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Article: Fractography, elastic modulus and oxidation resistance of novel metal-intermetallic Ni/Ni 3Al multilayer films

TitleFractography, elastic modulus and oxidation resistance of novel metal-intermetallic Ni/Ni 3Al multilayer films
Authors
KeywordsEngineering
Engineering mechanics and materials physics
Issue Date2002
PublisherMaterials Research Society. The Journal's web site is located at http://www.mrs.org/publications/jmr
Citation
Journal of Materials Research, 2002, v. 17 n. 4, p. 790-796 How to Cite?
AbstractNovel metal–intermetallic Ni/Ni3Al multilayer films are synthesized by a magnetron sputtering technique. The fractography, elastic modulus, and the oxidation resistance of the multilayer films are studied by a series of experimental tests. The scanning electron microscopy fractography of the films shows that both Ni and Ni3Al layers fracture with the appearance of ductile metal failure. No metal–intermetallic delamination appears in the multilayered films. Fluted dimpling in each Ni and Ni3Al layer is evident and continuous, layer through layer, illustrating very good adherence among the constituent layers. Such adherence makes the toughness of the Ni layers capable of transferring into the Ni3Al layers. Young’s modulus of the Ni/Ni3Al film is found to be 226 and 253 ± 10 GPa by nanoindentation and laser acoustic techniques, respectively. The continuity of elastic modulus between the two phases is revealed by nanoindentation test. The modulus continuity indicates an excellent integration of the constituent layers with similar crystal structure and close lattice constants. This integration makes the multilayers unsurpassed in comprehensive mechanical properties. Sheet resistance measurements show a good protective ability of the Ni/Ni3Al multilayers during high temperature oxidation. X-ray photoelectron spectroscopy spectra suggest that crystallized Al2O3 /Ni scales formed during the deposition and subsequent annealing processes are apparently responsible for the stability of these films under oxidative conditions. The appearance of the crystallized Al2O3 /Ni thin scales on the top of Ni3Al layers provides the Ni/Ni3Al multilayers good thermal oxidation resistance without lowering the fracture toughness.
Persistent Identifierhttp://hdl.handle.net/10722/42408
ISSN
2015 Impact Factor: 1.579
2015 SCImago Journal Rankings: 0.664
References

 

DC FieldValueLanguage
dc.contributor.authorMeng, XKen_HK
dc.contributor.authorShen, Hen_HK
dc.contributor.authorVehoff, Hen_HK
dc.contributor.authorMathur, Sen_HK
dc.contributor.authorNgan, AHWen_HK
dc.date.accessioned2007-01-29T08:49:13Z-
dc.date.available2007-01-29T08:49:13Z-
dc.date.issued2002en_HK
dc.identifier.citationJournal of Materials Research, 2002, v. 17 n. 4, p. 790-796en_HK
dc.identifier.issn0884-2914en_HK
dc.identifier.urihttp://hdl.handle.net/10722/42408-
dc.description.abstractNovel metal–intermetallic Ni/Ni3Al multilayer films are synthesized by a magnetron sputtering technique. The fractography, elastic modulus, and the oxidation resistance of the multilayer films are studied by a series of experimental tests. The scanning electron microscopy fractography of the films shows that both Ni and Ni3Al layers fracture with the appearance of ductile metal failure. No metal–intermetallic delamination appears in the multilayered films. Fluted dimpling in each Ni and Ni3Al layer is evident and continuous, layer through layer, illustrating very good adherence among the constituent layers. Such adherence makes the toughness of the Ni layers capable of transferring into the Ni3Al layers. Young’s modulus of the Ni/Ni3Al film is found to be 226 and 253 ± 10 GPa by nanoindentation and laser acoustic techniques, respectively. The continuity of elastic modulus between the two phases is revealed by nanoindentation test. The modulus continuity indicates an excellent integration of the constituent layers with similar crystal structure and close lattice constants. This integration makes the multilayers unsurpassed in comprehensive mechanical properties. Sheet resistance measurements show a good protective ability of the Ni/Ni3Al multilayers during high temperature oxidation. X-ray photoelectron spectroscopy spectra suggest that crystallized Al2O3 /Ni scales formed during the deposition and subsequent annealing processes are apparently responsible for the stability of these films under oxidative conditions. The appearance of the crystallized Al2O3 /Ni thin scales on the top of Ni3Al layers provides the Ni/Ni3Al multilayers good thermal oxidation resistance without lowering the fracture toughness.en_HK
dc.format.extent936293 bytes-
dc.format.extent25600 bytes-
dc.format.mimetypeapplication/pdf-
dc.format.mimetypeapplication/msword-
dc.languageengen_HK
dc.publisherMaterials Research Society. The Journal's web site is located at http://www.mrs.org/publications/jmren_HK
dc.rightsJournal of Materials Research. Copyright © Materials Research Society.en_HK
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License-
dc.subjectEngineeringen_HK
dc.subjectEngineering mechanics and materials physicsen_HK
dc.titleFractography, elastic modulus and oxidation resistance of novel metal-intermetallic Ni/Ni 3Al multilayer filmsen_HK
dc.typeArticleen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0884-2914&volume=17&issue=4&spage=790&epage=796&date=2002&atitle=Fractography,+elastic+modulus+and+oxidation+resistance+of+novel+metal-intermetallic+Ni/Ni3Al+multilayer+filmsen_HK
dc.identifier.emailNgan, AHW: hwngan@hkucc.hku.hk-
dc.identifier.authorityNgan, AHW=rp00225-
dc.description.naturepublished_or_final_versionen_HK
dc.identifier.scopuseid_2-s2.0-0036541588-
dc.identifier.hkuros68808-
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-0036541588&selection=ref&src=s&origin=recordpage-
dc.identifier.volume17-
dc.identifier.issue4-
dc.identifier.spage790-
dc.identifier.epage796-
dc.publisher.placeUnited States-
dc.identifier.scopusauthoridMeng, XK=7401630110-
dc.identifier.scopusauthoridShen, H=36070956500-
dc.identifier.scopusauthoridVehoff, H=7003376851-
dc.identifier.scopusauthoridMathur, S=7402610287-
dc.identifier.scopusauthoridNgan, AHW=7006827202-

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