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Conference Paper: Metal-Site Dopants in Two-Dimensional Transition Metal Dichalcogenides

TitleMetal-Site Dopants in Two-Dimensional Transition Metal Dichalcogenides
Authors
Keywords2D semiconducting materials
computational screening
density functional theory
dopants
first-principles
Issue Date2019
PublisherIEEE. The Journal's web site is located at https://ieeexplore.ieee.org/xpl/conhome/1001871/all-proceedings
Citation
Proceedings of 2019 IEEE Workshop on Microelectronics and Electron Devices (WMED), Boise, ID, USA, 26 April 2019 How to Cite?
AbstractTwo-dimensional transition metal dichalcogenides (2D TMDs), have received a lot of attention for having notable structural, electrical and optical properties. 2D TMDs can be further tuned through the implementation of substitutional dopants. This work utilizes density functional theory in order to screen the effects of six different transition metal-site dopants (Mo, Ni, Sc, Ti, V, and W) on the structural and electrical properties of 2D MX 2(M = Mo and W; X = S, Se, and Te). Dopant stability was found to be largely dependent on the atomic radii of the dopant and host metal atoms. Electronic band gap calculations reveal W-doped MoX 2and Mo-doped WX 2to be among the only observed semiconductors. The photosensitivity and photoresponsivity are significantly enhanced by doping with Sc or Ni. This work offers an extensive investigation of metal-site dopants and their impact on 2D MX 2materials.
Persistent Identifierhttp://hdl.handle.net/10722/272409
ISSN
2020 SCImago Journal Rankings: 0.121

 

DC FieldValueLanguage
dc.contributor.authorWilliamson, I-
dc.contributor.authorLawson, M-
dc.contributor.authorLi, S-
dc.contributor.authorChen, Y-
dc.contributor.authorLi, L-
dc.date.accessioned2019-07-20T10:41:47Z-
dc.date.available2019-07-20T10:41:47Z-
dc.date.issued2019-
dc.identifier.citationProceedings of 2019 IEEE Workshop on Microelectronics and Electron Devices (WMED), Boise, ID, USA, 26 April 2019-
dc.identifier.issn1947-3834-
dc.identifier.urihttp://hdl.handle.net/10722/272409-
dc.description.abstractTwo-dimensional transition metal dichalcogenides (2D TMDs), have received a lot of attention for having notable structural, electrical and optical properties. 2D TMDs can be further tuned through the implementation of substitutional dopants. This work utilizes density functional theory in order to screen the effects of six different transition metal-site dopants (Mo, Ni, Sc, Ti, V, and W) on the structural and electrical properties of 2D MX 2(M = Mo and W; X = S, Se, and Te). Dopant stability was found to be largely dependent on the atomic radii of the dopant and host metal atoms. Electronic band gap calculations reveal W-doped MoX 2and Mo-doped WX 2to be among the only observed semiconductors. The photosensitivity and photoresponsivity are significantly enhanced by doping with Sc or Ni. This work offers an extensive investigation of metal-site dopants and their impact on 2D MX 2materials.-
dc.languageeng-
dc.publisherIEEE. The Journal's web site is located at https://ieeexplore.ieee.org/xpl/conhome/1001871/all-proceedings-
dc.relation.ispartofIEEE Workshop on Microelectronics and Electron Devices-
dc.rightsIEEE Workshop on Microelectronics and Electron Devices. Copyright © IEEE.-
dc.rights©2019 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.-
dc.subject2D semiconducting materials-
dc.subjectcomputational screening-
dc.subjectdensity functional theory-
dc.subjectdopants-
dc.subjectfirst-principles-
dc.titleMetal-Site Dopants in Two-Dimensional Transition Metal Dichalcogenides-
dc.typeConference_Paper-
dc.identifier.emailChen, Y: yuechen@hku.hk-
dc.identifier.authorityChen, Y=rp01925-
dc.identifier.doi10.1109/WMED.2019.8714147-
dc.identifier.scopuseid_2-s2.0-85066814845-
dc.identifier.hkuros298988-
dc.publisher.placeUnited States-
dc.identifier.issnl1947-3842-

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