File Download
  Links for fulltext
     (May Require Subscription)
Supplementary

Article: Profile of optical constants of SiO 2 thin films containing Si nanocrystals

TitleProfile of optical constants of SiO 2 thin films containing Si nanocrystals
Authors
Chen, TPLiu, YTse, MSFung, SDong, G
KeywordsPhysics engineering
Issue Date2004
PublisherAmerican Institute of Physics. The Journal's web site is located at http://jap.aip.org/jap/staff.jsp
Citation
Journal of Applied Physics, 2004, v. 95 n. 12, p. 8481-8483 How to Cite?
DOI: http://dx.doi.org/10.1063/1.1739282
AbstractAn approach of the depth profiling for the thin film synthesized with ion implantation was developed. The nc-Si depth distribution obtained from secondary ion mass spectroscopy measurement was modeled with the approximation of many sublayers. The optical constants of each sublayer were formulated with the nc-Si volume fraction in the sublayer, for a given wavelength. The nc-Si optical constants as variable based on the effective medium approximation. The optical constants of each sublayer were calculated. The depth profiles of the optical constants for the SiO 2 thin film containing the nc-Si were obtained.
Persistent Identifierhttp://hdl.handle.net/10722/42493
ISSN
0021-8979
2023 Impact Factor: 2.7
2023 SCImago Journal Rankings: 0.649
ISI Accession Number ID
WOS:000221843400142
References
References in Scopus

 

DC FieldValueLanguage
dc.contributor.authorChen, TPen_HK
dc.contributor.authorLiu, Yen_HK
dc.contributor.authorTse, MSen_HK
dc.contributor.authorFung, Sen_HK
dc.contributor.authorDong, Gen_HK
dc.date.accessioned2007-01-29T08:51:05Z-
dc.date.available2007-01-29T08:51:05Z-
dc.date.issued2004en_HK
dc.identifier.citationJournal of Applied Physics, 2004, v. 95 n. 12, p. 8481-8483-
dc.identifier.issn0021-8979en_HK
dc.identifier.urihttp://hdl.handle.net/10722/42493-
dc.description.abstractAn approach of the depth profiling for the thin film synthesized with ion implantation was developed. The nc-Si depth distribution obtained from secondary ion mass spectroscopy measurement was modeled with the approximation of many sublayers. The optical constants of each sublayer were formulated with the nc-Si volume fraction in the sublayer, for a given wavelength. The nc-Si optical constants as variable based on the effective medium approximation. The optical constants of each sublayer were calculated. The depth profiles of the optical constants for the SiO 2 thin film containing the nc-Si were obtained.en_HK
dc.format.extent101846 bytes-
dc.format.extent37376 bytes-
dc.format.mimetypeapplication/pdf-
dc.format.mimetypeapplication/msword-
dc.languageengen_HK
dc.publisherAmerican Institute of Physics. The Journal's web site is located at http://jap.aip.org/jap/staff.jspen_HK
dc.relation.ispartofJournal of Applied Physicsen_HK
dc.rightsCopyright 2004 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Journal of Applied Physics, 2004, v. 95 n. 12, p. 8481-8483 and may be found at https://doi.org/10.1063/1.1739282-
dc.subjectPhysics engineeringen_HK
dc.titleProfile of optical constants of SiO 2 thin films containing Si nanocrystalsen_HK
dc.typeArticleen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0021-8979&volume=95&issue=12&spage=8481&epage=8483&date=2004&atitle=Profile+of+optical+constants+of+SiO2+thin+films+containing+Si+nanocrystalsen_HK
dc.identifier.emailFung, S: sfung@hku.hken_HK
dc.identifier.authorityFung, S=rp00695en_HK
dc.description.naturepublished_or_final_versionen_HK
dc.identifier.doi10.1063/1.1739282en_HK
dc.identifier.scopuseid_2-s2.0-3142563200en_HK
dc.identifier.hkuros88850-
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-3142563200&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume95en_HK
dc.identifier.issue12en_HK
dc.identifier.spage8481en_HK
dc.identifier.epage8483en_HK
dc.identifier.isiWOS:000221843400142-
dc.publisher.placeUnited Statesen_HK
dc.identifier.scopusauthoridChen, TP=7405540443en_HK
dc.identifier.scopusauthoridLiu, Y=36064444100en_HK
dc.identifier.scopusauthoridTse, MS=7103352646en_HK
dc.identifier.scopusauthoridFung, S=7201970040en_HK
dc.identifier.scopusauthoridDong, G=7201472362en_HK
dc.identifier.issnl0021-8979-

Export via OAI-PMH Interface in XML Formats

OR

Export to Other Non-XML Formats