Postgraduate Thesis: A new UHV cleavage-evaporation and analysis system for the study of metal-semiconductor contacts

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TitleA new UHV cleavage-evaporation and analysis system for the study of metal-semiconductor contacts
AuthorsXu, Xiaoliang.
許小亮
Issue Date1996
PublisherThe University of Hong Kong (Pokfulam, Hong Kong)
DegreeMaster of Philosophy
SubjectUltrahigh vacuum.
Semiconductor-metal boundaries.
Electric contacts.
Dept/ProgramPhysics
DOIhttp://dx.doi.org/10.5353/th_b3121479
DC Field
Value
dc.contributor.authorXu, Xiaoliang.
dc.contributor.author許小亮
dc.date.hkucongregation1997
dc.date.issued1996
dc.description.naturepublished_or_final_version
dc.description.thesisdisciplinePhysics
dc.description.thesislevelmaster's
dc.description.thesisnameMaster of Philosophy
dc.identifier.doihttp://dx.doi.org/10.5353/th_b3121479
dc.identifier.hkulb3121479
dc.languageeng
dc.publisherThe University of Hong Kong (Pokfulam, Hong Kong)
dc.relation.ispartofHKU Theses Online (HKUTO)
dc.rightsThe author retains all proprietary rights, (such as patent rights) and the right to use in future works.
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License
dc.source.urihttp://hub.hku.hk/bib/B31214794
dc.subject.lcshUltrahigh vacuum.
dc.subject.lcshSemiconductor-metal boundaries.
dc.subject.lcshElectric contacts.
dc.titleA new UHV cleavage-evaporation and analysis system for the study of metal-semiconductor contacts
dc.typePG_Thesis