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Article: Application of a VUV fourier transform spectrometer and synchrotron radiation source to measurements of. VI. The ε(0,0) band of NO

TitleApplication of a VUV fourier transform spectrometer and synchrotron radiation source to measurements of. VI. The ε(0,0) band of NO
Authors
Cheung, ASCWong, ALLo, DHYLeung, KWSYoshino, KThorne, APMurray, JEImajo, TIto, KMatsui, T
KeywordsPhysics chemistry
Issue Date2003
PublisherAmerican Institute of Physics. The Journal's web site is located at http://jcp.aip.org/jcp/staff.jsp
Citation
Journal of Chemical Physics, 2003, v. 119 n. 16, p. 8373-8378 How to Cite?
DOI: http://dx.doi.org/10.1063/1.1611171
AbstractThe analysis of the ε(0,0) band around 187.6 nm was reported using the VUV FTS with synchrotron radiation for the background source. Due to the capability of the combintion of instruments, These were the first high-resolution quantitative measurements of line positions and intensities of the rotational lines of the ε(0,0) band. The determination of the band oscillator strengths of the band was performed using line-by-line measurements, because the resolution of the present experiment was comparable to the Doppler widths.
Persistent Identifierhttp://hdl.handle.net/10722/42052
ISSN
0021-9606
2023 Impact Factor: 3.1
2023 SCImago Journal Rankings: 1.101
ISI Accession Number ID
WOS:000185865500020
References
References in Scopus
Errata
http://dx.doi.org/10.1063/1.1883648
eid_2-s2.0-18744371897

 

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dc.contributor.authorCheung, ASCen_HK
dc.contributor.authorWong, ALen_HK
dc.contributor.authorLo, DHYen_HK
dc.contributor.authorLeung, KWSen_HK
dc.contributor.authorYoshino, Ken_HK
dc.contributor.authorThorne, APen_HK
dc.contributor.authorMurray, JEen_HK
dc.contributor.authorImajo, Ten_HK
dc.contributor.authorIto, Ken_HK
dc.contributor.authorMatsui, Ten_HK
dc.date.accessioned2007-01-08T02:27:47Z-
dc.date.available2007-01-08T02:27:47Z-
dc.date.issued2003en_HK
dc.identifier.citationJournal of Chemical Physics, 2003, v. 119 n. 16, p. 8373-8378-
dc.identifier.issn0021-9606en_HK
dc.identifier.urihttp://hdl.handle.net/10722/42052-
dc.description.abstractThe analysis of the ε(0,0) band around 187.6 nm was reported using the VUV FTS with synchrotron radiation for the background source. Due to the capability of the combintion of instruments, These were the first high-resolution quantitative measurements of line positions and intensities of the rotational lines of the ε(0,0) band. The determination of the band oscillator strengths of the band was performed using line-by-line measurements, because the resolution of the present experiment was comparable to the Doppler widths.en_HK
dc.format.extent128154 bytes-
dc.format.extent29696 bytes-
dc.format.extent196974 bytes-
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dc.format.mimetypeapplication/pdf-
dc.languageengen_HK
dc.publisherAmerican Institute of Physics. The Journal's web site is located at http://jcp.aip.org/jcp/staff.jspen_HK
dc.relation.ispartofJournal of Chemical Physicsen_HK
dc.rightsCopyright 2003 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Journal of Chemical Physics, 2003, v. 119 n. 16, p. 8373-8378 and may be found at https://doi.org/10.1063/1.1611171-
dc.subjectPhysics chemistryen_HK
dc.titleApplication of a VUV fourier transform spectrometer and synchrotron radiation source to measurements of. VI. The ε(0,0) band of NOen_HK
dc.typeArticleen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0021-9606&volume=119&issue=16&spage=8373&epage=8378&date=2003&atitle=Application+of+a+VUV+Fourier+Transform+Spectrometer+and+Synchrotron+Radiation+Source+to+Measurements+of+VI.+The+e(0,0)+Band+of+NOen_HK
dc.identifier.emailCheung, ASC:hrsccsc@hku.hken_HK
dc.identifier.authorityCheung, ASC=rp00676en_HK
dc.description.naturepublished_or_final_versionen_HK
dc.identifier.doi10.1063/1.1611171en_HK
dc.identifier.scopuseid_2-s2.0-0242677814en_HK
dc.identifier.hkuros92609-
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-0242677814&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume119en_HK
dc.identifier.issue16en_HK
dc.identifier.spage8373en_HK
dc.identifier.epage8378en_HK
dc.identifier.isiWOS:000185865500020-
dc.publisher.placeUnited Statesen_HK
dc.relation.erratumdoi:10.1063/1.1883648-
dc.relation.erratumeid:eid_2-s2.0-18744371897-
dc.identifier.scopusauthoridCheung, ASC=7401806538en_HK
dc.identifier.scopusauthoridWong, AL=7403147255en_HK
dc.identifier.scopusauthoridLo, DHY=36934595800en_HK
dc.identifier.scopusauthoridLeung, KWS=7401860891en_HK
dc.identifier.scopusauthoridYoshino, K=7401650773en_HK
dc.identifier.scopusauthoridThorne, AP=22995374200en_HK
dc.identifier.scopusauthoridMurray, JE=35379179900en_HK
dc.identifier.scopusauthoridImajo, T=7003722073en_HK
dc.identifier.scopusauthoridIto, K=8357026600en_HK
dc.identifier.scopusauthoridMatsui, T=35375003800en_HK
dc.identifier.issnl0021-9606-

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