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- Publisher Website: 10.1063/1.1519329
- Scopus: eid_2-s2.0-79956057132
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Article: Near-field two-photon nanolithography using an apertureless optical probe
Title | Near-field two-photon nanolithography using an apertureless optical probe |
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Authors | |
Issue Date | 2002 |
Publisher | American Institute of Physics. The Journal's web site is located at http://apl.aip.org/ |
Citation | Applied Physics Letters, 2002, v. 81 n. 19, p. 3663-3665 How to Cite? |
Abstract | Near-field two-photon optical lithography is demonstrated by using ∼120 fs laser pulses at 790 nm in an apertureless near-field optical microscope, which produces lithographic features with ∼70 nm resolution. The technique takes advantage of the field enhancement at the extremity of a metallic probe to induce nanoscale two-photon absorption and polymerization in a commercial photoresist, SU-8. Even without optimization of the resist or laser pulses, the spatial resolution of this technique is as high as λ/10, nearly a factor of 2 better than techniques based on far field two-photon lithography. © 2002 American Institute of Physics. |
Persistent Identifier | http://hdl.handle.net/10722/257067 |
ISSN | 2023 Impact Factor: 3.5 2023 SCImago Journal Rankings: 0.976 |
ISI Accession Number ID |
DC Field | Value | Language |
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dc.contributor.author | Yin, Xiaobo | - |
dc.contributor.author | Fang, Nicholas | - |
dc.contributor.author | Zhang, Xiang | - |
dc.contributor.author | Martini, Ignacio B. | - |
dc.contributor.author | Schwartz, Benjamin J. | - |
dc.date.accessioned | 2018-07-24T08:58:44Z | - |
dc.date.available | 2018-07-24T08:58:44Z | - |
dc.date.issued | 2002 | - |
dc.identifier.citation | Applied Physics Letters, 2002, v. 81 n. 19, p. 3663-3665 | - |
dc.identifier.issn | 0003-6951 | - |
dc.identifier.uri | http://hdl.handle.net/10722/257067 | - |
dc.description.abstract | Near-field two-photon optical lithography is demonstrated by using ∼120 fs laser pulses at 790 nm in an apertureless near-field optical microscope, which produces lithographic features with ∼70 nm resolution. The technique takes advantage of the field enhancement at the extremity of a metallic probe to induce nanoscale two-photon absorption and polymerization in a commercial photoresist, SU-8. Even without optimization of the resist or laser pulses, the spatial resolution of this technique is as high as λ/10, nearly a factor of 2 better than techniques based on far field two-photon lithography. © 2002 American Institute of Physics. | - |
dc.language | eng | - |
dc.publisher | American Institute of Physics. The Journal's web site is located at http://apl.aip.org/ | - |
dc.relation.ispartof | Applied Physics Letters | - |
dc.title | Near-field two-photon nanolithography using an apertureless optical probe | - |
dc.type | Article | - |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1063/1.1519329 | - |
dc.identifier.scopus | eid_2-s2.0-79956057132 | - |
dc.identifier.volume | 81 | - |
dc.identifier.issue | 19 | - |
dc.identifier.spage | 3663 | - |
dc.identifier.epage | 3665 | - |
dc.identifier.isi | WOS:000178935200049 | - |
dc.identifier.issnl | 0003-6951 | - |