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postgraduate thesis: Reliable gate dielectric for low-temperature thin-film transistors using plasma nitridation

TitleReliable gate dielectric for low-temperature thin-film transistors using plasma nitridation
Authors
Advisors
Advisor(s):Lai, PT
Issue Date2002
PublisherThe University of Hong Kong (Pokfulam, Hong Kong)
Citation
Or, C. D. [柯展東]. (2002). Reliable gate dielectric for low-temperature thin-film transistors using plasma nitridation. (Thesis). University of Hong Kong, Pokfulam, Hong Kong SAR. Retrieved from http://dx.doi.org/10.5353/th_b3122659
DegreeMaster of Philosophy
SubjectThin film transistors.
Dielectrics.
Dept/ProgramElectrical and Electronic Engineering

 

DC FieldValueLanguage
dc.contributor.advisorLai, PT-
dc.contributor.authorOr, Chin-tung, David.-
dc.contributor.author柯展東-
dc.date.issued2002-
dc.identifier.citationOr, C. D. [柯展東]. (2002). Reliable gate dielectric for low-temperature thin-film transistors using plasma nitridation. (Thesis). University of Hong Kong, Pokfulam, Hong Kong SAR. Retrieved from http://dx.doi.org/10.5353/th_b3122659-
dc.languageeng-
dc.publisherThe University of Hong Kong (Pokfulam, Hong Kong)-
dc.relation.ispartofHKU Theses Online (HKUTO)-
dc.rightsThe author retains all proprietary rights, (such as patent rights) and the right to use in future works.-
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License-
dc.source.urihttp://hub.hku.hk/bib/B31226590-
dc.subject.lcshThin film transistors.-
dc.subject.lcshDielectrics.-
dc.titleReliable gate dielectric for low-temperature thin-film transistors using plasma nitridation-
dc.typePG_Thesis-
dc.identifier.hkulb3122659-
dc.description.thesisnameMaster of Philosophy-
dc.description.thesislevelMaster-
dc.description.thesisdisciplineElectrical and Electronic Engineering-
dc.description.naturepublished_or_final_version-
dc.identifier.doi10.5353/th_b3122659-
dc.date.hkucongregation2002-

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