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Article: Wafer-scale nanopatterning using fast-reconfigurable and actively-stabilized two-beam fiber-optic interference lithography

TitleWafer-scale nanopatterning using fast-reconfigurable and actively-stabilized two-beam fiber-optic interference lithography
Authors
Issue Date2018
PublisherOptical Society of America: Open Access Journals. The Journal's web site is located at http://www.opticsexpress.org
Citation
Optics Express, 2018, v. 26 n. 7, p. 8194-8200 How to Cite?
AbstractA fast-reconfigurable and actively-stabilized fiber-optic interference lithography system is demonstrated in this paper. Employment of fiber-optic components greatly enhances the flexibility of the whole system, simplifies its optical alignment, and suppresses the interference of mechanical vibrations. Active stabilization is implemented in the system and evaluated through modeling and experiment. We demonstrate 3-inch-diameter wafer-scale patterning of 240-nm-period grating lines with a sub-50-nm linewidth and an aspect ratio over 3. Two-dimensional patterns of different geometries and dimensions are also demonstrated to show the versatility of our system. Step-and-repeat exposure is demonstrated with independently controlled patterning fields of 2 × 2 cm2 large.
Persistent Identifierhttp://hdl.handle.net/10722/261377
ISSN
2017 Impact Factor: 3.356
2015 SCImago Journal Rankings: 2.186
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorLiang, C-
dc.contributor.authorQu, T-
dc.contributor.authorCai, J-
dc.contributor.authorZhu, Z-
dc.contributor.authorLi, S-
dc.contributor.authorLi, W-
dc.date.accessioned2018-09-14T08:57:10Z-
dc.date.available2018-09-14T08:57:10Z-
dc.date.issued2018-
dc.identifier.citationOptics Express, 2018, v. 26 n. 7, p. 8194-8200-
dc.identifier.issn1094-4087-
dc.identifier.urihttp://hdl.handle.net/10722/261377-
dc.description.abstractA fast-reconfigurable and actively-stabilized fiber-optic interference lithography system is demonstrated in this paper. Employment of fiber-optic components greatly enhances the flexibility of the whole system, simplifies its optical alignment, and suppresses the interference of mechanical vibrations. Active stabilization is implemented in the system and evaluated through modeling and experiment. We demonstrate 3-inch-diameter wafer-scale patterning of 240-nm-period grating lines with a sub-50-nm linewidth and an aspect ratio over 3. Two-dimensional patterns of different geometries and dimensions are also demonstrated to show the versatility of our system. Step-and-repeat exposure is demonstrated with independently controlled patterning fields of 2 × 2 cm2 large.-
dc.languageeng-
dc.publisherOptical Society of America: Open Access Journals. The Journal's web site is located at http://www.opticsexpress.org-
dc.relation.ispartofOptics Express-
dc.rightsOptics Express. Copyright © Optical Society of America: Open Access Journals.-
dc.rights© 2018 [year] Optical Society of America]. Users may use, reuse, and build upon the article, or use the article for text or data mining, so long as such uses are for non-commercial purposes and appropriate attribution is maintained. All other rights are reserved.-
dc.rightsThis work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.-
dc.titleWafer-scale nanopatterning using fast-reconfigurable and actively-stabilized two-beam fiber-optic interference lithography-
dc.typeArticle-
dc.identifier.emailLiang, C: cwliangv@HKUCC-COM.hku.hk-
dc.identifier.emailCai, J: caijingx@hku.hk-
dc.identifier.emailLi, W: liwd@hku.hk-
dc.identifier.authorityLi, W=rp01581-
dc.description.naturepublished_or_final_version-
dc.identifier.doi10.1364/OE.26.008194-
dc.identifier.scopuseid_2-s2.0-85044753841-
dc.identifier.hkuros291178-
dc.identifier.volume26-
dc.identifier.issue7-
dc.identifier.spage8194-
dc.identifier.epage8200-
dc.identifier.isiWOS:000428990200029-
dc.publisher.placeUnited States-

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