File Download
Links for fulltext
(May Require Subscription)
- Publisher Website: 10.1063/1.371057
- Scopus: eid_2-s2.0-0042995507
- WOS: WOS:000081720600094
- Find via
Supplementary
- Citations:
- Appears in Collections:
Article: Thermally induced conduction type conversion in n-type InP
Title | Thermally induced conduction type conversion in n-type InP |
---|---|
Authors | |
Keywords | Physics engineering |
Issue Date | 1999 |
Publisher | American Institute of Physics. The Journal's web site is located at http://jap.aip.org/jap/staff.jsp |
Citation | Journal of Applied Physics, 1999, v. 86 n. 4, p. 2361-2363 How to Cite? |
Abstract | n-type semiconducting InP is changed into p-type semiconducting by short time annealing at 700 °C. Further annealing for a longer time leads to a second conduction-type conversion changing the material back to n type again but with a much higher resistivity. These conduction conversions indicate the formation of both acceptor and donor defects and the progressive variation of their relative concentrations during annealing. © 1999 American Institute of Physics. |
Persistent Identifier | http://hdl.handle.net/10722/42192 |
ISSN | 2023 Impact Factor: 2.7 2023 SCImago Journal Rankings: 0.649 |
ISI Accession Number ID | |
References |
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Fung, S | en_HK |
dc.contributor.author | Zhao, YW | en_HK |
dc.contributor.author | Beling, CD | en_HK |
dc.contributor.author | Xu, XL | en_HK |
dc.contributor.author | Sun, NF | en_HK |
dc.contributor.author | Sun, TN | en_HK |
dc.contributor.author | Chen, XD | en_HK |
dc.date.accessioned | 2007-01-08T02:31:21Z | - |
dc.date.available | 2007-01-08T02:31:21Z | - |
dc.date.issued | 1999 | en_HK |
dc.identifier.citation | Journal of Applied Physics, 1999, v. 86 n. 4, p. 2361-2363 | - |
dc.identifier.issn | 0021-8979 | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/42192 | - |
dc.description.abstract | n-type semiconducting InP is changed into p-type semiconducting by short time annealing at 700 °C. Further annealing for a longer time leads to a second conduction-type conversion changing the material back to n type again but with a much higher resistivity. These conduction conversions indicate the formation of both acceptor and donor defects and the progressive variation of their relative concentrations during annealing. © 1999 American Institute of Physics. | en_HK |
dc.format.extent | 37880 bytes | - |
dc.format.extent | 9781 bytes | - |
dc.format.mimetype | application/pdf | - |
dc.format.mimetype | text/plain | - |
dc.language | eng | en_HK |
dc.publisher | American Institute of Physics. The Journal's web site is located at http://jap.aip.org/jap/staff.jsp | en_HK |
dc.relation.ispartof | Journal of Applied Physics | en_HK |
dc.rights | Copyright 1999 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Journal of Applied Physics, 1999, v. 86 n. 4, p. 2361-2363 and may be found at https://doi.org/10.1063/1.371057 | - |
dc.subject | Physics engineering | en_HK |
dc.title | Thermally induced conduction type conversion in n-type InP | en_HK |
dc.type | Article | en_HK |
dc.identifier.openurl | http://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0021-8979&volume=86&issue=4&spage=2361&epage=2363&date=1999&atitle=Thermally+induced+conduction+type+conversion+in+n-type+InP | en_HK |
dc.identifier.email | Fung, S: sfung@hku.hk | en_HK |
dc.identifier.email | Beling, CD: cdbeling@hkucc.hku.hk | en_HK |
dc.identifier.authority | Fung, S=rp00695 | en_HK |
dc.identifier.authority | Beling, CD=rp00660 | en_HK |
dc.description.nature | published_or_final_version | en_HK |
dc.identifier.doi | 10.1063/1.371057 | en_HK |
dc.identifier.scopus | eid_2-s2.0-0042995507 | en_HK |
dc.identifier.hkuros | 47339 | - |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-0042995507&selection=ref&src=s&origin=recordpage | en_HK |
dc.identifier.volume | 86 | en_HK |
dc.identifier.issue | 4 | en_HK |
dc.identifier.spage | 2361 | en_HK |
dc.identifier.epage | 2363 | en_HK |
dc.identifier.isi | WOS:000081720600094 | - |
dc.publisher.place | United States | en_HK |
dc.identifier.scopusauthorid | Fung, S=7201970040 | en_HK |
dc.identifier.scopusauthorid | Zhao, YW=55231669100 | en_HK |
dc.identifier.scopusauthorid | Beling, CD=7005864180 | en_HK |
dc.identifier.scopusauthorid | Xu, XL=35188165400 | en_HK |
dc.identifier.scopusauthorid | Sun, NF=7202556986 | en_HK |
dc.identifier.scopusauthorid | Sun, TN=7402922751 | en_HK |
dc.identifier.scopusauthorid | Chen, XD=26642908200 | en_HK |
dc.identifier.issnl | 0021-8979 | - |