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- Publisher Website: 10.1063/1.3141457
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Article: A simple design of flat hyperlens for lithography and imaging with half-pitch resolution down to 20 nm
Title | A simple design of flat hyperlens for lithography and imaging with half-pitch resolution down to 20 nm |
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Authors | |
Issue Date | 2009 |
Publisher | American Institute of Physics. The Journal's web site is located at http://apl.aip.org/ |
Citation | Applied Physics Letters, 2009, v. 94 n. 20, article no. 203108 How to Cite? |
Abstract | We propose that a hyperlens can be used for photolithography to generate deep subwavelength arbitrary patterns from diffraction-limited masks. Numerical simulation shows that half-pitch resolution down to 20 nm is possible from a mask with 280 nm period at working wavelength 375 nm. We also extend the hyperlens projection concept from cylindrical interfaces to arbitrary interfaces. An example of a flat interface hyperlens is numerically demonstrated for lithography purposes. © 2009 American Institute of Physics. |
Persistent Identifier | http://hdl.handle.net/10722/256999 |
ISSN | 2023 Impact Factor: 3.5 2023 SCImago Journal Rankings: 0.976 |
ISI Accession Number ID |
DC Field | Value | Language |
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dc.contributor.author | Xiong, Yi | - |
dc.contributor.author | Liu, Zhaowei | - |
dc.contributor.author | Zhang, Xiang | - |
dc.date.accessioned | 2018-07-24T08:58:33Z | - |
dc.date.available | 2018-07-24T08:58:33Z | - |
dc.date.issued | 2009 | - |
dc.identifier.citation | Applied Physics Letters, 2009, v. 94 n. 20, article no. 203108 | - |
dc.identifier.issn | 0003-6951 | - |
dc.identifier.uri | http://hdl.handle.net/10722/256999 | - |
dc.description.abstract | We propose that a hyperlens can be used for photolithography to generate deep subwavelength arbitrary patterns from diffraction-limited masks. Numerical simulation shows that half-pitch resolution down to 20 nm is possible from a mask with 280 nm period at working wavelength 375 nm. We also extend the hyperlens projection concept from cylindrical interfaces to arbitrary interfaces. An example of a flat interface hyperlens is numerically demonstrated for lithography purposes. © 2009 American Institute of Physics. | - |
dc.language | eng | - |
dc.publisher | American Institute of Physics. The Journal's web site is located at http://apl.aip.org/ | - |
dc.relation.ispartof | Applied Physics Letters | - |
dc.title | A simple design of flat hyperlens for lithography and imaging with half-pitch resolution down to 20 nm | - |
dc.type | Article | - |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1063/1.3141457 | - |
dc.identifier.scopus | eid_2-s2.0-65949102983 | - |
dc.identifier.volume | 94 | - |
dc.identifier.issue | 20 | - |
dc.identifier.spage | article no. 203108 | - |
dc.identifier.epage | article no. 203108 | - |
dc.identifier.isi | WOS:000266342800062 | - |
dc.identifier.issnl | 0003-6951 | - |