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Article: Projecting deep-subwavelength patterns from diffraction-limited masks using metal-dielectric multilayers

TitleProjecting deep-subwavelength patterns from diffraction-limited masks using metal-dielectric multilayers
Authors
Issue Date2008
Citation
Applied Physics Letters, 2008, v. 93, n. 11 How to Cite?
AbstractWe utilize a metal-dielectric multilayer structure to generate deep-subwavelength one-dimensional and two-dimensional periodic patterns with diffraction-limited masks. The working wavelength and the pattern are set by the flexible design of the multilayer structure. This scheme is suitable to be applied to deep-subwavelength photolithography. As an example, we numerically demonstrate pattern periods down to 50 nm under 405 nm light illumination. © 2008 American Institute of Physics.
Persistent Identifierhttp://hdl.handle.net/10722/256980
ISSN
2015 Impact Factor: 3.142
2015 SCImago Journal Rankings: 1.105

 

DC FieldValueLanguage
dc.contributor.authorXiong, Yi-
dc.contributor.authorLiu, Zhaowei-
dc.contributor.authorZhang, Xiang-
dc.date.accessioned2018-07-24T08:58:30Z-
dc.date.available2018-07-24T08:58:30Z-
dc.date.issued2008-
dc.identifier.citationApplied Physics Letters, 2008, v. 93, n. 11-
dc.identifier.issn0003-6951-
dc.identifier.urihttp://hdl.handle.net/10722/256980-
dc.description.abstractWe utilize a metal-dielectric multilayer structure to generate deep-subwavelength one-dimensional and two-dimensional periodic patterns with diffraction-limited masks. The working wavelength and the pattern are set by the flexible design of the multilayer structure. This scheme is suitable to be applied to deep-subwavelength photolithography. As an example, we numerically demonstrate pattern periods down to 50 nm under 405 nm light illumination. © 2008 American Institute of Physics.-
dc.languageeng-
dc.relation.ispartofApplied Physics Letters-
dc.titleProjecting deep-subwavelength patterns from diffraction-limited masks using metal-dielectric multilayers-
dc.typeArticle-
dc.description.natureLink_to_subscribed_fulltext-
dc.identifier.doi10.1063/1.2985898-
dc.identifier.scopuseid_2-s2.0-52349100505-
dc.identifier.volume93-
dc.identifier.issue11-
dc.identifier.spagenull-
dc.identifier.epagenull-

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