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postgraduate thesis: A new UHV cleavage-evaporation and analysis system for the study of metal-semiconductor contacts

TitleA new UHV cleavage-evaporation and analysis system for the study of metal-semiconductor contacts
Authors
Issue Date1996
PublisherThe University of Hong Kong (Pokfulam, Hong Kong)
DegreeMaster of Philosophy
SubjectUltrahigh vacuum.
Semiconductor-metal boundaries.
Electric contacts.
Dept/ProgramPhysics

 

DC FieldValueLanguage
dc.contributor.authorXu, Xiaoliang.-
dc.contributor.author許小亮-
dc.date.issued1996-
dc.languageeng-
dc.publisherThe University of Hong Kong (Pokfulam, Hong Kong)-
dc.relation.ispartofHKU Theses Online (HKUTO)-
dc.rightsThe author retains all proprietary rights, (such as patent rights) and the right to use in future works.-
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License-
dc.source.urihttp://hub.hku.hk/bib/B31214794-
dc.subject.lcshUltrahigh vacuum.-
dc.subject.lcshSemiconductor-metal boundaries.-
dc.subject.lcshElectric contacts.-
dc.titleA new UHV cleavage-evaporation and analysis system for the study of metal-semiconductor contacts-
dc.typePG_Thesis-
dc.identifier.hkulb3121479-
dc.description.thesisnameMaster of Philosophy-
dc.description.thesislevelmaster's-
dc.description.thesisdisciplinePhysics-
dc.description.naturepublished_or_final_version-
dc.identifier.doi10.5353/th_b3121479-
dc.date.hkucongregation1997-

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