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Article: Electro-absorptive properties of interdiffused InGaAsP/InP quantum wells
Title | Electro-absorptive properties of interdiffused InGaAsP/InP quantum wells |
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Authors | |
Keywords | Physics engineering |
Issue Date | 1997 |
Publisher | American Institute of Physics. The Journal's web site is located at http://jap.aip.org/jap/staff.jsp |
Citation | Journal of Applied Physics, 1997, v. 82 n. 8, p. 3861-3869 How to Cite? |
Abstract | The effects of Group III and Group V interdiffusions with a varied as-grown well width and P concentration in the quaternary InGaAsP quantum well material have been theoretically studied. Interesting features of multiple mini-well profiles, generated by interdiffusion induced compressive and tensile strains, have been obtained and varying envelope overlapping of the electron-hole wave functions has been observed. The results show that the interdiffusion of the Group III elements with a well width of 10 nm offers a wide adjustability of the operation wavelength, enhances Stark shift, and reduces absorption loss, although they bear the shortcomings of low electro-absorption and contrast ratio. Several methods are proposed here to recover the contrast ratio with a maximum improvement of 66%. For the Group V interdiffusion of a 10-nm-wide as-grown well, a low absorption loss and a large Stark shift will result, while that of a narrowed well can widen the band-edge wavelength adjustability with a large electro-absorption. These results are important for the development of electro-absorptive InGaAsP/InP diffused quantum well modulators. © 1997 American Institute of Physics. |
Persistent Identifier | http://hdl.handle.net/10722/42762 |
ISSN | 2023 Impact Factor: 2.7 2023 SCImago Journal Rankings: 0.649 |
ISI Accession Number ID | |
References |
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Li, EH | en_HK |
dc.contributor.author | Choy, WCH | en_HK |
dc.date.accessioned | 2007-03-23T04:31:41Z | - |
dc.date.available | 2007-03-23T04:31:41Z | - |
dc.date.issued | 1997 | en_HK |
dc.identifier.citation | Journal of Applied Physics, 1997, v. 82 n. 8, p. 3861-3869 | - |
dc.identifier.issn | 0021-8979 | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/42762 | - |
dc.description.abstract | The effects of Group III and Group V interdiffusions with a varied as-grown well width and P concentration in the quaternary InGaAsP quantum well material have been theoretically studied. Interesting features of multiple mini-well profiles, generated by interdiffusion induced compressive and tensile strains, have been obtained and varying envelope overlapping of the electron-hole wave functions has been observed. The results show that the interdiffusion of the Group III elements with a well width of 10 nm offers a wide adjustability of the operation wavelength, enhances Stark shift, and reduces absorption loss, although they bear the shortcomings of low electro-absorption and contrast ratio. Several methods are proposed here to recover the contrast ratio with a maximum improvement of 66%. For the Group V interdiffusion of a 10-nm-wide as-grown well, a low absorption loss and a large Stark shift will result, while that of a narrowed well can widen the band-edge wavelength adjustability with a large electro-absorption. These results are important for the development of electro-absorptive InGaAsP/InP diffused quantum well modulators. © 1997 American Institute of Physics. | en_HK |
dc.format.extent | 222049 bytes | - |
dc.format.extent | 31232 bytes | - |
dc.format.mimetype | application/pdf | - |
dc.format.mimetype | application/msword | - |
dc.language | eng | en_HK |
dc.publisher | American Institute of Physics. The Journal's web site is located at http://jap.aip.org/jap/staff.jsp | en_HK |
dc.relation.ispartof | Journal of Applied Physics | en_HK |
dc.rights | Copyright 1997 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Journal of Applied Physics, 1997, v. 82 n. 8, p. 3861-3869 and may be found at https://doi.org/10.1063/1.365752 | - |
dc.subject | Physics engineering | en_HK |
dc.title | Electro-absorptive properties of interdiffused InGaAsP/InP quantum wells | en_HK |
dc.type | Article | en_HK |
dc.identifier.openurl | http://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0021-8979&volume=82&issue=8&spage=3861&epage=3869&date=1997&atitle=Electro-absorptive+properties+of+interdiffused+InGaAsP/InP+quantum+wells | en_HK |
dc.identifier.email | Choy, WCH:chchoy@eee.hku.hk | en_HK |
dc.identifier.authority | Choy, WCH=rp00218 | en_HK |
dc.description.nature | published_or_final_version | en_HK |
dc.identifier.doi | 10.1063/1.365752 | en_HK |
dc.identifier.scopus | eid_2-s2.0-0141671272 | en_HK |
dc.identifier.hkuros | 28223 | - |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-0141671272&selection=ref&src=s&origin=recordpage | en_HK |
dc.identifier.volume | 82 | en_HK |
dc.identifier.issue | 8 | en_HK |
dc.identifier.spage | 3861 | en_HK |
dc.identifier.epage | 3869 | en_HK |
dc.identifier.isi | WOS:A1997YA57200029 | - |
dc.publisher.place | United States | en_HK |
dc.identifier.scopusauthorid | Li, EH=7201410087 | en_HK |
dc.identifier.scopusauthorid | Choy, WCH=7006202371 | en_HK |
dc.identifier.issnl | 0021-8979 | - |