system is reliable, flexible, and easy to operate. The development of this novel control system will expedite the development of commercial PIII instrumentation. ©1998 American Institute of Physics.
 
ISSN0034-6748
2012 Impact Factor: 1.602
2012 SCImago Journal Rankings: 0.806
 
DOIhttp://dx.doi.org/10.1063/1.1148785
 
ISI Accession Number IDWOS:000072574500051
 
DC FieldValue
dc.contributor.authorLiu, AG
 
dc.contributor.authorWang, XF
 
dc.contributor.authorTang, BY
 
dc.contributor.authorChu, PK
 
dc.contributor.authorKo, PK
 
dc.contributor.authorCheng, YC
 
dc.date.accessioned2007-03-23T04:31:42Z
 
dc.date.available2007-03-23T04:31:42Z
 
dc.date.issued1998
 
dc.description.abstractThe high voltage and electromagnetic field environment poses a big challenge to a control system for plasma immersion ion implantation (PIII). The automation process must be immune to electric field interference produced by the high voltage power supply, modulator, radio-frequency or microwave plasma generator, MEVVA plasma sources, and so on. We have recently designed and installed a distributed control system, PIIIDCS, to automate the operation of our PIII facility. Programmable logic controllers are used as the field control stations because of their good anti-interference ability and good real time response. A DH-485 network is used as the communication link between the field controllers and the management station in order to improve the robustness and reliability of the system. The newly developed interface is designed to work in a graphic mode in Microsoft Windows 95. Test runs have shown that the system is reliable, flexible, and easy to operate. The development of this novel control system will expedite the development of commercial PIII instrumentation. ©1998 American Institute of Physics.
 
dc.description.naturepublished_or_final_version
 
dc.format.extent72902 bytes
 
dc.format.extent27136 bytes
 
dc.format.mimetypeapplication/pdf
 
dc.format.mimetypeapplication/msword
 
dc.identifier.citationReview of Scientific Instruments, 1998, v. 69 n. 3, p. 1495-1498 [How to Cite?]
DOI: http://dx.doi.org/10.1063/1.1148785
 
dc.identifier.doihttp://dx.doi.org/10.1063/1.1148785
 
dc.identifier.hkuros31333
 
dc.identifier.isiWOS:000072574500051
 
dc.identifier.issn0034-6748
2012 Impact Factor: 1.602
2012 SCImago Journal Rankings: 0.806
 
dc.identifier.openurl
 
dc.identifier.urihttp://hdl.handle.net/10722/42763
 
dc.languageeng
 
dc.publisherAmerican Institute of Physics. The Journal's web site is located at http://ojps.aip.org/rsio/
 
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License
 
dc.subjectInstruments
 
dc.titleA novel distributed system for plasma immersion ion implanter control and automation
 
dc.typeArticle
 
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