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postgraduate thesis: Aberration sensitivity reduction of alternating phase-shifting mask inphotolithography

TitleAberration sensitivity reduction of alternating phase-shifting mask inphotolithography
Authors
Advisors
Advisor(s):Lam, EYM
Issue Date2004
PublisherThe University of Hong Kong (Pokfulam, Hong Kong)
Citation
Mak, Y. G. [麥易康]. (2004). Aberration sensitivity reduction of alternating phase-shifting mask in photolithography. (Thesis). University of Hong Kong, Pokfulam, Hong Kong SAR. Retrieved from http://dx.doi.org/10.5353/th_b3072124
DegreeMaster of Philosophy
SubjectAberration.
Integrated circuits - Masks
Photolithography.
Dept/ProgramElectrical and Electronic Engineering

 

DC FieldValueLanguage
dc.contributor.advisorLam, EYM-
dc.contributor.authorMak, Yick-hong, Giuseppe.-
dc.contributor.author麥易康.-
dc.date.issued2004-
dc.identifier.citationMak, Y. G. [麥易康]. (2004). Aberration sensitivity reduction of alternating phase-shifting mask in photolithography. (Thesis). University of Hong Kong, Pokfulam, Hong Kong SAR. Retrieved from http://dx.doi.org/10.5353/th_b3072124-
dc.languageeng-
dc.publisherThe University of Hong Kong (Pokfulam, Hong Kong)-
dc.relation.ispartofHKU Theses Online (HKUTO)-
dc.rightsThe author retains all proprietary rights, (such as patent rights) and the right to use in future works.-
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License-
dc.source.urihttp://hub.hku.hk/bib/B30721246-
dc.subject.lcshAberration.-
dc.subject.lcshIntegrated circuits - Masks-
dc.subject.lcshPhotolithography.-
dc.titleAberration sensitivity reduction of alternating phase-shifting mask inphotolithography-
dc.typePG_Thesis-
dc.identifier.hkulb3072124-
dc.description.thesisnameMaster of Philosophy-
dc.description.thesislevelMaster-
dc.description.thesisdisciplineElectrical and Electronic Engineering-
dc.description.naturepublished_or_final_version-
dc.description.natureabstract-
dc.description.naturetoc-
dc.identifier.doi10.5353/th_b3072124-
dc.date.hkucongregation2005-

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