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Article: Fractography, elastic modulus and oxidation resistance of novel metal-intermetallic Ni/Ni 3Al multilayer films
Title | Fractography, elastic modulus and oxidation resistance of novel metal-intermetallic Ni/Ni 3Al multilayer films |
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Authors | |
Keywords | Engineering Engineering mechanics and materials physics |
Issue Date | 2002 |
Publisher | Materials Research Society. The Journal's web site is located at http://www.mrs.org/publications/jmr |
Citation | Journal of Materials Research, 2002, v. 17 n. 4, p. 790-796 How to Cite? |
Abstract | Novel metal–intermetallic Ni/Ni3Al multilayer films are synthesized by a magnetron sputtering technique. The fractography, elastic modulus, and the oxidation resistance of the multilayer films are studied by a series of experimental tests. The scanning electron microscopy fractography of the films shows that both Ni and Ni3Al layers fracture with the appearance of ductile metal failure. No metal–intermetallic delamination appears in the multilayered films. Fluted dimpling in each Ni and Ni3Al layer is
evident and continuous, layer through layer, illustrating very good adherence among the constituent layers. Such adherence makes the toughness of the Ni layers capable of transferring into the Ni3Al layers. Young’s modulus of the Ni/Ni3Al film is found to be 226 and 253 ± 10 GPa by nanoindentation and laser acoustic techniques, respectively. The continuity of elastic modulus between the two phases is revealed by nanoindentation test. The modulus continuity indicates an excellent integration of the
constituent layers with similar crystal structure and close lattice constants. This integration makes the multilayers unsurpassed in comprehensive mechanical properties. Sheet resistance measurements show a good protective ability of the Ni/Ni3Al
multilayers during high temperature oxidation. X-ray photoelectron spectroscopy spectra suggest that crystallized Al2O3 /Ni scales formed during the deposition and subsequent annealing processes are apparently responsible for the stability of these
films under oxidative conditions. The appearance of the crystallized Al2O3 /Ni thin scales on the top of Ni3Al layers provides the Ni/Ni3Al multilayers good thermal oxidation resistance without lowering the fracture toughness. |
Persistent Identifier | http://hdl.handle.net/10722/42408 |
ISSN | 2023 Impact Factor: 2.7 2023 SCImago Journal Rankings: 0.569 |
References |
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Meng, XK | en_HK |
dc.contributor.author | Shen, H | en_HK |
dc.contributor.author | Vehoff, H | en_HK |
dc.contributor.author | Mathur, S | en_HK |
dc.contributor.author | Ngan, AHW | en_HK |
dc.date.accessioned | 2007-01-29T08:49:13Z | - |
dc.date.available | 2007-01-29T08:49:13Z | - |
dc.date.issued | 2002 | en_HK |
dc.identifier.citation | Journal of Materials Research, 2002, v. 17 n. 4, p. 790-796 | en_HK |
dc.identifier.issn | 0884-2914 | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/42408 | - |
dc.description.abstract | Novel metal–intermetallic Ni/Ni3Al multilayer films are synthesized by a magnetron sputtering technique. The fractography, elastic modulus, and the oxidation resistance of the multilayer films are studied by a series of experimental tests. The scanning electron microscopy fractography of the films shows that both Ni and Ni3Al layers fracture with the appearance of ductile metal failure. No metal–intermetallic delamination appears in the multilayered films. Fluted dimpling in each Ni and Ni3Al layer is evident and continuous, layer through layer, illustrating very good adherence among the constituent layers. Such adherence makes the toughness of the Ni layers capable of transferring into the Ni3Al layers. Young’s modulus of the Ni/Ni3Al film is found to be 226 and 253 ± 10 GPa by nanoindentation and laser acoustic techniques, respectively. The continuity of elastic modulus between the two phases is revealed by nanoindentation test. The modulus continuity indicates an excellent integration of the constituent layers with similar crystal structure and close lattice constants. This integration makes the multilayers unsurpassed in comprehensive mechanical properties. Sheet resistance measurements show a good protective ability of the Ni/Ni3Al multilayers during high temperature oxidation. X-ray photoelectron spectroscopy spectra suggest that crystallized Al2O3 /Ni scales formed during the deposition and subsequent annealing processes are apparently responsible for the stability of these films under oxidative conditions. The appearance of the crystallized Al2O3 /Ni thin scales on the top of Ni3Al layers provides the Ni/Ni3Al multilayers good thermal oxidation resistance without lowering the fracture toughness. | en_HK |
dc.format.extent | 936293 bytes | - |
dc.format.extent | 25600 bytes | - |
dc.format.mimetype | application/pdf | - |
dc.format.mimetype | application/msword | - |
dc.language | eng | en_HK |
dc.publisher | Materials Research Society. The Journal's web site is located at http://www.mrs.org/publications/jmr | en_HK |
dc.rights | Journal of Materials Research. Copyright © Materials Research Society. | en_HK |
dc.subject | Engineering | en_HK |
dc.subject | Engineering mechanics and materials physics | en_HK |
dc.title | Fractography, elastic modulus and oxidation resistance of novel metal-intermetallic Ni/Ni 3Al multilayer films | en_HK |
dc.type | Article | en_HK |
dc.identifier.openurl | http://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0884-2914&volume=17&issue=4&spage=790&epage=796&date=2002&atitle=Fractography,+elastic+modulus+and+oxidation+resistance+of+novel+metal-intermetallic+Ni/Ni3Al+multilayer+films | en_HK |
dc.identifier.email | Ngan, AHW: hwngan@hkucc.hku.hk | - |
dc.identifier.authority | Ngan, AHW=rp00225 | - |
dc.description.nature | published_or_final_version | en_HK |
dc.identifier.scopus | eid_2-s2.0-0036541588 | - |
dc.identifier.hkuros | 68808 | - |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-0036541588&selection=ref&src=s&origin=recordpage | - |
dc.identifier.volume | 17 | - |
dc.identifier.issue | 4 | - |
dc.identifier.spage | 790 | - |
dc.identifier.epage | 796 | - |
dc.publisher.place | United States | - |
dc.identifier.scopusauthorid | Meng, XK=7401630110 | - |
dc.identifier.scopusauthorid | Shen, H=36070956500 | - |
dc.identifier.scopusauthorid | Vehoff, H=7003376851 | - |
dc.identifier.scopusauthorid | Mathur, S=7402610287 | - |
dc.identifier.scopusauthorid | Ngan, AHW=7006827202 | - |
dc.identifier.issnl | 0884-1616 | - |