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Postgraduate Thesis: A new UHV cleavage-evaporation and analysis system for the study of metal-semiconductor contacts
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TitleA new UHV cleavage-evaporation and analysis system for the study of metal-semiconductor contacts
 
AuthorsXu, Xiaoliang.
許小亮
 
Issue Date1996
 
PublisherThe University of Hong Kong (Pokfulam, Hong Kong)
 
DegreeMaster of Philosophy
 
SubjectUltrahigh vacuum.
Semiconductor-metal boundaries.
Electric contacts.
 
Dept/ProgramPhysics
 
DOIhttp://dx.doi.org/10.5353/th_b3121479
 
DC FieldValue
dc.contributor.authorXu, Xiaoliang.
 
dc.contributor.author許小亮
 
dc.date.hkucongregation1997
 
dc.date.issued1996
 
dc.description.naturepublished_or_final_version
 
dc.description.thesisdisciplinePhysics
 
dc.description.thesislevelmaster's
 
dc.description.thesisnameMaster of Philosophy
 
dc.identifier.doihttp://dx.doi.org/10.5353/th_b3121479
 
dc.identifier.hkulb3121479
 
dc.languageeng
 
dc.publisherThe University of Hong Kong (Pokfulam, Hong Kong)
 
dc.relation.ispartofHKU Theses Online (HKUTO)
 
dc.rightsThe author retains all proprietary rights, (such as patent rights) and the right to use in future works.
 
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License
 
dc.source.urihttp://hub.hku.hk/bib/B31214794
 
dc.subject.lcshUltrahigh vacuum.
 
dc.subject.lcshSemiconductor-metal boundaries.
 
dc.subject.lcshElectric contacts.
 
dc.titleA new UHV cleavage-evaporation and analysis system for the study of metal-semiconductor contacts
 
dc.typePG_Thesis
 
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